Oxford-100-Manual.pdf - 第288页
Plasma lab System 100 (ICP 180) Contents Oxford Instruments Plasma Technology Illustrated Parts Catalogue Contents ii Introduction iii Location of major components v Section 0 System common components 0-1 Section 1 Inten…
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-ICP
180
Issue
2:
November
2002
Plasma
lab
System
100
(ICP
180)
Contents
Oxford
Instruments
Plasma
Technology
Illustrated Parts Catalogue
Contents
ii
Introduction
iii
Location
of
major
components
v
Section
0
System
common
components
0-1
Section 1
Intentionally
left
blank
Section 2
Intentionally
left
blank
Section
3 Process
chambers
3-1
Section 4
Intentionally
left
blank
Section
5
Lower
electrode
5-1
Section
6
RF
plasma
generation,
power
supplies
6-1
Section
7
Vacuum
measurement
7-1
Section
8
Pumping
pipework
8-1
Section
9 Process gas
handling
9-1
Section
10
Wafer
handling
options,
load
locks
and
robotics
10-1
Section
11
Spares 11-1
Section
12
Accessories 12-1
Page ii
of
vi
Issue
2:
November 02
Printed:
16-Jan-06. 15:55
Plasma
lab
System
100
(ICP
180)
Introduction
Oxford
Instruments
Plasma
Technology
Illustrated Parts Catalogue
This Illustrated Parts Catalogue has been prepared
to
enable
the
rapid
identification
of
components
of
the
Oxford
Instruments Plasma Technology
Plasma
lab
System
100
(lCP
180) machine.
The catalogue
is
not
a comprehensive list
of
all machine components,
for
details
of
components
not
included,
please
contact
Oxford
Instruments Plasma Technology (OIPT).
Contact
your
local
OIPT
representative
for
prices;
see
the
last page
of
this
catalogue
for
addresses, phone/fax
numbers and e-mail addresses.
Catalogue
organisation
This catalogue
is
organised
to
mimic
the
OIPT
Bill
Of
Materials
and
Price List
numbering
system
for
ease
of
component
location.
Each
major
system
component
is
identified
by
a
number
of
the
form
AAA·BB·CC:
AAA: 100 represents
the
Plasma
lab
System
100 product.
BB:
System sections
as
follows
(note
that
not
all available numbers are used) :
0: Compulsory elements
of
the
basic system, such
as
frame,
power
box, Programmable Logic
Controllers etc.
1:
Not
applicable
to
the
Plasma
lab
System
100
2:
Not
applicable
to
the
Plasma
lab
System
100
3:
Process chambers
and
their
options.
4:
Not
applicable
to
the
Plasmalab
System
100
5:
Lower
electrode
6:
Plasma generation, power supplies.
7:
Vacuum measurement.
8: Pumping
pipework.
9:
Process gas lines
10: Wafer handling options, load locks and robotics
11: Spare series
12: Accessories, cover plates, chillers, end
point
detectors etc.
The sections
in
this
catalogue
are
numbered
to
match these system sections.
So
for
example,
if
you
are
looking
for
a process
chamber
component,
you
will
find
it
in Section
3.
CC:
Sub assembly
numbering.
Issue
2:
November
02
Printed: 16-Jan-06, 15:55
Page
iii
of
vi