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SEMI F61-0301 © SEMI 2001 1 SEMI F61-0301 GUIDE FOR ULTRA P URE W A TER SYSTEM USED IN SEMICONDUCTOR PROCESSING This g u ide w as technica ll y a pproved by the Global Facilitie s Committee and is t he direct responsibil…

SEMI F60-0301 © SEMI 200111
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SEMI F61-0301 © SEMI 20011
SEMI F61-0301
GUIDE FOR ULTRAPURE WATER SYSTEM USED IN
SEMICONDUCTOR PROCESSING
This guide was technically approved by the Global Facilities Committee and is the direct responsibility of the
North American Facilities Committee. Current edition approved by the North American Regional Standards
Committee on November 22, 2000. Initially available at www.semi.org December 2000; to be published
March 2001.
1 Purpose
1.1 This guide establishes the typical definitional
requirements for an ultrapure water (UPW) system used
in semiconductor manufacturing. It is intended to
establish a common basis for developing detailed
specifications in subsequent documents concerning
design, performance and certification and monitoring of
UPW systems.
1.2 This document may be used by users and suppliers
as a basis for developing site-specific UPW
specifications and performance criteria.
2 Scope
2.1 This guide applies to ultrapure water systems used
in semiconductor manufacturing facilities for supplying
high purity water for chemical dilutions, wafer
processing and other manufacturing processes.
2.2 This guide can be used to understand the design
elements and functionality of all UPW systems, which
includes a Reverse Osmosis (RO) and a Deionization
(DI) process. However, it is most applicable to newer
designed UPW systems that support submicron
linewidth device manufacturing.
2.3 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
3 Limitations
3.1 This guide does not define the actual specifications
generally negotiated between the user and the
manufacturer of the UPW system, against which water
samples are tested and qualification is passed.
3.2 This guide does not address the testing and
prequalification of materials, subassemblies, or
components used in a UPW system.
3.3 This guide does not address the protocols and
requirements defined by the manufacturer concerning
the installation of the UPW system.
3.4 This guide does not address the type, level, or
frequency of testing necessary and appropriate for
ongoing monitoring of a UPW system.
3.5 This guide does not address the frequency or scope
of ongoing maintenance for UPW systems including
change out of resin beds and replacement of filters.
3.6 This guide does not intend to cover any of the
important safety considerations that relate to the proper
installation, operation, or maintenance of a UPW
system.
4 Terminology
4.1 Acronyms and Abbreviations
4.1.1 TOC Total organic carbon, also Total
Oxidizable Carbon. Refers to organic compounds.
4.1.2 UPW — Ultrapure Water System consisting of
multiple components including a Reverse Osmosis
(RO) and a Deionization (DI) process.
4.2 Definitions
4.2.1 activated Carbon a media filter used to
remove oxidizing agents, like chlorine and chloramines,
and remove (adsorb) certain TOC compounds.
4.2.2 anion a negatively charged ion.
4.2.3 cation a positively charged ion.
4.2.4 clarifier a piece of water treatment
equipment, typically used at municipal drinking water
plants, to remove suspended solids from surface water
and/or to soften surface water.
4.2.5 degasification the removal of a certain
amount of volatile compounds dissolved in water.
4.2.6 deionization (DI) the removal of undesirable
ions from water.
4.2.7 DI storage generally refers to a storage tank
that contains DI water, located between the primary and
polishing ion exchange subsystems.
4.2.8 DI (deionized) water generally refers to water
that has passed through a full-train ion exchange system
or RO water that has been polished by ion exchange.

SEMI F61-0301 © SEMI 2001 2
4.2.9 dissolved solids contaminants in water that
are so small that they are uniformly distributed, includ-
ing ions and the smallest TOC and silica compounds.
4.2.10 dual-beds an ion exchange scheme where a
cation exchange unit is followed by an anion exchange
unit.
4.2.11 electrodeionization (EDI) a water treatment
technology that utilizes mixed-bed ion exchange plus
an electrical potential to remove undesirable dissolved
solids. Also referred to in the industry as CDI
(Continuous Deionization).
4.2.12 filtration the removal of suspended solids by
passing water through some form of solid or semi-solid
medium.
4.2.13 final filter generally the final treatment step
in a UPW system; used to remove suspended solids.
4.2.14 full-train DI an ion exchange scheme where
a cation exchange unit is followed by an anion
exchange unit and a mixed-bed ion exchange unit.
4.2.15 ground water water located below the
surface of the earth, also called well water.
4.2.16 heat exchanger a piece of equipment used to
control the temperature of a water stream.
4.2.17 ion exchange a water treatment technology
used in a high-purity water treatment application to
exchange undesirable cations for hydrogen ions and
undesirable anions for hydroxide ions.
4.2.18 loop the distribution system that includes the
continuous circulation of UPW from the Final Filter
back to the DI storage tank. End users draw off of the
loop.
4.2.19 low-pressure UV units units that use UV
lamps that have a slight vacuum within. Typically,
low-pressure lamps are called 254 nm for ozone
destruction and bacterial inactivation or 185 nm for
TOC reduction.
4.2.20 medium-pressure UV units units that use UV
lamps that have a positive pressure within. Used with
bacterial inactivation/ozone destruction lamps or TOC
reduction lamps.
4.2.21 microfiltration generally refers to filters
designed to remove suspended solids less then one
micron in size but greater than 0.1 micron in size.
4.2.22 mixed-beds ion exchange vessels used to
polish already purified water, in which both cation and
anion exchange occurs.
4.2.23 multimedia filter generally refers to a
suspended-solids removal piece of equipment that
contains two or more filtering media such as anthracite
and sand, or anthracite, sand and garnet.
4.2.24 Ozone Ozone (O
3
) may be injected into the
Supply and/or Return line to control microbiological
contaminants and also to enhance the action of TOC
breakdown in downstream TOC reducing UV units.
4.2.25 polishing ion exchange a cation/anion
exchange step located downstream of primary ion
exchange.
4.2.26 pretreated water generally refers to treated
water that is fed to reverse osmosis (RO) units.
4.2.27 primary ion exchange the first cation/anion
exchange step in a high purity water treatment scheme.
4.2.28 raw water any untreated natural water like
river water, lake water, ground water, or seawater.
May also refer to the treated feed water that enters a
plant from a municipal drinking water source or other
source.
4.2.29 return the UPW sent to but not used by end
users that returns to the DI storage tank.
4.2.30 reverse osmosis (RO) a filtration technology
that utilizes a semi-permeable membrane to remove
essentially all suspended solids and the vast majority of
all dissolved solids. Generally refers to water
(permeate) that has passed through a reverse osmosis
(RO) membrane.
4.2.31 RO storage generally refers to a storage tank
that contains RO water.
4.2.32 scale inhibitor a chemical used to minimize
or eliminate the precipitation of slightly-soluble salts,
like calcium carbonate (limestone) or calcium sulfate
(gypsum), within water treatment equipment
.
4.2.33 supply the UPW sent to end users.
4.2.34 surface water water located on the surface
of the earth, such as river water, lake water, and
seawater.
4.2.35 TOC total organic carbon, also Total
Oxidizable Carbon. Refers to organic compounds.
4.2.36 treated water water that has passed through
water treatment equipment and/or received chemical
injections in order to modify the dissolved and/or
suspended solids content of the water.
4.2.37 ultrafiltration generally refers to filters
designed to remove all submicron suspended solids.
4.2.38 ultraviolet (UV) electromagnetic energy
with around a 100–400 nm (nanometer) wavelength.