semi合集-English.pdf - 第5039页

SEMI M18-0704 © SEMI 1990, 2004 25 ITEM VALUE STANDARD REFERENCE A STANDARD TEST METHODS IS IN M2 IS IN M11 IS REQ’D B SEMI M2 SEMI M11 JEIDA ASTM SEMI JIS JEIDA DIN 13.13 Foreign Matter YES YES NO Table 1 Table 1 MF523 …

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SEMI M18-0704 © SEMI 1990, 2004 24
Epitaxial Wafer
ITEM VALUE STANDARD REFERENCE
A
STANDARD TEST METHODS
IS IN
M2
IS IN
M11
IS
REQ’D
B
SEMI M2SEMI M11 JEIDA ASTM SEMI JIS JEIDA DIN
11. GENERAL EPITAXIAL LAYER CHARACTERISTICS
11.1 Conductivity Type/Structure NO NO YES Sec 3 Sec 3
11.2 Dopant NO NO YES Sec 3 Sec 3
11.3 Silicon Source Gas NO NO NO Sec 3 Sec 3
11.4 Growth Method NO NO NO Sec 3 Sec 3
11.5 Net Carrier Density
(Resistivity)
NO NO YES Sec 3 Sec 3 F 419 MF1392,
MF1393
(MF374,
MF398,
MF525,
MF723)
50439
(50444,
50447)
11.6 Net Carrier Density Variation
(Resistivity Variation)
YES NO YES Sec 3, 5 Sec 3, 5 50439
11.7 Thickness NO NO YES Sec 3 Sec 3 MF95,
MF110,
MF672
50436,
50437
11.8 Thickness Variation YES NO YES Sec 3, 5 Sec 3, 5
11.9 Transition Width NO NO NO
11.10 Flat Zone NO NO NO
11.11 Phantom Layer NO NO NO
12. MECHANICAL CHARACTERISTICS
D
12.1 Bow NO NO NO M1 Sec
9
M1 Sec 9 MF534 H 611
12.2 Warp NO NO NO M1 Sec
9
M1 Sec 9 MF657,
MF1390
12.3 Sori NO NO NO M1 Sec
9
M1 Sec 9
12.4 Flatness/Global NO NO NO M1 Sec
9
M1 Sec 9 DEF
43
MF1530 50441/3
12.5 Flatness/Site NO NO NO M1 Sec
9
M1 Sec 9 MF1530
12.6 Fixed Quality Area NO NO NO M1 Sec
9
M1 Sec 9 MF1530
13. EPITAXIAL LAYER VISUAL INSPECTION CHARACTERISTICS
D
13.1 Stacking Faults YES YES NO Table 1 Table 1 F 522 50446
13.2 Slip YES YES NO Table 1 Table 1 F 47,
F 80
MF523 50446
13.3 Large Point Defects YES YES NO Table 1 Table 1 F 815 MF523 50446
13.4 Total Point Defects YES YES NO Table 1 Table 1 F 815 MF523 50446
13.5 Scratches YES YES NO Table 1 Table 1 MF523
13.6 Dimples YES YES NO Table 1 Table 1 MF523
13.7 Orange Peel YES YES NO Table 1 Table 1 MF523
13.8 Cracks/Fractures YES YES NO Table 1 Table 1 MF523
13.9 Crow's Feet YES YES NO Table 1 Table 1 MF523
13.10 Edge Chips YES YES NO Table 1 Table 1 MF523
13.11 Edge Crown YES YES NO Table 1 Table 1 50446
13.12 Haze YES YES NO Table 1 Table 1 MF523 50446
SEMI M18-0704 © SEMI 1990, 2004 25
ITEM VALUE STANDARD REFERENCE
A
STANDARD TEST METHODS
IS IN
M2
IS IN
M11
IS
REQ’D
B
SEMI M2SEMI M11 JEIDA ASTM SEMI JIS JEIDA DIN
13.13 Foreign Matter YES YES NO Table 1 Table 1 MF523
14. BACK SURFACE VISUAL INSPECTION CHARACTERISTICS
14.1 Contamination YES YES NO Table 1 Table 1 MF523
15. OTHER CHARACTERISTICS
Annealed Wafer
ITEM VALUE STANDARD
REFERENCE
A
STANDARD TEST METHODS
IS IN
SEMI
IS
REQ'D
B
SEMI JEIDA ASTM SEMI
J
IS JEIDA DIN
20. GENERAL ANNEALED WAFER CHARACTERISTICS
20.1 Annealing Atmosphere NO YES
20.2 Co-Dopant in Crystal NO YES
21. MECHANICAL CHARACTERISTICS
D
21.1 Bow YES NO M1 Sec 9 MF534 H 611
21.2 Warp YES NO M1 Sec 9 MF657,
MF1390
21.3 Sori NO NO M1 Sec 9 MF1451 43
21.4 Flatness/Global NO NO M1 Sec 9 MF1530 50441/3
21.5 Flatness/Site NO NO M1 Sec 9 MF1530
21.6 Fixed Quality Area NO NO M1 Sec 9 MF1530
22. FRONT SURFACE VISUAL INSPECTION CHARACTERISTICS
D
22.1 Stacking Faults YES NO M2 Table 1 MF1810 50446
22.2 Slip YES NO M2 Table 1 MF523,
MF1726
50446
22.3 Other Defect YES NO M2 Table 1 MF523,
MF1726
50446
23. BACK SURFACE VISUAL INSPECTION CHARACTERISTICS
23.1 Contamination YES NO M1 Table 1 MF523
23.2 Other
24. OTHER CHARACTERISTICS
24.1 Depth of BMD Denuded Zone NO NO
24.2 BMD Density NO NO MF1239
24.3 Other
SEMI M18-0704 © SEMI 1990, 2004 26
SOI Wafer
ITEM VALUE
STANDARD
REFERENCE
A
STANDARD TEST METHODS
IS IN
M47
IS
REQ'D
B
SEMI M47 JEITA SEMI JIS JEITA DIN
25 SOI LAYER CHARACTERISTICS
25.0 Type of SOI YES YES Table 1
25.1 Starting silicon wafer for SOI YES NO Table 1
25.2 Surface Silicon Thickness YES YES Table 1
25.3 Surface Silicon Thickness Mean
Value Variation
YES NO Table 1
25.4 Surface Silicon Thickness Variation
in Wafer
YES YES Table 1
25.5 Crystal Orientation YES NO Table 1 SEMI MF26
25.6 Rotation Misalignment YES NO Table 1
25.7 Edge Exclusion,
Nominal
YES NO Table 1
25.8 Non-SOI Edge Area YES NO Table 1
25.9 Conductivity Type YES NO Table 1 SEMI MF42
25.10 Dopant YES NO Table 1
25.11 Dopant Concentration YES NO Table 1
25.12 SOI Etch Pit YES NO Table 1
25.13 Threading Dislocation YES NO Table 1
25.14 HF Defect YES NO Table 1
25.15 Void YES NO Table 1
25.16 Roughness (Si surface)
rms @ 2 × 2 µm
YES NO Table 1 EM-3505
Roughness (Si surface)
rms @ 10 × 10 µm
YES NO Table 1 EM-3505
Roughness (Si surface)
rms @ [ ] × [ ] µm
YES NO Table 1 EM-3505
Roughness (Si surface)
rms @ [ ] × [ ] µm
YES NO Table 1 EM-3505
25.17 Surface Metal Contamination (Fe) YES NO Table 1 SEMI MF1526
Surface Metal Contamination (Cr) YES NO Table 1 SEMI MF1526
Surface Metal Contamination (Ni) YES NO Table 1 SEMI MF1526
Surface Metal Contamination (Cu) YES NO Table 1 SEMI MF1526
Surface Metal Contamination [ ] NO NO SEMI MF1526
Surface Metal Contamination [ ] NO NO SEMI MF1526
Surface Metal Contamination [ ] NO NO SEMI MF1526
Surface Metal Contamination [ ] NO NO SEMI MF1526
Surface Metal Contamination [ ] NO NO SEMI MF1526
Surface Metal Contamination [ ] NO NO SEMI MF1526
26 BOX CHARACTERISTICS
26.1 BOX Thickness YES YES Table 1