semi合集-English.pdf - 第4952页
SEMI M11-0704 © SEMI 1988, 2004 9 Figure 7 The Epitaxial Stacking Fault Cluster cl assification is us ed to define a group of ESFs in close proximity on t he wafer surface. The group can ei ther be overlapping or in a li…
SEMI M11-0704 © SEMI 1988, 2004 8
Figure 6
Double Epi taxial Stacking Fault. Atomic Force Microscope image. Approximate SSIS event scattering size
1.05 µm
SEMI M11-0704 © SEMI 1988, 2004 9
Figure 7
The Epitaxial Stacking Fault Cluster classification is used to define a group of ESFs in close proximity on the
wafer surface. The group can either be overlapping or in a line (except when the line appears to be part of a
Pre-Epi Scratch). Magnification 500 times using Nomarski Interference Microscopy. Approximate SSIS
event size, 0.20 µm
20
µ
m
SEMI M11-0704 © SEMI 1988, 2004 10
Figure 8
Composite Defect of polysilicon growth and stacking faults. Magnification 1000 times by Nomarksi
Interference Microscopy. Approximate SSIS image event size >>1.0 µm
2
µ
m