semi合集-English.pdf - 第5629页

SEMI P10-0705 © SEMI 1990, 2005 124 8.1.234 END_MASK_RESULTS — Must match START _MASK_RESULTS da ta field. 8.1.235 EN D_MASK_RESULTS_OPTIONS — Alphanumeric data f ield must match data field of START_ MASK_RESULT S_OPTION…

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SEMI P10-0705 © SEMI 1990, 2005 123
8.1.206 END_CD_GROUP_MEASUREMENTS — (text) must match data field of
START_CD_GROUP_MEASUREMENTS.
8.1.207 END_CD_ISO_DENSE — (text) must match data field of START_CD_ISO_DENSE.
8.1.208 END_CD_ISO_DENSE_RESULTS — (text) must match data field of
START_CD_ISO_DENSE_RESULTS
8.1.209 END_CD_MEASUREMENT — Alphanumeric data field must match data field of
START_CD_MEASUREMENT.
8.1.210 END_CD_SET— Alphanumeric data field must match data field of START_CD_SET.
8.1.211 END_CD_SET_RESULTS — Alphanumeric data field must match data field of
START_CD_SET_RESULTS.
8.1.212 END_CD_XY_DEFINITION — Alphanumeric data field must match data field of
START_CD_XY_DEFINITION.
8.1.213 END_CD_XY_RESULTS — Alphanumeric data field must match data field of
START_CD_XY_RESULTS.
8.1.214 END_CELL — Must match data field of CELL_ID for which data is complete.
8.1.215 END_CELL_INSTANCE — (text) must match data field of CELL_INSTANCE.
8.1.216 END_CELL_INSTANCE_OPTIONS — Must match data field of CELL_INSTANCE for which pattern
options are complete.
8.1.217 END_CELL_OPTIONS — Must match data field of CELL_ID for which options are complete.
8.1.218 END_CLOSURE_MEASUREMENTS — Must match START_CLOSURE_MEASUREMENTS data
field.
8.1.219 END_COATING — (text) Indicates the end of the <coating> section. Must match START_COATING
data field.
8.1.220 END_DATA_FRACTURE — Must match START_DATA_FRACTURE data field.
8.1.221 END_DATA_FUNCTION — Must match START_DATA_FRACTURE data field.
8.1.222 END_DATA_MANIPULATION — (text) must match data field of START_DATA_MANIPULATION.
8.1.223 END_DATA_MEDIUM — Must match data field of DATA_MEDIUM for which data is complete.
8.1.224 END_DATA_PATTERN_NAME — Must match data field of DATA_PATTERN_NAME.
8.1.225 END_DATA_SOURCE_FILE — Must match DATA_SOURCE_FILE data field.
8.1.226 END_DEFECT_DEFINITION — (text) must match data field of START_DEFECT_DEFINITION
8.1.227 END_DEFECT_MEASUREMENTS — (text) must match data field of
START_DEFECT_MEASUREMENTS.
8.1.228 END_ETCH_DEPTH_MEASUREMENTS — Must match START_ETCH_DEPTH_MEASUREMENTS
data field.
8.1.229 END_FTP_HOST — Must match data field of FTP_HOST_NAME.
8.1.230 END_LITHO_INFORMATION — Alphanumeric data field must match data field of
START_LITHO_INFORMATION.
8.1.231 END_MASK — Must match data field of MASK_ID for which data is complete.
8.1.232 END_MASK_GROUP — Must match data field of MASK_GROUP_ID for which data is complete.
8.1.233 END_MASK_GROUP_OPTIONS — Must match data field of MASK_GROUP_ID for which options are
complete.
SEMI P10-0705 © SEMI 1990, 2005 124
8.1.234 END_MASK_RESULTS — Must match START_MASK_RESULTS data field.
8.1.235 END_MASK_RESULTS_OPTIONS — Alphanumeric data field must match data field of
START_MASK_RESULTS_OPTIONS
8.1.236 END_MASK_SET — Must match data field of MASK_SET_ID for which data is complete.
8.1.237 END_MASK_SET_OPTIONS — Must match data field of MASK_SET_ID for which options are
complete.
8.1.238 END_MATERIALS_USED — Alphanumeric data field must match data field of
START_MATERIALS_USED.
8.1.239 END_MEASURED_ETCH_DEPTH_SITE — Must match data field of
MEASURED_ETCH_DEPTH_MARK_SITE_ID.
8.1.240 END_MEASURED_PHASE_ANGLE_SITE — Must match data field of
MEASURED_PHASE_ANGLE_MARK_SITE_ID.
8.1.241 END_MEASURED_REGISTR_MARK — Must match data field of
MEASURED_REGISTR_MARK_ID.
8.1.242 END_MEASURED_TRANSMISSION_SITE — Must match data field of
MEASURED_TRANSMISSION_MARK_SITE_ID.
8.1.243 END_OPC — Must match data field of START_OPC.
8.1.244 END_ORDER — Must match data field of START_ORDER for which data is complete.
8.1.245 END_PATTERN_DEFINITION — Must match data field of LEVEL_ID for which data is complete.
8.1.246 END_PATTERN_GROUP — Must match data field of PATTERN_GROUP_ID for which data is
complete.
8.1.247 END_PATTERN_GROUP_INSTANCE — Must match data field of PATTERN_GROUP_INSTANCE.
8.1.248 END_PATTERN_GROUP_OPTIONS — Must match data field of PATTERN_GROUP_ID for which
options are complete.
8.1.249 END_PATTERN_GROUP_RESULTS — Alphanumeric data field must match data field of
START_PATTERN_GROUP_RESULTS.
8.1.250 END_PATTERN_OPTIONS — Must match data field of START_PATTERN_OPTIONS.
8.1.251 END_PHASE_ANGLE_MEASUREMENTS — Must match data field of
START_PHASE_ANGLE_MEASUREMENTS.
8.1.252 END_PHASE_SHIFT — Must match START_PHASE_SHIFT data field.
8.1.253 END_PHASE_SHIFT_MEASUREMENTS — Must match data field of
START_PHASE_SHIFT_MEASUREMENTS.
8.1.254 END_PLACEMENT — Must match data field of START_PLACEMENT.
8.1.255 END_REGISTR — Must match data field of START_REGISTR.
8.1.256 END_REGISTR_MEASUREMENTS — Must match data field of
START_REGISTR_MEASUREMENTS.
8.1.257 END_REPAIR_DEFINITION — Must match data field of START_REPAIR_DEFINITION.
8.1.258 END_SEM_PHOTO — Must match START_SEM_PHOTO data field.
8.1.259 END_SHIP_FILM — Must match data field of SHIP_FILM.
8.1.260 END_SHIP_PLOT — Must match data field of START_SHIP_PLOT.
8.1.261 END_SHIP_TO — Must match data field of START_SHIP_TO.
SEMI P10-0705 © SEMI 1990, 2005 125
8.1.262 END_SHIPPABLE_DATA — Must match data field of START_SHIPPABLE_DATA.
8.1.263 END_SUBSTRATE — Must match data field of START_SUBSTRATE.
8.1.264 END_SURFACE_DEFINITION — Must match data field of START_SURFACE_DEFINITION.
8.1.265 END_SURFACE_INSP_MEASUREMENTS — Must match data field of
START_SURFACE_INSP_MEASUREMENTS.
8.1.266 END_TITLE — (title number) Indicates end of keywords for a specific title. Must match data field of
START_TITLE for which data is complete.
8.1.267 END_TRANSMISSION_MEASUREMENTS — Must match data field of
START_TRANSMISSION_MEASUREMENTS.
8.1.268 END_VENDOR_INFO — Must match data field of START_VENDOR_INFO.
8.1.269 ENGINEERING_ADDRESS — Address for delivery of shippable engineering data.
8.1.270 ENGINEERING_CONTACT — Name of person to contact for technical questions.
8.1.271 ENGINEERING_EMAIL — Internet address for ENGINEERING_CONTACT.
8.1.272 ENGINEERING_FAX — Phone number for facsimile machine of ENGINEERING_CONTACT.
8.1.273 ENGINEERING_PHONE — Phone number for ENGINEERING_CONTACT.
8.1.274 EQUIP_SITE_REQD — Alphanumeric identification of qualified manufacturing site, to be agreed between
customer and vendor, for preceding required equipment. For a given MASK_ID, EQUIP_SITE_REQD may not be
used in combination with MFG_SITE_REQD.
8.1.275 ESTIMATED_ARRIVAL — The date and time when the vendor predicts MASK_ID will be delivered to
the customer, based on the MILESTONE most recently completed.
8.1.276 ESTIMATED_ARRIVALS — (T or F) If T, the vendor is requested to use <mask_results> to supply a
prediction of the delivery date and time when MASK_ID will be delivered to the customer, based on the
MILESTONE most recently completed. ESTIMATED_ARRIVAL will be transmitted each time <mask_results> is
required by either MILESTONES or PERIODIC_UPDATES. If neither have been requested, then
ESTIMATED_ARRIVAL should be transmitted daily.
8.1.277 ETCH_DEPTH_EQUIP_REQD — (text) Etch depth measurement equipment required by customer.
8.1.278 ETCH_DEPTH_EQUIP_USED — (text)
Etch depth measurement equipment used.
8.1.279 ETCH_DEPTH_ERROR — Maximum allowable deviation (in angstroms) of any etch depth measurement
from ETCH_DEPTH_TARGET.
8.1.280 ETCH_DEPTH_MARK_DRAWING — The uniquely identified (for each customer) document which
shows the etching depth measurement mark structure itself, and may show the place(s) within the etching depth
measurement mark which are to be measured.
8.1.281 ETCH_DEPTH_MARK_FEATURE — Text describing the feature to be used for phase etching depth
measurement.
8.1.282 ETCH_DEPTH_MARK_LOCATION — (x,y) Location of etching depth measurement mark relative to the
nominal center of the mask (chrome side up).
8.1.283 ETCH_DEPTH_MARK_LOCATION_DRAWING — The uniquely identified (for each customer)
document which shows the location(s) of the etching depth measurement mark structure.
8.1.284
ETCH_DEPTH_MEASUREMENT_DATE — Etch depth measurement date.
8.1.285 ETCH_DEPTH_MEASUREMENT_FILE_NAME — Name of data file containing results of etch depth
measurement.
8.1.286 ETCH_DEPTH_MODE_REQD — (text) operating mode required by customer for
ETCH_DEPTH_EQUIP_USED.