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SEMI F33-0998 © SEMI 1998 5 of the user of t he method. If an accurac y sta tement is given, then a p rop agati on of er ror calc ulatio n must be provided to estim ate t he accuracy of t he validation. NOTICE: T hese st…

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SEMI F33-0998 © SEMI 19984
Table 4 Common Masses in Helium Bulk Gas
m/z Ions Source
4He
+
Bulk Gas
5HeH
+
Analyte
8He
2
+
Bulk Gas
9He
2
H
+
Analyte
12 He
3
+
Bulk Gas
12 C
+
Analyte
14 N
+
Analyte
15 CH
3
+
Analyte
16 He
4
+
Bulk Gas
16 CH
4
+
Analyte
18 H
2
O
+
Analyte
20 Ne
+
Bulk Gas Isotope
22 HeH
2
O
+
Analyte
24 NeHe
+
Bulk Gas Impurity
26 He
2
H
2
O
+
Analyte
28 N
2
+
Analyte
28 CO
+
Analyte
28 He
7
+
Bulk Gas
32 O
2
+
Analyte
40 Ar
+
Bulk Gas Impurity
44 CO
2
+
Analyte
44 ArHe
+
Bulk Gas Impurity
NOTE: In APIMS, the same ion may be formed even though different
parent molecules are introduced into the ionization region. Thus, it is
necessary to be sure that the chosen m/z represents the ion of interest
and that the ion of interest originates from the molecule of interest.
14 Procedure
14.1 Zero gas should be passed through the dilution
system and the APIMS. Based on prior calibrations, the
system should be below 100 ppt, or at least an order of
magnitude lower than the lowest calibration point, for
the impurities to be calibrated.
14.2 Prior to beginning the calibration, record all
relevant parameters, such as discharge voltage, lens
voltages, ionization chamber pressure and/or flow, gas
type, etc.
14.3 The user should use the zero gas only, plus a
minimum of 5 challenge concentrations, with a
minimum of 5 data points, with the blended data points
spanning the range of interest of impurity measurement,
excluding the zero point, while maintaining constant
flow to the APIMS. Allow each challenge concentration
to stabilize for at least 15 minutes, and the signal
variation should be less than 3% before taking data
points at that concentration. Record the relevant ion
intensities as a function of time, for each stabilized
concentration.
14.4 Once the linearity of the calibration has been
established, a single point calibration check is
permitted, as long as the accuracy of the dilution system
is confirmed.
15 Calculations or Interpretation of Results
15.1 Perform a regression analysis for the individual
ion intensities against the impurity concentration. Be
sure to use only ion intensities below the saturation
region of your APIMS ion counting electronics, if using
counting detection. (Ask the manufacturer for the
saturation region of the units counting electronics.) The
R
2
from the fit of all the regression coefficients should
be 0.98 or above. If this is not the case, the calibration
will have to be repeated as described in the previous
section.
16 Reporting Results
16.1 As a minimum, the calibration will include the
following information for each impurity:
y = c
0
+ c
1
* x
(
1)
where,
y is the ion intensity, c
0
is ion intensity
background, c
1
is the linear response factor,
and x is the impurity level.
16.2 As an option, a quadratic regression may be
reported for the calibration, and will include the
following information for each impurity:
y = c
0
+ c
1
* x + c
2
* x
2
(2)
where,
y is the ion intensity, c
0
is ion intensity
background, c
1
is the first order response
factor, c
2
is the second order response factor
and x is the impurity level.
The c
0
/c
1
ratio or negative x - intercept is
useful to define the background concentration
of each particular ion. All regression coefficients
should be reported.
17 Precision and Accuracy
17.1 This method does not explicitly consider the
estimation of the accuracy of the impurity standard in
detail, because such a calculation can be made by
applying procedures described elsewhere. The precision
and accuracy required in validation will vary with the
proposed application and may be left to the discretion
SEMI F33-0998 © SEMI 19985
of the user of the method. If an accuracy statement is
given, then a propagation of error calculation must be
provided to estimate the accuracy of the validation.
NOTICE: These standards do not purport to address
safety issues, if any, associated with their use. It is the
responsibility of the user of these standards to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
SEMI makes no warranties or representations as to the
suitability of the standards set forth herein for any
particular application. The determination of the
suitability of the standard is solely the responsibility of
the user. Users are cautioned to refer to manufacturer’s
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other relevant literature respecting any materials
mentioned herein. These standards are subject to
change without notice.
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compliance with this standard may require use of
copyrighted material or of an invention covered by
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takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
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of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
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the contents in whole or in part is forbidden without express written
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SEMI F34-0998 © SEMI 19981
SEMI F34-0998
GUIDE FOR LIQUID CHEMICAL PIPE LABELING
1 Purpose
1.1 This document establishes a recommended scheme
for labeling liquid process chemical piping systems
used in semiconductor manufacturing facilities and
equipment.
1.2 consistent labeling system facilitates rapid
identification of piping contents and avoids confusion
within the industry by eliminating the need for each
company or locality to develop their own guides.
2 Scope
2.1 This guide applies to compone nts typically found
in a liquid process chemical piping system for
semiconductor manufacturing processes. The following
list of included components is not exhaustive:
Piping
Valves
Filters
Regulators
Tubing
3 Limitations
3.1 This guide does not replace or supersede any
labeling or identification requirements established by
local, state, or national authorities. Local laws and
regulations should be reviewed to ensure compliance.
3.2 This guide does not apply to containers regulated
by the United States Department of Transportation
(DOT), International Air Transport Association (IATA)
or other regulatory bodies.
3.3 This guide was prepared to address piping systems
conveying liquid process chemicals located within
semiconductor facilities. See Sections 6.6 and 6.11 for
application inside equipment.
4 Referenced Documents
NOTE: All documents cited should be the latest published
versions.
4.1 ANSI Document
1
ANSI/ASME A13.1 — Scheme for the Identification of
Piping Systems
5 Terminology
5.1 liquid chemical distribution system — The
collection of components and subsystems used to
control and deliver liquid process chemicals from a
source location to a point of use in a semiconductor
manufacturing facility.
6 Recommendations
6.1 Piping system labels and identification, should be
designed, and implemented in accordance with the
following recommendations.
6.2 The following color schemes should be used to
identify all liquid process chemical piping systems.
When a chemical has characteristics of more than one
category, the color scheme should be determined by the
most significant health or safety hazard of the chemical.
6.3 Background colors may be applied to the piping by
using pigments, paints, or other means acceptable to the
owner; or may be applied as the background color for
labels or tags used to identify the contents of the piping
system.
6.4 Primary label information consists of the name of
the material contained in the piping system; spelled out
in the predominant language of the country or region
where the piping system is used. Additional languages
may be used to supplement the primary language.
1 American National Standards Institute, 11 West 42nd Street, 13th
floor, New York, NY 10036, USA, Telephone:+ 1.212.642.4900,
Telefax:+ 1.212.398.0023, E-mail: info@ansi.org, WWW:
http://www.ansi.org/