Oxford-100-Manual.pdf - 第309页
Plasmalab System 100 (ICP 180) Oxford Instruments Plasma Technology Illustrated Parts Catalogue Section 5 - Lower electrode Section 5 • Lower electrode 1 5.1 Standard He backed lower electrode with centrally positioned 3…
Plasmalab
System 100
(ICP
180)
Oxford
Instruments
Plasma
Technology
Illustrated
Parts
Catalogue
3.2
Common
process
chamber
option
spares
OIPT
Part
No.
Qtv
Description
ICP
180
SOURCE
(180
mm
DIAMETER)
MDOOD18559 1
PERSPEX
WINDOW
MDOOD18684 1
WINDOW
MESH
MD81D15869
1 GASKET
MDOOC18541 1 QUARTZ TUBE
(ICP
SOURCE)
MDOOC18542
1
ALUMINA
TUBE
(ICP
SOURCE)
MDOOB18547 1 ELECTROSTATIC SHIELD
GIVAC/FIT/978 2
25
010 x 2
mm
SAPPHIRE
WINDOW
G/SEUO-K/235
1
3.53 x 79.0
mm
KALREZ
'0'
RING BS235
G/SEUO-K/219 1 3.53 x 32.9
mm
KALREZ
'0'
RING BS219
G/SEUO-
K/264 2 3.53 x 190.1
mm
KALREZ
'0'
RING BS264
G/SEUO-K/117
1 2.63 x 20.3
mm
KALREZ
'0'
RING BS117
GIV
AC/SEU015 1
NW16
CENTERING RING
ALUMINIUM
GIVAC/SEU025 1
NW25
CENTERING RING
GIVAC/FIT/980 1 SIGHT
GLASS
(NW25)
ICP
PROCESS
CHAMBER WITH SINGLE VIEWPORT
AND
SIDE ACCESS DOOR
FOR
ICP180 SOURCE (1
00·3·41
C)
GIVAC/SEU040 1
NW40
CENTERING RING
G/GAS/FIT/614 1
Y<i
RETAINING GASKET
G/SEUO-V/265 1 3.5 x 196.4
mm
VITON
'0'
RING BS265
G/SEUO-V/268 1 3.5 x 215.5
mm
VITON
'0'
RING 200-268
3.3 ICP180 source
option
spares
OIPT
Part
No.
Qtv
Description
G/SUNIDWU920 2
SIS
DOWEL 10.006/10
GIVAC/SUN/032 1 EDWARDS
VACUUM
INTERLOCK SWITCH
ESZ91007
1 MICRO SWITCH 331-45
GIV
AC/SEU040
1
NW40
CENTERING RING
G/SEUO-V/269 1 3.5 x 221.85
mm
VITON
'0'
RING 200-269
GIVACIVLV/930
1 46 x 236
MESC
VALVE
(ALUMINIUM)
CHAMBER
AND
HEATER PUMP
DOWN
KITS
EXZ0200
1
SERIES
2 ON/OFF HEATER CONTROL
EQTOO02
1 TH'COUPLE
TYPE
K 200/C (replaces EQF0100)
G/SUN/HETI010 1
FIREROD
W'
x 101
LG
240V
250W
Process
Chambers
Section 3 Page 4
of
4
Issue
2:
November
02
Printed: 16-Jan-06. 15:55
Plasmalab System 100
(ICP
180)
Oxford Instruments Plasma Technology
Illustrated Parts Catalogue
Section 5 -
Lower
electrode
Section
5 •
Lower
electrode
1
5.1
Standard He backed
lower
electrode
with
centrally
positioned
3-pin
lift
and
wafer
clamp assembly
(100-5-36A)
I (100-5-36A101 - Anodised) 2
5.2
RIE
+ He vari
height
table
(100-5-26A) 4
5.3 Cryo
table
(100-5-12A) I (100-5-12A11 - Anodised) 6
5.4
Helium
pipe
run
8
5.5
Lower
electrode
option
spares 9
Issue
2:
November
02
Printed: 16-Jan-06.15:55
Section 5 Page 1
of
10
Lower
Electrode
Plasma
lab
System
100
(ICP
180)
Oxford
Instruments
Plasma Technology
Illustrated Parts Catalogue
5.1
Standard
He backed
lower
electrode
with
centrally
positioned
3-pin
lift
and
wafer
clamp
assembly
{100-5-36A} I
(100-5-36A/01
-
Anodised)
J)"
--~
---0
c
8
®--
@
®
-~
---@
@}
DETAllA 0
Lower
Electrode
Section 5 Page 2
of
10
Issue
2:
November
02
Printed:
16-Jan-06,15:55