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SEMI P10-0705 © SEMI 1990, 2005 115  REVERSE — (T or F) Reverse the tone of th e output layer. If T (true) a negative image of the layer is produced. R EVERSE is perform ed after all sizing and scal ing have bee n compl…

SEMI P10-0705 © SEMI 1990, 2005 114

8.1.28 BIN_SIZE — size of defect for SEVERITY_CRITERION_REQD sorting.

8.1.29 BLANK_BIREFRINGENCE_REQD — (number) The required degree to which the substrate used to make

the mask refracts an incident beam of unpolarized light into two separate beams of opposite polarization, expressed

as nanometers per centimeter (nm/cm).

8.1.30 BLANK_BIREFRINGENCE_USED — (number) The measured degree to which the substrate used to make

the mask refracts an incident beam of unpolarized light into two separate beams of opposite polarization, expressed

as nanometers per centimeter (nm/cm).

8.1.31 BLANK_DATE_OF_MFG — (date) The date of manufacture of the substrate used to make the mask as

supplied by the mask blank vendor.

8.1.32 BLANK FLATNESS — (0.25, 0.5, 1, 2, 5, 10, 20, or other numeric value) Flatness within quality area (see

SEMI P1).

8.1.33 BLANK_FLATNESS_USED — The flatness within the quality area of the mask blank used, as specified by

the mask blank supplier or as measured by the mask vendor.

8.1.34 BLANK_GRADE — (text) A designation of the relative defectivity of the substrate as specified by the mask

blank vendor.

8.1.35 BLANK_INDEX_OF_REFRACTION — (number) The ratio of the velocity of light of a given wavelength

in a vacuum to the velocity of light in the substrate used to make the mask.

8.1.36 BLANK_LENGTH — (number) The X-axis dimension of the substrate used to make the mask, as specified

by the mask blank vendor.

8.1.37 BLANK_LOT — (text) The mask blank vendor’s manufacture lot identification for the substrate used to

make the mask.

8.1.38 BLANK_SIZE — (2.5/60, 3/60, 3.5/60, 4/60, 4/90, 4/250, 5/60, 5/90, 5/250, 6/90, 6/120, 6/150, 6/250,

7/120, 7/150, 7/250, 7.25R/150 or 9/350) Nominal edge length (in inches) and thickness (in mils) of square

substrate; 7.25R/150 is a round substrate. (See SEMI P1.)

8.1.39 BLANK_THICKNESS — (number) The Z-axis dimension of the substrate used to make the mask, as

specified by the mask blank vendor.

8.1.40 BLANK_TYPE — (DFS, MFS, HTE, LTE, ULTE, WC, SL or EUV) Durable Fused Silica, Modified Fused

Slica, high-, low-, and ultralow thermal expansion glass (see SEMI P1.) WC and SL indicate White Crown and soda

lime glass. EUV is for Extreme Ultraviolet applications.

8.1.41 BLANK_VENDOR — (text) Standard vendor identification code for the mask blank vendor of the substrate

used to make the mask.

8.1.42 BLANK_WIDTH — (number) The Y-axis dimension of the substrate used to make the mask, as specified

by the mask blank vendor.

8.1.43 BLANKET_PO_NUMBER — Alphanumeric blanket purchase order number.

8.1.44 BOOLEAN — Logical operation to be performed on one or more following pattern files. Data value

meanings are:

 NONE — no logical operation to be performed; sizing/scaling may still be performed,

 OR — logical union of two files,

 AND — logical intersection of two files,

 NOT — logical inverse of one file,

 XOR — logical union of two files, excluding all areas in which the two intersect, and

 MINUS — logical difference between input file 1 and input file 2; i.e., logically removing from input file 1 the

portions of all digitized geometry which overlap with digitized geometry in input file 2.

SEMI P10-0705 © SEMI 1990, 2005 115

 REVERSE — (T or F) Reverse the tone of the output layer. If T (true) a negative image of the layer is

produced. REVERSE is performed after all sizing and scaling have been completed for the current data

manipulation step. The default value for REVERSE is F (false).

8.1.45 BOTTOM_PELLICLE_CENTRALITY_ERROR — (x,y,rotation) Maximum misplacement in micrometers

and microradians of pellicle mounting, relative to the nominal center of the mask. The nominal center is determined

using the bottom and left edges (chrome side up).

8.1.46 BOTTOM_PELLICLE_TYPE — Alphanumeric brand and model of acceptable pellicle for the glass side of

the mask. If multiple pellicles are listed, they are listed with the most preferred first and then in declining

preference.

8.1.47 BOTTOM_PELLICLE_USED — (text) The pellicle vendor’s part number of the pellicle applied to the

nonpatterned surface of the mask.

8.1.48 BUSINESS_ADDRESS — Address of person placing the order.

8.1.49 BUSINESS_CONTACT — Name of person placing the order.

8.1.50 BUSINESS_EMAIL — Internet address for BUSINESS_CONTACT.

8.1.51 BUSINESS_FAX — Phone number for facsimile machine of BUSINESS_CONTACT.

8.1.52 BUSINESS_PHONE — Phone number for BUSINESS_CONTACT.

8.1.53 BUTTING_ERROR — Maximum misalignment of features due to stitching of adjacent fields in the

segmented writing of a mask.

8.1.54 BUTTING_ERROR_METHOD — Alphanumeric description of the method to be used to measure butting

error.

8.1.55 CD_CORRELATION_ID — Alphanumeric date or other identification of the vendor/customer correlation

test to be used in measuring CDs.

8.1.56 CD_DATA — Size of critical dimension feature in data as supplied in the pattern file.

8.1.57 CD_DENSE_GROUP — Identifies a <cd_group> for use in iso/dense analysis. Data field must match data

field of a START_CD in a <cd_group>. The <cd_group> must contain CD_MORPHOGRAPHY with data value

DENSE.

8.1.58 CD_DEVIATION_FROM_MEAN — (numeric) Maximum acceptable deviation of any of the customer-

required CD measurements from the mean of those measurements. (See Related Information 1 at the end of this

standard.)

8.1.59 CD_DEVIATION_FROM_TARGET — (numeric) Maximum acceptable deviation of any of the customer-

required CD measurements from the CD_TARGET. If only one data value (p) appears in the data field, the tolerance

is considered +/- symmetrically about CD_TARGET. If two data values ( p [,m] ) appear, then the first is the

maximum amount by which deviation is allowed larger than CD_TARGET, and the second is the maximum amount

by which deviation is allowed smaller than CD_TARGET. The comma and second half of the argument are optional

in the syntax (p[,m]) where p = the positive and m = the negative value for non-symmetric tolerances; if only p is

specified, the positive and negative tolerances are assumed to be symmetric. (See Related Information 1 at the end

of this standard.)

8.1.60 CD_DIGITIZED — (T or F) If T, critical dimension in pattern is digitized data.

8.1.61 CD_DRAWING — The uniquely identified (for each customer) document which shows the CD structure

itself, and may show the place within the CD which are to be measured.

8.1.62 CD_EQUIP_REQD — Alphanumeric identification of acceptable equipment for measuring critical

dimensions.

8.1.63

CD_EQUIP_USED — Alphanumeric identification of equipment used for measuring critical dimensions.

8.1.64 CD_FEATURE — Text describing the feature to be used for CD measurement.

SEMI P10-0705 © SEMI 1990, 2005 116

8.1.65 CD_GROUP_NAME — Identifies a <cd_group> to be included in the <cd_set>. The data field must match

the data field of START_CD in the referenced <cd_group>.

8.1.66 CD_HORIZONTAL_ID — CD_SITE_ID of CD_HORIZONTAL_LOCATION.

8.1.67 CD_HORIZONTAL_LOCATION — (x,y) Location of critical dimension feature. The

CD_ORIENTATION of the feature must be HORIZONTAL. If CD_HORIZONTAL_LOCATION appears in

<mask_options>, then the (x,y) coordinates are relative to the nominal center of the mask (chrome side up). If

CD_HORIZONTAL_LOCATION appears in <pattern_options>, then the (x,y) coordinates are relative to the center

of the pattern or cell, before mirroring or scaling. If CD_HORIZONTAL_LOCATION appears in <mask_results>,

then the (x,y) coordinates are relative to the nominal center of the mask (chrome side up), even if the original

CD_HORIZONTAL_LOCATION was in <pattern_options>.

8.1.68 CD_HORIZONTAL_MORPHOGRAPHY — CD_MORPHOGRAPHY of the individual

CD_HORIZONTAL_ID feature.

8.1.69 CD_HORIZONTAL_TONE_CLEAR — CD_TONE_CLEAR of the individual CD_HORIZONTAL_ID

feature.

8.1.70 CD_ISO_DENSE_REFERENCE_ONLY — (T or F) If T, indicates that the <cd_iso_dense_definition> is to

be measured and the data transmitted to the customer (if requested by SHIP_CD_DATA), but that deviations in its

measured value due to mask processing would NOT be cause for mask rejection. (This does not exempt mishandling

of the data in pattern preparation from being a cause for mask rejection.)

8.1.71 CD_ISO_DENSE_TOLERANCE — Maximum acceptable difference of the mean of all measured customer-

defined DENSE critical dimensions from the mean of all measured customer-defined ISOLATED critical

dimensions.

8.1.72 CD_ISO_GROUP — Identifies a <cd_group> for use in iso/dense analysis. Data field must match data field

of a START_CD in a <cd_group>. The <cd_group> must contain CD_MORPHOGRAPHY with data value

ISOLATED.

8.1.73 CD_LOCATION — (x,y) Location of critical dimension feature. If CD_LOCATION appears in

<mask_options>, then the (x,y) coordinates are relative to the nominal center of the mask (chrome side up). If

CD_LOCATION appears in <pattern_options>, then the (x,y) coordinates are relative to the center of the pattern or

cell, before mirroring or scaling. If CD_LOCATION appears in <mask_results>, then the (x,y) coordinates are

relative to the nominal center of the mask (chrome side up), even if the original CD_LOCATION was in

<pattern_options>.

8.1.74 CD_LOCATION_DRAWING — The uniquely identified (for each customer) document which shows the

location of the CD structure.

8.1.75 CD_MATRIX_FILE_NAME — Alphanumeric name of file to be used for critical dimension measurement

locations. It is not to be used in conjunction with CD_LOCATION within the same START_CD to END_CD set.

8.1.76 CD_MATRIX_FILE_FORMAT — (MF2, MF3, KMS and others on request)

8.1.77 CD_MEASURE_DIE — In combination with the associated <placement> definition, specifies the die to be

used for CD measurement.

8.1.78 CD_MEASUREMENT_DATE — Date CD measurement was made.

8.1.79 CD_MORPHOGRAPHY — (DENSE, ISOLATED and others on request) Feature density surrounding CD

location.

8.1.80 CD_ORIENTATION — (VERTICAL or HORIZONTAL) Direction in which the CD feature is to be

scanned for measurement. In other words, a HORIZONTAL CD is scanned in the X direction (left to right), and a

VERTICAL CD is scanned in the Y direction (top to bottom).

8.1.81 CD_PERCENT_CLEAR — Calculated percentage of clear area within CD_PERCENT_CLEAR_WINDOW

in the mask data.

8.1.82 CD_PERCENT_CLEAR_WINDOW — (x1,y1,x2,y2) window coordinates over which

CD_PERCENT_CLEAR is calculated, relative to the nominal center of the mask.