Oxford-100-Manual.pdf - 第247页

Equipment Manual Oxford Instruments Plasma Technology Plasma lab ICP 180 3.2 Mechanical assembly CHAMBER LID COOLING CIRCUIT HINGE BLOCK O-RING SEAL CHAMBER LID TO CHAMBER AUTOMATCH UNIT 1/ .,: , , , ~ COIL CLAMPING / AS…

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Plasma
lab
ICP
180
Oxford
Instruments
Plasma
Technology
WARNING
Equipment
Manual
THE
DIELECTRIC
TUBE
COULD FAIL CATASTROPHICALLY BY IMPLOSION WHEN
UNDER
VACUUM.
IF
IT IS NECESSARY
TO
OPEN
THE
RF
ENCLOSURE
FOR
ANY
REASON, VENT
THE
CHAMBER,
OR
WEAR APPROPRIATE PERSONAL PROTECTION.
WARNING
DO
NOT OPERATE
THE
SOURCE WITHOUT
THE
COVERS PROPERLY ATTACHED.
PARTS
OF
THE
CIRCUIT OPERATE AT LETHAL VOLTAGES. RADIATION BURNS
MAY
OCCUR
TO
NEARBY PERSONNEL.
CAUTION
Nearby
electrical
equipment
may
experience
RF
interference
if
the
source
is
operated
without
all
covers
and
lids
forming
the
RF
enclosure
properly
secured.
Other
components
of
the
ICP180 include:
• A gas
inlet
connection,
1,4
inch
VCR
female
nut,
feeding
gas
to
distribution
holes in
the
ICP
top
lid.
• A
KF25
port.
intended
for
laser
interferometry.
• A 100mm
diameter
extraction
collar.
WARNING
IF
A QUARTZ ICP
TUBE
IS
FITTED, ULTRA-VIOLET LIGHT FROM
THE
PLASMA CAN
FORM OZONE
IN
THE
AIR INSIDE
THE
RF
ENCLOSURE. EXTRACTION SHOULD
BE
FITTED
TO
THIS
PORT;
EXTRACTION SHOULD
BE
FITTED
IF
THE
GASES USED
POSE
A
HAZARD
TO
PERSONNEL SHOULD
THE
ICP
TUBE
BREAK.
•
An
electrostatic screen. This minimises capacitive
coupling
between
the
RF
induction
coil and
the
plasma,
which
in
turn
reduces
ion
bombardment
of
the
tube
wall.
It
also eliminates cross-
coupling
between
the
ICP
RF
supply and any
other
RF
generator
on
the
same chamber,
making
phase-locking unnecessary. The electrostatic screen can be
omitted
if
the
ICP
180
is
the
only
plasma source
on
the
chamber.
• A pressure
relief
port. Should
the
system become pressurised, this
will
automatically
open
to
prevent
dangerous pressurisation
of
the
ICP
tube.
Issue
4:
January 06
ICP
180Source
Page 6
of
26
Printed: 18-Jan-06. 8:44
Equipment
Manual
Oxford
Instruments
Plasma
Technology
Plasma
lab
ICP
180
3.2
Mechanical
assembly
CHAMBER LID
COOLING CIRCUIT
HINGE
BLOCK
O-RING SEAL
CHAMBER LID
TO CHAMBER
AUTOMATCH
UNIT
1/
.,:
,
,
,
~
COIL CLAMPING
/ ASSEMBLY
,t;'
,
PRESSURE
REUEFVALVE
~
:k//~_-
NW16 CENTRING RING
----
/ EXTRACTION
:./
COLLAR COVER PLATE
I
PROCESS GAS
------INLET
(ROUTED
FROM CHAMBER
BASE)
ELECTROSTATIC
SCREEN
~
(OPTION)
~--
..
COOLlNG~
ELEMENT
---
o
O-RING SEAL
TO COVER
PLAT~
COOLING
COLLAR
INSULATING
TUBE
.----._~.~ilt:=::::::~
COOLING
COLLAR
o
O-RING SEAL
TO CHAMBER LID
o
o
ENDPOINT
DETECTOR
PORT
//
i/6./////
DETAILS
NW25KF
FLANGE.-----~
'i'J>C::'
....
GASKET
--------1
=--:
....----..-
..
~I
SAPPHIRE--
..
i.e:>:
WINDOW//O>
///c:Y
o RING
SEAL"""""·-
Fig 2:
ICP
180 Exploded view
Printed: 18-Jan-06, 8:44
ICP
180 Source
Page 7
of
26
Issue
3 : December 00
Plasma
lab
ICP
180
Oxford
Instruments
Plasma
Technology
Equipment
Manual
The
Plasma
lab
Ie
P180
is
an assembly
which
can be
fitted
to
a
Plasma
lab
System
100 chamber in place
of
the
standard chamber lid. The assembly comprises a chamber lid on
which
is
mounted
the
ICP
discharge
chamber, an
automatch
unit
and a shielding cover.
The chamber lid
is
secured
to
the
process chamber
by
hinges
which
allow
it
to
be
tilted
for
process
chamber maintenance. The lid
is
water
cooled
by
a circular
cooling
element. Vacuum sealing
between
the
lid and
the
process chamber
is
provided
by an
a-ring.
A
mounting
plate
attached
to
the
lid supports
the
automatch
unit.
The discharge chamber comprises an insulated
tube
sealed
at
its
top
and
bottom
by a-rings. The insulated
tube
is
cooled
at
its
top
and
bottom
by
cooling
collars.
An
electrostatic shield surrounds
the
insulated
tube. A
water-cooled
RF
induction
coil,
supported
by
two
clamping assemblies,
is
located outside
of
the
insulated
tube
and electrostatic shield.
The
top
of
the
discharge chamber
is
a cover
plate
which
incorporates an
extraction
cover,
endpoint
detector
port.
process gas inlet. pressure
relief
valve and a circular
cooling
element.
Air
is
drawn
into
the
space outside
of
the
discharge chamber
through
a
cooling
grid.
The
ICP
180 cover incorporates an
interlock
actuator
(see
Fig
2)
which,
when
the
cover
is
fitted,
actuates a
micro-switch located
under
the
AMU.
When
the
micro-switch
is
actuated,
the
contactor
which
supplies
the
source's
RF
Generator,
is
enabled.
When
the
cover
is
not
fitted,
the
RF
Generator's supply
is
disabled.
3.3 Source
specification
Description:
RF:
Inductively coupled plasma source
for
use
with
the
Plasma
lab
System
100.
Minimum
generator
capacity 1200W
Maximum
RF
power
handling
3000W
Frequency:
13.S6MHz.
Ion
current
density:
>1
mAlcm-
2
at
normal
substrate
position
in
the
Plasma
lab
System
100, using
Argon
at
1
Pa.
Pressure range:
O.SPa
to10Pa
(3
to
70 mTorr). (Argon)
Operation
to
1mTorr
is
possible using >2KW
RF.
Vacuum:
Alljoints
< Sx
10-
6
mbar
litre/sec leak
rate
on
Helium leak test.
Issue
4:
January 06
ICP
180 Source
Page 8
of
26
Printed: 18-Jan-06, 8:44