semi合集-English.pdf - 第5023页

SEMI M18-0704 © SEMI 1990, 2004 9 5.2 Front Surface Thin Film(s) Appl [ ]None [ ]Description : 100023 5.3 Denuded Zone [ ]None [ ]Description: 100024 5.4 Extrinsic Gettering Treatment [ ]None [ ]Description : 100025 5.5 …

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SEMI M18-0704 © SEMI 1990, 2004 8
Measurement Position SEMI MF81 Fig. 1 - [ ]A, [ ]B, [ ]C, [ ]D;
[ ] JEIDA 18; [ ]DIN 50435
Calculation Method [ ]SEMI MF81; [ ]JEIDA 18; [ ]DIN 50435;
[ ]Other:
2.3 Resistivity Striations Not greater than [ ]% 100008
2.4 Minority Carrier
Lifetime
Greater than [ ]µs
100009
Test Method SEMI MF28 [ ]A, [ ]B; SEMI MF391 [ ]A,
[ ]B;
[ ]SEMI MF1388; [ ]SEMI MF1535; [ ]JEIDA
53;
[ ]JIS H604; [ ]DIN 50440; [ ]Other
3. CHEMICAL CHARACTERISTICS
3.1 Oxygen Concentration Nominal [ ] ± Tolerance [ ]; [ ] × 10
17
cm
-3
;
[ ]ppma
100010
Calibration Factor [ ]SEMI MF1188; [ ]ASTM F121(79);
[ ]ASTM F121(83); [ ] JEIDA 61;
[ ]DIN 50438/1; [ ]Other ____
Measurement Method IR (Interstitial): [ ] SEMI MF1188; [ ] SEMI
MF1619; [ ] JEIDA 61; [ ] DIN 50438-1
SIMS (Total): [ ]SEMI MF1366
[ ]GFA (Total)
3.2 Radial Oxygen Variation Not greater than [ ]% 100011
Measurement Position SEMI MF951 Plan [ ]A, [ ]B, [ ]B1, [ ]C, [ ]D;
[ ]Other:__
Calculation Method SEMI F951 Plan [ ]A, [ ]B, [ ]B1, [ ]C, [ ]D;
[ ] Other:__
3.3 Carbon Concentration Not greater than [ ] [ ]ppma; [ ] × 10
16
cm
-3
100012
Measurement Method [ ]SEMI MF1391; JEIDA 56; [ ]DIN 50438/2;
[ ]Other:____
3.4 Boron Concentration in
Heavily Doped n-type Si
Not greater than [ ] ppba 100013
4. STRUCTURAL CHARACTERISTICS
4.1 Dislocation Etch Pit
Density
[ ]Not greater than [ ]/cm
2
100014
4.2 Slip [ ]None [ ]Other ___ 100015
4.3 Lineage [ ]None [ ]Other ___ 100016
4.4 Twin [ ]None [ ]Other ___ 100017
4.5 Swirl [ ]Not greater than [ ]% of wafer area 100018
4.6 Shallow Pits Not greater than [ ]/cm
2
100019
4.7 Oxidation Induced
Stacking Faults (OSF)
Not greater than [ ]/cm
2
100020
Test Cycle ASTM F 416 Cycle-[ ]1 [ ]2 [ ]3;
[ ] SEMI MF 1727; [ ]Other:__
4.8 Oxide Precipitates
(BMD)
Range: [ ] to [ ]
Unit: [ ] cm
2
[ ] cm
3
100021
Test Cycle SEMI MF1239 [ ]A, [ ]B; [ ] Other:_____
4.9 Interstitial Oxygen
Reduction (∆O
I
)
Range: [ ] to [ ] [ ]ppma, [ ] × 10
17
cm
-3
100162
Test Cycle SEMI MF1239 [ ]A, [ ]B; [ ] Other:_____
5. WAFER PREPARATION CHARACTERISTICS
5.1 Wafer ID Marking [ ]None; [ ]SEMI M12; [ ]SEMI M13;
[ ]SEMI T1; [ ]SEMI T2; [ ] SEMI T7;
[ ]Other:_____
100022
SEMI M18-0704 © SEMI 1990, 2004 9
5.2 Front Surface Thin
Film(s) Appl
[ ]None [ ]Description: 100023
5.3 Denuded Zone [ ]None [ ]Description: 100024
5.4 Extrinsic Gettering
Treatment
[ ]None [ ]Description: 100025
5.5 Backseal [ ]None [ ]Description: 100026
5.6 Annealing [ ]None [ ]Description: 100027
6. MECHANICAL CHARACTERISTICS
THE ITEMS LISTED IN THIS SECTION MAY BE
6.01 [ ] Specified According to SEMI M1_____ 100028
OR SPECIFIED INDIVIDUALLY
♦
6.1 Diameter
1
Nominal [ ] ± Tolerance [ ] mm 100029
♦
6.2 Primary Flat
Length/Diameter Notch
Dimensions
1
[ ]SEMI M1._______; [ ]Other:___mm 100030
♦
6.3 Primary Flat/Notch
Orientation
1
[ ]SEMI M1._______; [ ]Other: 100031
♦
6.4 Secondary Flat Length
1
[ ]SEMI M1._______; [ ]Other:___mm; [
]None
100032
♦
6.5 Secondary Flat Location
1
[ ]SEMI M1._______; [ ]Other:___; [ ]None 100033
♦
6.6 Edge Profile
1
[ ]SEMI Standard [ ]Other:_____ 100034
♦
6.7 Thickness
1
Nominal [ ] ± Tolerance [ ] µm 100035
Method [ ]SEMI MF533; [ ]SEMI MF1530; [ ]JIS H
611;
[ ]DIN 50441/1; [ ]Other
6.8 Thickness Variation
(TTV)
1
[ ]SEMI M1._______; [ ]Other: [ ] µm 100036
Measurement Position [ ]SEMI MF533; [ ]SEMI MF657; [ ]SEMI
MF1530; [ ]JIS H 611; [ ]DIN 50441/1; [
]Other:_____
♦
6.9 Surface Orientation [ ]0.00 ± 0.50; [ ]2.50 ± 0.50; [ ]4.00 ± 0.50;
[ ] Other:_____
100037
Method [ ]SEMI MF26; [ ]JEIDA 18; [ ]DIN 50433;
[ ]Other:_____
6.10 Bow
1
[ ]SEMI M1._______; [ ]Other:___ µm 100038
Method [ ]SEMI MF534; [ ]JIS H 611; [ ]Other:_____
6.11 Warp
1
[ ]SEMI M1._______; [ ]Other: ___ µm
Method [ ]SEMI MF657; [ ]SEMI MF1390;
[ ]Other:_____
100039
100040
SEMI
MF657
SEMI
MF1390
6.12 Sori [ ]_______µm 100041
Method [ ] SEMI MF1451; [ ] JEIDA 43
6.13 Flatness/Global Acronym:
2
[ ] [ ] [ ] [ ] Value: [ ]µm
100042
Method [ ]SEMI MF1530;
[ ]DIN 50441/3; [ ]Other:_____
SEMI M18-0704 © SEMI 1990, 2004 10
6.14 Flatness/Site Acronym:
2
[ ] [ ] [ ] [ ] Value: [ ]µm
Site Size ___×___ mm
Total Sites___
% Usable Area___
[ ] Include partial sites
[ ] Offset: x = [ ] mm, y = [ ] mm
100043
100044
100045
100046
100047
100048
100049
100050
100221
SF3R
SF3D
SFLR
SFLD
SFQR
SFQD
SBIR
SBID
SFSD
6.15 Fixed Quality Area Value: [ ]mm dia 100164
7. FRONT SURFACE CHEMISTRY
7.1 Surface Metal Contamination
Sodium [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100051
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1617 (SIMS);
[ ]Other:_____
Aluminum [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100052
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1617 (SIMS);
[ ]Other:_____
Potassium [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100053
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1617 (SIMS);
[ ]SEMI M33 (TXRF); [ ]Other:_____
Chromium [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100054
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS; [
]Other:_____
Iron [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100055
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SEMI MF1617
(SIMS); [ ]Other:_____
Nickel [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100056
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]Other:_____
Copper [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100057
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]Other:_____
Zinc [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100058
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]Other:_____
Others (List Separately)
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100059
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100060
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100061
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100062