semi合集-English.pdf - 第5025页

SEMI M18-0704 © SEMI 1990, 2004 11 Method []ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF); [ ]SEMI M33 (TXRF); [ ]SIMS; [ ]Other:_____ [ ]Not greater th an [ ]atoms/cm 2 ; [ ]Other 100063 Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526…

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SEMI M18-0704 © SEMI 1990, 2004 10
6.14 Flatness/Site Acronym:
2
[ ] [ ] [ ] [ ] Value: [ ]µm
Site Size ___×___ mm
Total Sites___
% Usable Area___
[ ] Include partial sites
[ ] Offset: x = [ ] mm, y = [ ] mm
100043
100044
100045
100046
100047
100048
100049
100050
100221
SF3R
SF3D
SFLR
SFLD
SFQR
SFQD
SBIR
SBID
SFSD
6.15 Fixed Quality Area Value: [ ]mm dia 100164
7. FRONT SURFACE CHEMISTRY
7.1 Surface Metal Contamination
Sodium [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100051
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1617 (SIMS);
[ ]Other:_____
Aluminum [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100052
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1617 (SIMS);
[ ]Other:_____
Potassium [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100053
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1617 (SIMS);
[ ]SEMI M33 (TXRF); [ ]Other:_____
Chromium [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100054
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS; [
]Other:_____
Iron [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100055
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SEMI MF1617
(SIMS); [ ]Other:_____
Nickel [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100056
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]Other:_____
Copper [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100057
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]Other:_____
Zinc [ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100058
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]Other:_____
Others (List Separately)
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100059
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100060
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100061
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100062
SEMI M18-0704 © SEMI 1990, 2004 11
Method []ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100063
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
[ ]Not greater than [ ]atoms/cm
2
; [ ]Other
100064
Method [ ]ICP/MS; [ ]AAS; [ ]SEMI MF1526 (TXRF);
[ ]SEMI M33 (TXRF); [ ]SIMS;
[ ]Other:_____
7.2 Surface Organics [ ]Not greater than [ ]ngrams/cm
2
100065
Method [ ]SEMI MF1982; [ ]Other:_____
8. FRONT SURFACE VISUAL INSPECTION CHARACTERISTICS
THE ITEMS LISTED IN THIS SECTION MAY BE
8.01 [ ] Specified According to SEMI M1 Table 1 100066
OR SPECIFIED INDIVIDUALLY
8.1 Scratches
3
[ ]SEMI M1 Table 1 [ ]Other: 100067
8.2 Pits
3
[ ]SEMI M1 Table 1 [ ]Other: 100068
8.3 Haze
3
[ ]SEMI M1 Table 1 [ ]Other: 100069
8.4 Localized Light
Scatterers (LLS)
3
[ ]SEMI M1 Table 1
[ ]Other:
Size: [ ] µm Count: ≤ [ ]
Size: [ ] µm Count: ≤ [ ]
Size: [ ] µm Count: ≤ [ ]
Size: [ ] µm Count: ≤ [ ]
Size: [ ] µm Count: ≤ [ ]
100070
100071
100072
100073
100074
100075
100076
100077
100078
100079
100080
100081
100082
100083
100084
100085
100086
100087
100088
100089
100090
≥0.50 µ
≥0.30 µ
≥0.20 µ
≥0.19 µ
≥0.18 µ
≥0.17 µ
≥0.16 µ
≥0.15 µ
≥0.14 µ
≥0.13 µ
≥0.12 µ
≥0.11 µ
≥0.10 µ
≥0.09 µ
≥0.08 µ
≥0.07 µ
≥0.06 µ
≥0.05 µ
≥0.04 µ
≥0.03 µ
≥0.02 µ
Method [ ]SEMI MF523; [ ]SEMI MF1620; [ ]JIS H
614;
[ ]JEIDA 24; [ ]Other:______
8.5 Contamination/Area
3
[ ]SEMI M1 Table 1 [ ]Other: 100091
8.6 Edge Chips
3
[ ]SEMI M1 Table 1 [ ]Other: 100092
8.7 Edge Cracks
3
[ ]SEMI M1 Table 1 [ ]Other: 100093
8.8 Cracks, Crow's Feet
3
[ ]SEMI M1 Table 1 [ ]Other: 100094
8.9 Craters
3
[ ]SEMI M1 Table 1 [ ]Other: 100095
8.10 Dimples
3
[ ]SEMI M1 Table 1 [ ]Other: 100096
8.11 Grooves
3
[ ]SEMI M1 Table 1 [ ]Other: 100097
8.12 Mounds
3
[ ]SEMI M1 Table 1 [ ]Other: 100098
8.13 Orange Peel
3
[ ]SEMI M1 Table 1 [ ]Other: 100099
8.14 Saw Marks
3
[ ]SEMI M1 Table 1 [ ]Other: 100100
8.15 Dopant Striation Rings [ ] 100101
SEMI M18-0704 © SEMI 1990, 2004 12
8.16 Stains [ ] 100102
9. BACK SURFACE VISUAL INSPECTION CHARACTERISTICS
THE ITEMS LISTED IN THIS SECTION MAY BE
9.01 [ ] Specified According to SEMI M1 Table 1 100103
OR SPECIFIED INDIVIDUALLY
9.1 Edge Chips
3
[ ]SEMI M1 Table 1 [ ]Other: 100104
9.2 Cracks, Crow's Feet
3
[ ]SEMI M1 Table 1 [ ]Other: 100105
9.3 Contamination/Area
3
[ ]SEMI M1 Table 1 [ ]Other: 100106
9.4 Saw Marks
3
[ ]SEMI M1 Table 1 [ ]Other: 100107
9.5 Stains [ ] 100108
9.6 Roughness [ ] 100109
9.7 Brightness [ ] 100110
9.8 Scratches – macro [ ]None; [ ]Cum Length =[ ]mm 100165
9.9 Scratches – micro [ ]None; [ ]Cum Length =[ ]mm 100166
9.10 Localized Light
Scatterers
Size: [ ] µm Count: ≤ [ ]
Size: [ ] µm Count: ≤ [ ]
100167
100168
10. OTHER CHARACTERISTICS
10.1 Bulk defects by X-ray
topography
[ ]Value:_____ 100169
Method [ ]DIN 50443/1; [ ]Other:_____
Part 3 Epitaxial Wafer
CUSTOMER:
P
ART NUMBER: REVISION
D
ATE:
TESTING LEVEL EDI Sub
WAFER TEST PIECE
Code Param
REQUIRED
ITEM SPECIFICATION
100% SAMP
LE
100% SAMP
LE
ID ID
11. GENERAL EPITAXIAL WAFER AND LAYER CHARACTERISTICS
THE ITEMS LISTED IN THIS TABLE MAY BE
11.01 [ ] Specified According to SEMI M11 Table [ ] 100170
OR SPECIFIED INDIVIDUALLY
♦
11.1 Conductivity
Type/Structure
[ ]n/n+ [ ]p/p+ [ ]Other:_____ 100111
♦
11.2 Dopant [ ]B [ ]Phos [ ]As 100112
11.3 Silicon Source Gas [ ]SiH
4
; [ ]SiH
2
Cl
2
; [ ]SiHCl
3
; [ ]SiCl
4
100113
11.4 Growth Method Reactor Type [ ] Pressure [ ] 100114
♦
11.5 Net Carrier Density
(Resistivity)
Nominal [ ] ± Tolerance [ ] (check unit
below)
100115
Units [ ]10[ ]atoms/cm
3
; [ ]Ωcm
Test Method [ ]ASTM F419 - [ ]Gated, [ ]Ungated,
[ ]Schottky; [ ]SEMI MF374 (4-Pt);
[ ]SEMI MF525 (SRP); [ ]SEMI MF1392 (Hg-
CV); [ ] SEMI MF1393; [ ]DIN 50439; [ ]DIN
50444; [ ]DIN 50447; [ ]Other ____
♦
11.6 Net Carrier Density
Variation
[ ]Not greater than [ ]%
[ ]SEMI M2; [ ]SEMI M11 Table [ ]
100116
Measurement Position [ ]SEMI M2; [ ]SEMI M11; [ ]Other:_____
Calculation [ ]SEMI M2; [ ]SEMI M11; [ ]Other:_____