晶圆测试说明书Cascade-11861-6-Manual.pdf - 第44页
20 • Summit 11K/12K Probe Station User’ s Guide The 11100 probe station s are designed so that can be ea sily reconfigured and upgraded. The foll owing sections desc ribe specification s and requirement s. Chuck Specific…
Chapter 2: Station Specifications •
19
11000-Series
DIMENSIONS
PLATEN
ROTARY STAGE
ROLL-OUT STAGE
CHUCK
For in-depth chuck specifications, see the individual station numbers.
X-Y STAGE
MICROCHAMBER
11520, 11600, 11700, 11800 Only11100 Probe Stations
Base dimensions 68 cm (27 in.) wide x 76 cm (30 in.)
deep
Typical height to eye pieces 55 cm (22 in.)
Weight 150 kg (330 lb.) including optics
mount
Rigidity <50-micron (2 mil) for 4.5 kg (10 lb.)
lateral or vertical force
Z-lift range 5.5 mm (0.22 in.) linear lift
Z-lift repeatability <2-micron (0.08 mil)
Material Nickel-plated steel
Travel +
7°
Resolution 1° per turn
Travel 25 cm (10 in.)
Size 200 mm (8 in.) diameter
(150 mm on 6-in. stations)
Surface Gold-plated or nickel-plated
aluminum, with provisions for
grounding or biasing
Travel 203 mm x 203 mm
(8 in. x 8 in.)
Resolution 0.2 in. per turn (5 mm)
Bearings Cross-roller
EMI Isolation Yes
20
• Summit 11K/12K Probe Station User’s Guide
The 11100 probe stations are designed so that can be easily reconfigured and
upgraded. The following sections describe specifications and requirements.
Chuck Specifications
Total System Planarity
Planarity includes error from wafer chuck, theta rotations, and travel flatness.
Light tight Yes
Enclosure Dry air, inert gas purge capable
Maximum number of positioners Eight DCM (seven with high-power
microscope) or four RF
Flatness 0.39 mils (10 microns) across total
surface
Isolation, chuck to shield > 10 TΩ
Auxiliary chucks Two with individual vacuum controls
Breakdown bias voltage > 1000-volts
Vacuum distribution area 13, 75, or 152 mm (selectable)
Total system planarity <20-micron (0.8 mil) across 101 mm
(4 in.) circle
<30-micron (1.2 mil) across 203 mm
(8 in.) circle
Chapter 2: Station Specifications •
21
11500 GUARDED PROBE STATIONS
The 11500 probe stations have a triaxial guarded architecture. The station
provides a low-residual-capacitance measurement environment (including the
chuck) for substrate measurements. By eliminating residual capacitance, the
11500 enables you to make precise, low-level measurements using shorter
integration intervals. Typical improvements are from 100 to 1000 times in the sub-
pA range in measurement speed.
The MicroChamber works as a Faraday cage to further reduce chuck variation to
30 fF (11550), and as low as 3fF (11560) with the AttoGuard version. This feature
enables you to measure capacitance without having to null position-dependent
capacitance changes.
Chuck Specifications
Total System Planarity
Planarity includes error from wafer chuck, theta rotations, and travel flatness.
Flatness 10-micron (0.39 mil) across total
surface
Residual capacitance, chuck to shield
(FemtoGuard version)
< 20 pF
Residual capacitance, chuck to shield
(AttoGuard version)
< 0.2 pF
Capacitance variation over chuck
surface
≤ 3 fF with AttoGuard
≤ 30 fF with FemtoGuard
Isolation, chuck to shield > 10 TΩ
Breakdown bias voltage > 1000-volts
Chuck leakage current after 10
seconds (FemtoGuard version)
5 fA @ 0-volts
10 fA @ 10-volts
20 fA @ 100-volts
Chuck leakage current after 10
seconds (AttoGuard version)
3 fA @ 0 to 100-volts
Vacuum distribution area 13, 75, or 152 mm (selectable)
Auxiliary chucks Two with individual vacuum control
Total system planarity <20-micron (0.8 mil) across 101 mm
(4 in.) circle
<30-micron (1.2 mil) across 203 mm
(8 in.) circle