semi合集-English.pdf - 第5626页
SEMI P10-0705 © SEMI 1990, 2005 121 8.1.156 DATABASE_WITH_JOB — (T OR F) Database inspection m ust use job file (DATABASE_JOB _NAME and DATABASE_J OB_LEVEL if suppli ed by cu stomer) to consolidate pattern files. 8.1.157…

SEMI P10-0705 © SEMI 1990, 2005 120
8.1.138 DATA_LAYER_ID — (Layer1;Datatype1[,Layer2;Datatype2,…]) Within DATA_TOP_CELL, a numeric
pair of layer number and layer datatype separated by a semicolon and multiple sets of layers/datatypes separated by
a comma. If no datatype is specified for a layer number, then all data datatypes are assumed to be included for that
layer.
8.1.139 DATA_LOCATION — (text) Site where the data file may be found.
8.1.140 DATA_MEDIUM — (9_TRACK_TAPE, 4MM_DAT, 8MM_DAT, 1/4_INCH_CARTRIDGE, MODEM,
FLOPPY, EMAIL, VPN, FTP, RCP, CDR, CDRW, HARDDRIVE
, ZIPDRIVE, JAZZDRIVE, FLOPPY100MB,
DERIVED) Data transfer medium used for delivering pattern files, fracture files, job files and measure files.
DERIVED indicates files which are the result of <data_manipulation> operations contained within the
<mask_order>.
8.1.141 DATA_OFFSET — For optical masks only, the (x,y) shift to be applied to the data in building the mask.
8.1.142 DATA_PATTERN_NAME — The textual name of a pattern file, either received from the customer or
generated by <data_manipulation>. If the pattern received from the customer is a numbered file in a data volume,
this is the pattern name to be applied to
the file specified by the succeeding DATA_FILE_NUMBER and/or
DATA_TOP_CELL and/or DATA_LAYER_ID. It may be used as input to <data_manipulation> if referenced by
DATA_SOURCE_FILE to generate a new (different) DATA_PATTERN_NAME, or it may be used to identify a
pattern to be written on the mask if referenced by PATTERN_NAME in <pattern_definition>.
8.1.143 DATA_PATTERN_WINDOW — (x1,y1,x2,y2) Establishes the extents of the pattern file in the coordinate
space as received in DATA_SOURCE_FILE. (x1,y1) identifies the lower-left corner; (x2,y2) identifies the upper-
right corner.
8.1.144 DATA_SCALE_FACTOR — (n) (De)Magnifying factor to be used in (de)magnifying both the geometries
and the overall pattern file extents of the current data source.
8.1.145 DATA_SOURCE_FILE — A file provided by the customer to be used in a Boolean fracturing operation, or
file resulting from a <data_manipulation> operation. It must match either a START_DATA_MANIPULATION or a
DATA_PATTERN_NAME defined earlier in the <mask_order>.
8.1.146 DATA_TOP_CELL — Top cell or structure of the design.
8.1.147 DATABASE_AREA — (x1,y1,x2,y2) Unscaled, unmirrored coordinates of the window for database
inspection, lower left and upper right corners, relative to the center and coordinate system of the pattern or cell or, if
a <mask_option>, relative to the nominal center of the mask (chrome side up), after scaling and mirroring.
8.1.148 DATABASE_FILE_NAME — Name of database file to use for database inspection.
8.1.149 DATABASE_INSPECTION — (T or F) If T, database inspection is required.
8.1.150 DATABASE_JOB_LEVEL — Mask level of customer-supplied job file to use for database inspection.
8.1.151 DATABASE_JOB_NAME — Customer-supplied job file to use for database inspection. Should be
omitted if customer does not supply job file.
8.1.152 DATABASE_LAYER — (Layer1;Datatype1[,Layer2;Datatype2,…]) Within DATABASE_TOP_CELL, a
numeric pair of layer number and layer datatype separated by a semicolon and multiple sets of layers/datatypes
separated by a comma. If no datatype is specified for a layer number, then all data datatypes are assumed to be
included for that layer. To be used if DATABASE_SOURCE is GDS-II or OASIS.
8.1.153 DATABASE_SOURCE — (MEBES, PG, GDS-II, OASIS, KLARIS, UNDERIVED, and others on
request) Data source to be used when database inspection is required. KLARIS indicates that KLARIS data was
supplied by the customer. UNDERIVED indicates the customer-supplied data prior to vendor-performed data
manipulation is to be used to produce the inspection data. GDS-II or OASIS indicates that the GDS-II or OASIS
data is being supplied for database inspection, in addition to the customer-supplied MEBES or PG data to be used to
write the mask.
8.1.154 DATABASE_TOP_CELL — Top cell to be used if DATABASE_SOURCE is GDS-II or OASIS.
8.1.155 DATABASE_UNIT — Grid size to be used for fracturing DATABASE_SOURCE into inspection data, as
required by some inspection systems.

SEMI P10-0705 © SEMI 1990, 2005 121
8.1.156 DATABASE_WITH_JOB — (T OR F) Database inspection must use job file (DATABASE_JOB_NAME
and DATABASE_JOB_LEVEL if supplied by customer) to consolidate pattern files.
8.1.157 DEFECT_COUNT — Integer maximum allowable number of defects within the INSPECTION_AREA.
8.1.158 DEFECT_COUNT_REP — Integer maximum number of repeating defects within the
INSPECTION_AREA.
8.1.159 DEFECT_DENSITY — Maximum allowable number of defects per square centimeter within the
INSPECTION_AREA.
8.1.160 DEFECT_EQUIP_REQD — Alphanumeric identification of acceptable equipment for defect inspection.
8.1.161 DEFECT_EQUIP_USED — Defect inspection equipment used.
8.1.162 DEFECT_INSP_DATE — DEFECT inspection date.
8.1.163 DEFECT_INSP_MODE_REQD — Alphanumeric operating mode for DEFECT_EQUIP_REQD.
8.1.164 DEFECT_INSP_MODE_USED — (text) DEFECT_EQUIP_USED operating mode.
8.1.165 DEFECT_INSP_PIXEL_SIZE_REQD — Pixel size used by DEFECT_EQUIP_REQD.
8.1.166 DEFECT_INSP_PIXEL_SIZE_USED — Pixel size used by DEFECT_EQUIP_USED.
8.1.167 DEFECT_INSP_SENSITIVITY_REQD — Sensitivity to be used by DEFECT_EQUIP_REQD.
8.1.168 DEFECT_INSP_SENSITIVITY_USED — Sensitivity used by DEFECT_EQUIP_USED.
8.1.169 DEFECT_QUALITY_ID — (text) Customer’s for a collection of defect quality specifications, to be used
only in addition to explicit quality requirement keywords. This may be used in the data structure in addition to, but
not in place of, explicit quality requirement keywords. This may not be used in combination with
QUALITY_GROUP_ID. Customer and vendor should document the meaning of this quality grade before using it in
SEMI P10.
8.1.170 DEFECT_SETUP_FILE_NAME_REQD — Alphanumeric name of setup file for
DEFECT_EQUIP_REQD.
8.1.171 DEFECT_SETUP_FILE_NAME_USED — Alphanumeric name of setup file for
DEFECT_EQUIP_USED.
8.1.172 DEFECT_SIZE — Maximum dimension of smallest unacceptable defectall types.
8.1.173 DEFECT_SIZE_CL — Maximum dimension of smallest unacceptable clear defect.
8.1.174 DEFECT_SIZE_CL_ADJ — Maximum dimension of smallest unacceptable clear, non-repeating edge
defect.
8.1.175 DEFECT_SIZE_CL_ADJ_REP — Maximum dimension of smallest unacceptable clear, repeating edge
defect.
8.1.176 DEFECT_SIZE_CL_ISO — Maximum dimension of smallest unacceptable clear, repeating isolated defect.
8.1.177 DEFECT_SIZE_CL_ISO_REP — Maximum dimension of smallest unacceptable clear, non-repeating
isolated defect.
8.1.178 DEFECT_SIZE_DK — Maximum dimension of smallest unacceptable dark defect.
8.1.179 DEFECT_SIZE_DK_ADJ — Maximum dimension of smallest unacceptable dark, non-repeating edge
defect.
8.1.180 DEFECT_SIZE_DK_ADJ_REP — Maximum dimension of smallest unacceptable dark, repeating edge
defect.
8.1.181 DEFECT_SIZE_DK_ISO — Maximum dimension of smallest unacceptable dark, non-repeating isolated
defect.

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8.1.182 DEFECT_SIZE_DK_ISO_REP — Maximum dimension of smallest unacceptable dark, repeating isolated
defect.
8.1.183 DEFECT_TYPE — (PINHOLE, EDGE, PINDOT, CD, SEMI_TRANS, MASSIVE, CLIPPED,
PATTERN, REFL_PATTERN, PAT_PINHOLE, REFL_PINHOLE, CORNER, LINE_END, BASIC, ISO,
MID_SIZE and others on request) Setup parameter for defect inspection.
8.1.184 DEFECTIVE_DIE_DENSITY — Maximum allowable number of die with defects per square centimeter
within the INSPECTION_AREA.
8.1.185 DEFECTIVE_DIE_COUNT — Integer maximum allowable number of die with defects within the
INSPECTION_AREA.
8.1.186 DEFECTIVE_DIE_COUNT_REP — Integer maximum number of repeating defective die within the
INSPECTION_AREA.
8.1.187 DELIVERABLE_MASK — (T or F) If F, the mask is to be held internally by the mask shop for the
production of other deliverable masks. For a MASK_ID with MULTIWRITE, only the final write and process step
MASK_ID within the multiwrite group may have DELIVERABLE_MASK = T.
8.1.188 DELIVERY_PRIORITY — Alphanumeric text, to be agreed between the customer and supplier, describing
urgency for delivery (e.g., rush, standard, slow).
8.1.189 DESIGN_RULE — Numeric data field indicates the nominal minimum dimension of wafer geometries.
8.1.190 DIE_TO_DIE_INSPECTION — (T or F) If T, die-to-die inspection is required.
8.1.191 DIE_TO_DIE_MEASUREMENTS – (T or F) If T, indicates that the defect inspection performed was die-
to-die. If F, indicates defect inspection performed was die-to-database.
8.1.192 DIGITIZED_DATA_DARK — (T or F) If T, the image of digitized data is to be opaque on the mask. If F,
the image of digitized data is to be clear.
8.1.193 DROPOUT — (x,y) Row and column of pattern or cell placement which is to be omitted in the array.
These array coordinates are rectangular (even if the actual written array is non-rectangular), with the origin at the
lower left of the array (chrome side up before mirroring).
8.1.194 DUE_DATE_TIME_COMMITTED — (date,time) For delivery (at customer) committed by vendor.
8.1.195 DUE_DATE_TIME_REQUESTED — (date,time) Requested for delivery (at customer).
8.1.196 DXF_ANGLE — (integer) To be used if DATA_FORMAT is DXF.
8.1.197 DXF_UNIT — (integer) To be used if DATA_FORMAT is DXF.
8.1.198 EDGE_ROUGHNESS — The (numeric) maximum value of edge roughness, based on physical
measurements.
8.1.199 ELAPSED_TIME — Numeric hours between masking steps in the wafer fab. Used in conjunction with
LAYER_PRIORITY, provides scheduled due dates based on the delivery of each previous mask. No mask may
have both ELAPSED_TIME and DUE_DATE_REQUESTED. See LAYER_PRIORITY.
8.1.200 ELAPSED_TIME_COMMITTED — Numeric hours for delivery (at customer) committed by vendor.
8.1.201 ELAPSED_WRITE_TIME — (number) The total time in minutes that the given lithography operation took
to write the mask.
8.1.202 EMAIL_ADDRESS — Internet address.
8.1.203 END_BARCODE — (text) must match data field of START_BARCODE.
8.1.204 END_BILLING_INFORMATION — (text) Indicates the end of the <billing_information> section. Must
match data field of START_BILLING_INFORMATION.
8.1.205 END_CD — Alphanumeric data field must match data field of START_CD.