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SEMI E90-0705 © SEMI 1999, 2005 28 NOTICE: SEMI makes no warranties or represen tations as to the suitability o f the standards set forth herein for any particular application. The determination of the suitability of the…

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SEMI E90-0705 © SEMI 1999, 2005 27
RELATED INFORMATION 1
NOTICE: This related information is not an official part of SEMI E90. This related information was approved for
publication by full letter ballot procedures on January 14, 2000.
R1-1 Substrate State Model Implementation
R1-1.1 The Substrate Object State Model defined in ¶9.1 is a generic representation of the substrate object state
model that includes standard transitions for various equipment types.
R1-1.2 Some equipment may not be able to implement all of the transitions defined in this model. For example, the
transition from AT WORK to AT SOURCE (Transition Number 3) represents the case where the substrate returns to
the original (source) location, typically for further processing. If the equipment is unable to implement this return,
then the transition would never occur, and it should be omitted from the implemented state model.
R1-1.3 The state model shall be implemented based on the definition of the state model; however, substates and
transitions that cannot occur for a particular equipment design may be omitted where the model allows.
R1-2 Example of Substrate Object State Model for Simple Equipment
R1-2.1 This section shows an example of Substrate Object State Model for simple equipment. (See Figure R1-1.)
R1-2.2 The equipment transports the substrate only in a forward direction, so that the Substrate Transport Substate
takes straight forward transitions from AT SOURCE to AT WORK and then to AT DESTINATION. For example,
the wirebonder removes leadframes from a magazine and carries them on a transport mechanism but is unable to
return them to the magazine.
R1-2.3 Also, the equipment processes the substrate only in forward steps so that the Substrate Processing Substate
takes straight forward transitions from NEED PROCESSING to IN PROCESS and then to PROCESSING
COMPLETE. The REJECTED state is not applied to this equipment.
SUBSTRATE
IN PROCESS
NEEDS PROCESSING
PROCESSED
C
ABORTED
STOPPED
AT SOURCE
AT WORK
AT DESTINATION
PROCESSING COMPLETE
1
9
7
5
2
10
12
11
SUBSTRATE PROCESSING
SUBSTRATE TRANSPORT
4
Figure R1-1
Substrate State Model for Simple Equipment
SEMI E90-0705 © SEMI 1999, 2005 28
NOTICE: SEMI makes no warranties or representations as to the suitability of the standards set forth herein for any
particular application. The determination of the suitability of the standard is solely the responsibility of the user.
Users are cautioned to refer to manufacturer's instructions, product labels, product data sheets, and other relevant
literature, respecting any materials or equipment mentioned herein. These standards are subject to change without
notice.
By publication of this standard, Semiconductor Equipment and Materials International (SEMI) takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any items mentioned in this
standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and
the risk of infringement of such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction of
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI E90.1-0705 © SEMI 2001, 2005 1
SEMI E90.1-0705
PROVISIONAL SPECIFICATION FOR SECS-II PROTOCOL
SUBSTRATE TRACKING
This specification was technically approved by the global Information & Control Committee. This edition
was approved for publication by the global Audits and Reviews Subcommittee on April 7, 2005. It was
available at www.semi.org in June 2005 and on CD-ROM in July 2005. Originally published March 2001;
previously published July 2003.
1 Purpose
1.1 This document maps the services and data of SEMI E90 to SECS-II streams and functions, and data definitions.
2 Scope
2.1 This is a specification covering equipment supporting automated substrate tracking.
2.2 This document applies to all implementations of SEMI E90 that use the SECS-II message protocol (SEMI E5).
Compliance to this standard requires compliance to both SEMI E90 and SEMI E5.
2.3 This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of
the users of this standard to establish appropriate safety and health practices and determine the applicability of
regulatory limitations prior to use.
2.4 This standard is provisional. To have the provisional status removed, the following must be completed:
Table 1, Services Message Mapping Table
Table 3, Services Parameters to SECS-II Data Items Mapping
NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
3 Referenced Standards and Documents
3.1 SEMI Standards
SEMI E5 — SEMI Equipment Communications Standard 2 Message Content (SECS-II)
SEMI E30 — Generic Model for Communications and Control of Manufacturing Equipment (GEM)
SEMI E39.1 — SECS-II Protocol for Object Services Standard (OSS)
SEMI E53 — Event Reporting
NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions.
4 Mapping
4.1 This section shows the specific SECS-II streams and functions that shall be used for SECS-II implementation of
the services defined in SEMI E90, as well as the parameter mapping for data attached to services.
4.2 Message Mapping
4.2.1 Services Message Mapping — Table 1 defines the relationships between SEMI E90 services and SECS-II
messages.
4.2.2 Event Message Mapping — Table 2 defines the relationships between SEMI E90 collection events and SECS-
II messages.