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SEMI M49-0704 © SEMI 2001, 2004 10 2. MEASUREMENT FUNCTIONS Item Recommended Specif ication Technology Generation 130 nm 90 nm 9 65 nm 9 Grade A B A B A B Comments and References 2.1.1 Thickness (Center Point Thickness) …

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SEMI M49-0704 © SEMI 2001, 2004
9
Item Recommended Specification Comments References
1.3 Wafer Characteristics – electrical,
optical
1.3.1 Electrical Resistivity of Wafers,
Conductivity Type
0.5 mΩcm – intrinsic, p-, n-type Res: SEMI MF673
DIN 50445
SEMI MF84
DIN 50431
Type: SEMI MF42 or
DIN50432
1.3.2 Thermal Donors annealed and not annealed
1.3.3 Wafer Charge no effect with respect to
measurement
1.3.4 Layers (LTO, poly-Si), Epi LTO: thickness: 150 – 900 nm
uniformity: ≤ 10%
poly-Si: thickness: ≤ 2 µm
uniformity: < 20%
Epitaxial layer: customer specific
1.3.5 Wafer Surface Conditions front surface: polished, annealed,
or epitaxial layer
back surface: polished, acid
and/or caustic etched, layers
according to Item 1.3.4
optional conditions of
both surfaces: etched,
lapped, as cut
Table 3 Metrology Specific Equipment Characteristics
1. REFERENCE WAFER PROPERTIES (These wafer specifications refer only to wafers to be used for verifying the
performance of the measurement equipment, see Section 6.5.18. They do not refer to product wafers.)
130 nm node 90 nm node 65 nm node
Property
nominal nominal nominal
1.1 Thickness (200 mm wafers),
µm
725 725 725
1.2 Thickness (300 mm wafers),
µm
775 775 775
1.3 GBIR, nm 1000 1000 1000
1.4 Site Size local flatness, mm
2
25*25 26*8 26*8
1.4.1 SBIR, including
partial sites, nm
250 140 125
1.4.2 SFQR, including
partial sites, nm
130 60 45
1.5 Warp, µm
30 30 30
1.6 Nanotopography, 2 mm, P-V,
nm, at 0.05% defective area
20 16 10
1.7 Nanotopography, 10 mm, P-V,
nm, at 0.05% defective area
70 50 35
SEMI M49-0704 © SEMI 2001, 2004 10
2. MEASUREMENT FUNCTIONS
Item Recommended Specification
Technology Generation 130 nm 90 nm
9
65 nm
9
Grade A B A B A B
Comments and References
2.1.1 Thickness (Center Point Thickness) SEMI M1, SEMI MF1530
2.1.1.1 Level 3 Variability σ
3
(µm, 1 σ) ≤ 0.5 ≤ 1 ≤ 0.5 ≤ 1 ≤ 0.5 ≤ 1
2.1.1.2 Matching Tolerance ∆
m
(µm) ≤ 0.75 ≤ 1.5 ≤ 0.75 ≤ 1.5 ≤ 0.75 ≤ 1.5
2.1.1.3 Bias (µm) ≤ 0.75 ≤1.5 ≤ 0.75 ≤ 1.5 ≤ 0.75 ≤ 1.5
target until certified reference
materials are available
2.1.1.4 Spatial Bandwidth
f
min
(mm
–1
)
f
max
(mm
–1
)
0
1
Nominal value ± 5% tolerance
2.1.2 Global Flatness (GBIR) SEMI M1 Appendix 1;
SEMI MF1530; JEIDA 43
2.1.2.1 Level 3 Variability σ
3
(nm, 1 σ) ≤ 30 ≤ 65 ≤ 30 ≤ 65 ≤ 30 ≤ 65
2.1.2.2 Matching Tolerance ∆
m
(nm) ≤ 50 ≤ 100 ≤ 50 ≤ 100 ≤ 50 ≤ 100
2.1.2.3 Bias (nm)
≤ 50 ≤ 100 ≤ 50 ≤ 100 ≤ 50 ≤ 100
target until certified reference
materials are available
2.1.2.4 Spatial Bandwidth
f
min
(mm
–1
)
f
max
(mm
–1
)
0
1
Nominal value ± 5% tolerance
2.1.3 Local Flatness (SBIR) SEMI M1 Appendix 1; SEMI
MF1530; JEIDA 43; DIN 50441-5
2.1.3.1 Level 3 Variability σ
3
(nm, 1 σ) ≤ 8 ≤ 17 ≤ 4.7 ≤ 9.3 ≤ 4.2 ≤ 8.3
2.1.3.2 Matching Tolerance ∆
m
(nm) ≤ 12 ≤ 26 ≤ 7 ≤ 14 ≤ 6.3 ≤ 12.5
2.1.3.3 Bias (nm)
≤ 12 ≤ 26 ≤ 7 ≤ 14 ≤ 6.3 ≤ 12.5
target until certified reference
materials are available
2.1.3.4 Spatial Bandwidth
f
min
(mm
–1
)
f
max
(mm
–1
)
0
1
Nominal value ± 5% tolerance
2.1.4 Local Flatness (SFQR) Specifications apply on a site-by-site
basis; SEMI M1 Appendix 1; SEMI
MF1530; JEIDA 43; DIN 50441-5
2.1.4.1 Level 3 Variability σ
3
(nm, 1 σ) ≤ 4.5 ≤ 9 ≤ 2 ≤ 4 ≤ 1.5 ≤ 3
2.1.4.2 Matching Tolerance ∆
m
(nm) ≤ 7 ≤ 13 ≤ 3 ≤ 6 ≤ 2.3 ≤ 4.5
2.1.4.3 Bias (nm)
≤ 7 ≤ 13 ≤ 3 ≤ 6 ≤ 2.3 ≤ 4.5
target until certified reference
materials are available
2.1.4.4 Spatial Bandwidth
f
min
(mm
–1
)
f
max
(mm
–1
)
0
1
Nominal value ± 5% tolerance
2.1.5 Shape (Warp, GMLYMER) SEMI M1 Appendix 2; SEMI
MF1390; JEIDA 43; DIN 50441-5
2.1.5.1 Level 3 Variability σ
3
(µm, 1 σ) ≤ 1 ≤ 2 ≤ 1 ≤ 2 ≤ 1 ≤ 2
2.1.5.2 Matching Tolerance ∆
m
(µm) ≤ 1.5 ≤ 3 ≤ 1.5 ≤ 3 ≤ 1.5 ≤ 3
2.1.5.3 Bias (µm) ≤ 1.5 ≤ 3 ≤ 1.5 ≤ 3 ≤ 1.5 ≤ 3
9 The values for variability, matching and bias for the 90 and 65 nm technology nodes are rounded to one significant decimal digit for those
parameters which scale with the technology generations. Otherwise the values for the 130 nm genertaion are repeated.
SEMI M49-0704 © SEMI 2001, 2004
11
2. MEASUREMENT FUNCTIONS
Item Recommended Specification
Technology Generation 130 nm 90 nm
9
65 nm
9
Grade A B A B A B
Comments and References
2.1.5.4 Spatial Bandwidth
f
min
(mm
–1
)
f
max
(mm
–1
)
0
1
Nominal value ± 5% tolerance
2.1.6 Other Global Flatness Parameters SEMI M1 Appendix 1; SEMI
MF1530; JEIDA 43; DIN 50441-5
2.1.6.1 GFLR, GFLD required
2.1.7 Other Local Flatness Parameters SEMI M1 Appendix 1; SEMI
MF1530; JEIDA 43; DIN 50441-5
2.1.7.1 SPID, SFLR, SFLD, SFQD,
SFSR, SFSD
required
2.1.8 Other Shape Parameters SEMI M1 Appendix 2; SEMI
MF1390; JEIDA 43; DIN 50441-5
2.1.8.1 Sori (GFLYFER), Bow
(GM3YMCD), Warp (GB3NMPR)
required
2.2 Nanotopography These parameters refer to flatness
measurement of individual surfaces;
see SEMI M43.
2.2.1 Analysis Area Size = 2 mm
2.2.1.1 Level 3 Variability σ
3
(nm, 1 σ) ≤ 0.7 ≤ 1.3 ≤ 0.5 ≤ 1.1 ≤ 0.3 ≤ 0.7
2.2.1.2 Matching Tolerance ∆
m
(nm) ≤ 1
≤
≤ 0.8 ≤ 1.6 ≤ 0.5 ≤ 1
2.2.1.3 Bias (nm)
≤ 1 ≤ 2 ≤ 0.8 ≤ 1.6 ≤ 0.5 ≤ 1
target until certified reference
materials are available
2.2.1.4 Spatial Bandwidth
f
min
(mm
–1
)
f
max
(mm
–1
)
0.05
2.5
Nominal value ± 5% tolerance;
optionally a range of f
min
= 0.25 mm
–1
to f
max
= 2.5 mm
–1
2.2.2 Analysis Area Size = 10 mm
2.2.2.1 Level 3 Variability σ
3
(nm, 1 σ) ≤ 2.5 ≤ 5 ≤ 1.7 ≤ 3.3 ≤ 1.2 ≤ 2.3
2.2.2.2 Matching Tolerance ∆
m
(nm) ≤ 3.8 ≤ 7.5 ≤ 2.5 ≤ 5 ≤ 1.8 ≤ 3.5
2.2.2.3 Bias (nm)
≤ 3.8 ≤ 7.5 ≤ 2.5 ≤ 5 ≤ 1.8 ≤ 3.5
target until certified reference
materials are available
2.2.2.4 Spatial Bandwidth
f
min
(mm
–1
)
f
max
(mm
–1
)
0.05
2.5
Nominal value ± 5% tolerance;
optionally a range of f
min
= 0.05 mm
–1
to f
max
= 0.5 mm
–1
2.3 Other Parameters
2.3.1 Waviness user specific
2.3.2 Height (individual wafer surfaces) user specific
2.3.3 Slope user specific
2.3.4 Curvature user specific
2.3.5 Line Scans user specific
2.3.6 Contour Maps user specific
2.3.7 Data Histogram 10 or more bins per channel, arbitrarily
definable, cumulative differential
2.3.8 Edge Roll-off user specific
2.3.9 Additional Parameters user specific