Oxford-100-Manual.pdf - 第243页

Equipment Manual Oxford Instruments Plasma Technology Plasma lab lep 180 1. Health and Safety For Health and Safety aspects of operating and maintaining the ICP 180 source, refer to Section 1 - Health and Safety of the P…

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Plasma
lab
Ie
P
180
Contents
Oxford
Instruments
Plasma
Technology
Equipment
Manual
1.
Health
and
Safety
3
2.
Services
4
2.1
Qualitative
requirements 4
2.2
Quantitative
requirements 4
2.2.1
Cooling water. 4
2.2.2
Process
gas 4
2.2.3
RF
power
4
2.2.4 Electrical supply 4
2.2.5 Extraction 4
3.
Description
5
3.1 Function 5
3.2
Mechanical assembly 7
3.3
Source specification 8
3.4
Graphs
of
typical
operating
characteristics 9
4.
Installation
11
5.
Operating
Instructions
12
5.1
Introduction
12
5.1.1
Manual
adjustment
of
the
Automatch
Unit
12
5.1.2
Obtaining
a Plasma
13
6.
Maintenance
15
6.1
Maintenance
schedule
15
6.2
Safety maintenance
15
6.2.1 Inspection and renewal 16
6.3
Routine maintenance
17
6.3.1
As
required
17
6.3.2
Weekly
18
6.3.3
3-Monthly
18
6.4
Changing
the
ICP180 dielectric
tube
19
7.
Troubleshooting
21
7.1 Customer
Support
Facilities
21
7.2
High reflected
power
initial
checks
22
7.3
High reflected
power
(system
under
vacuum)
23
7.3.1
Automatch
gives reflected
power>
5%
23
7.3.2
Automatch
gives reflected
power
of
2%
to
5%
24
OIPT
locations
worldwide
26
Fig
1:
ICP
180 source -
cross
section
of
principal components 5
Fig
2:
ICP
180 Exploded
view
7
Fig
3:
Ion
current
density
at
the
wafer
versus
ICP
power
9
Fig
4:
Operating
window
10
Fig
5:
Typical
AMU
control
panel 12
Fig
6:
Automatch
components
25
Issue
4:
January 06
ICP
180 Source
Page 2
of
26
Printed: 18-Jan-06. 8:44
Equipment
Manual
Oxford
Instruments
Plasma
Technology
Plasma
lab
lep 180
1.
Health
and
Safety
For Health and Safety aspects
of
operating
and
maintaining
the
ICP
180 source,
refer
to
Section 1 - Health
and Safety
of
the
PiasmaiabSystem100 manual.
Printed: l8-Jan-DB, 8:44
ICP
180 Source
Page 3
of
26
Issue
3 : December 00
Plasma
lab
ICP
180
2. Services
Oxford
Instruments
Plasma
Technology
Equipment
Manual
2.1
Qualitative
requirements
The
qualitative
services requirements
for
the
Plasma
lab
ICP
180 source are given in
Appendix
S- 'Services
Specifications
for
Plasma
lab
and
lonfab
Systems'. This
document
gives generic
information
and
mandatory
requirements
for
all services.
2.2
Quantitative
requirements
2.2.1
Cooling
water
The source has
two
cooling
circuits:
14
inch
pipework
circuit
requiring
1
litrelminute
3/
8
inch
pipework
circuit
requiring
2
litreslminute
The
3/
8
inch
circuit
can be
put
in series
with
the
RF
generator
cooling
provided
the
minimum
flows
of
both
are satisfied.
Cooling
water
is
required
at
a
minimum
flow
rate
of
2
litreslminute
to
the
source. The
RF
generator
requires 4
litreslminute
(1200W)
or
8
litreslminute
(3000W).
2.2.2
Process gas
Process
gas supplies are
required
for
the
source and
for
the
process chamber. Types
of
gases and
their
flow
rates
depend
on
the
process application.
Normally
all gas
is
injected
at
the
top
of
the
source. A
few
processes (especially
PECVD
processes)
require
some
of
the
gas
to
be injected downstream.
2.2.3
RF
power
An
RF
generator
is
required
to
supply
power
to
the
automatch
unit.
The
RF
generator
should have an
output
impedance
of
50 ohms and a
minimum
power
rating
of
1200W.
The maximum
allowable
RF
power
input
to
the
automatch
unit
is
3kW.
2.2.4
Electrical
supply
The electrical supply
required
for
the
automatch
unit
are
is
24VDC
at
2A
maximum.
2.2.5
Extraction
The extraction collar
fitted
on
the
top
cover must be connected
to
an
extraction
system having a
minimum
flow
rate
of
1 m
3
/minute
at
60
Pa
extraction
pressure.
This
requirement
can be waived
for
alumina
tubes
provided
those
responsible
for
machine
safety
permit
it.
They should
perform
a risk assessment
which
considers
breaking
of
the
ICP
tube
during
processing.
The
requirement
cannot
be
waived
for
an
ICP
180
fitted
with
a
quartz
tube,
because UV emission
from
the
plasma
will
generate
ozone.
Issue
4:
January 06
ICP
180 Source
Page 4
of
26
Printed: 18-Jan-06, 8:44