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SEMI P10-0705 © SEMI 1990, 2005 128 8.1.331 INSPECT_ALL_SITES — If T, all placements of patterns under this <cell_instance> or <pattern_insta nce> require in-spection, regardless of the number of ins pection …

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SEMI P10-0705 © SEMI 1990, 2005 127
8.1.308 EXTERNAL_WINDOW — (x1,y1,x2,y2) Area to have all digitized data removed outside the window
described by (x1,y1,x2,y2), relative to the coordinate space of DATA_SOURCE_FILE. The extents of the pattern
file are thus defined by the window.
8.1.309 FAB_TECHNOLOGY – (text) Customer’s designation for the fabrication unit’s wafer manufacturing
process
8.1.310 FIGURE_COUNT — Total number of geometries which are expected in the pattern file. If this is incorrect,
the mask will not be written until it is corrected.
8.1.311 FILE_DATE_TIME — (x,y) Date and time of transmission of mask order. Format will be as in § 6.19.
8.1.312 FILM_COLOR — Color to be used for the mask film.
8.1.313 FILM_NORMAL_TONE — (T or F) If T, digitized data will be dark.
8.1.314 FILM_SCALE — Numeric scale of the film of the mask image.
8.1.315 FILM_SIZE — (x,y) Size in inches of the film.
8.1.316 FINAL_AUDIT_DATE_TIME – (date) The date and time of the finalquality audit prior to shipping the
mask to the customer.
8.1.317 FINAL_QC_AUDITOR — (text) Mask supplier identification of
final Quality Control auditor.
8.1.318 FRACTURE_FILE — Alphanumeric file name of fracture instructions provided by the customer with the
mask order.
8.1.319 FRACTURE_FILE_FORMAT — Format of FRACTURE_FILE (CATS, K2, and others on request).
8.1.320 FRACTURING_SCALE — For optical data (Mann or Electromask) only, this is the scale factor to use in
fracturing the data to E-beam format.
8.1.321 [FTP_DIRECTORY] — Name of target directory for FTP data.
8.1.322 FTP_HOST_NAME — Domain of the FTP host, either in the form n.n.n.n where n is an integer from 0 to
255, or in an equivalent text name if such is supported by the FTP site.
8.1.323 [FTP_LOGIN] — The login name for an FTP account. If an anonymous FTP is used, the data field will be
“anonymous”.
8.1.324 [FTP_MODE] — (ASCII, BINARY or AUTO) Data encoding type for FTP data. If absent, default is
BINARY.
8.1.325 [FTP_PASSWORD] — Password for FTP account.
8.1.326 GOOD_FIELDS — Specifies the 1X reticle fields which must pass inspection criteria and is applied to the
cells immediately instanced by the preceding CELL_ID. Fields are referenced by numbers assigned from left to right
according to their position on the mask, chrome side up. For example, for a mask with 5 fields, the fields would be:
1 2 3 4 5
The required good fields are specified by any logical combination of field numbers, “AND”, “OR”, and parentheses.
In the above example, “(1 OR 2) AND (3 OR 4) AND 5” would require that either 1 or 2 be good, and either 3 or 4
be good, and that 5 be good. No logical precedence is assumed; precedence is defined only by parentheses. This
keyword applies only to 1X reticles.
8.1.327 GUIDES_REQD — (STANDARD, WIDE or BOTH) Applies to 1X reticles only.
8.1.328 INPUT_FILE_FORMAT — Format of INPUT_FILE_NAME.
8.1.329 INPUT_FILE_NAME — (text) Name identifying the input file for RUNSET_NAME. If this keyword
appears in the <mask_order>, it must be explicitly referenced in a RUNSET_NAME and/or a
PARAMETER_FILE_NAME.
8.1.330 INSP_DATABASE_DATA_FORMAT — Alphanumeric description of format for
SHIP_INSP_DATABASE_DATA.
SEMI P10-0705 © SEMI 1990, 2005 128
8.1.331 INSPECT_ALL_SITES — If T, all placements of patterns under this <cell_instance> or
<pattern_instance> require in-spection, regardless of the number of inspection tool setups necessary to do so.
8.1.332 INSPECT_THROUGH_PELLICLE — (T or F) If T, the mask must be inspected through the pellicle and
the <defect_definition> and <database_inspection> keywords to be used must follow the
INSPECT_THROUGH_PELLICLE keyword. Unpelliclized inspection may be separately defined and would
precede the INSPECT_THROUGH_PELLICLE keyword.
8.1.333 INSPECTION_AREA — (x1,y1,x2,y2) Unscaled coordinates of window for defect inspection, lower left
and upper right corners, relative to the nominal center of mask, pattern or cell (chrome side up for masks,
unmirrored for patterns or cells).
8.1.334 INSPECTION_AREA_EXCLUDE — (x1, y1, x2, y2) Unscaled coordinates of window to be excluded
from defect inspection. This is commonly referred to as DNIR (Do Not Inspect Region). (See
INSPECTION_AREA.)
8.1.335 INSPECTION_REF_LOCATION — (x,y) Location of reference mark for defect inspection, relative to the
nominal center of the substrate (chrome side up).
8.1.336 INSPECTION_SETUP_FILENAME — Alphanumeric name of setup file for defect inspection equipment.
8.1.337 JOB_ONLY_APPROVAL_REQD — (T or F) Explicit approval of the mask writing control file must be
given by the customer before the mask is to be written or further processed.
8.1.338 JOB_ONLY_APPROVED — Date approval was granted by customer for
JOB_ONLY_APPROVAL_REQD.
8.1.339 JOB_WITH_PATTERNS_APPROVAL_REQD — (T or F) Explicit approval of the mask writing control
file and all referenced pattern files must be given by the customer before the mask is to be written or further
processed.
8.1.340 JOB_WITH_PATTERNS_APPROVED — Date approval was granted by customer for
JOB_WITH_PATTERNS_APPROVAL_REQD.
8.1.341 JOB_FORMAT — (MEBES, EEBES, ATEQ, and others on request) Format of preceding JOB NAME.
8.1.342 JOB_LEVEL — Level of preceding JOB_NAME to be used to make mask.
8.1.343 JOB_NAME — Name of job file to be used to make mask(s).
8.1.344 LAYER_PRIORITY — Sequence number in which masks are needed. Together with ELAPSED_TIME
determines the mask delivery schedule. The first mask (LAYER_PRIORITY=1) is due within its ELAPSED_TIME
from the time it is ordered or released; the second mask is due within its ELAPSED_TIME from when the first mask
was due, or from when the first mask was delivered, whichever is later; and so on.
8.1.345 LEVEL_ID — Numerical indicator of which masks within the mask set will include this pattern. When a
MASK_ID in a MASK_GROUP, which references this PATTERN_GROUP_ID, matches this LEVEL_ID, this
pattern will appear on the mask. When LEVEL_ID is “A”, the pattern will appear on all masks which reference the
pattern group. A given LEVEL_ID value may appear only once in any pattern group. Appearance of “A” as a
LEVEL_ID value precludes any other patterns from the pattern group.
8.1.346 LINE_ITEM_NUMBER — Integer line item number relative to PO_NUMBER.
8.1.347 LITHO_EQUIP_REQD — (EBEAM, OPTICAL, LASER) Acceptable equipment for writing product
mask(s).
8.1.348 LITHO_EQUIP_USED — Type of equipment used for writing product mask(s). See
LITHO_EQUIP_REQD.
8.1.349 LITHO_MODE_REQD — (SPP,MPP,VA,4PASS,8PASS,1000UM, and others on request.) Acceptable
recipe for LITHO_EQUIP_REQD.
8.1.350
LITHO_MODE_USED — The writing methodology used by the lithography tool.
SEMI P10-0705 © SEMI 1990, 2005 129
8.1.351 LITHO_MODEL_REQD — (ALTA_3000, ALTA_3500, ALTA_3700, ALTA_4300, CORE_2000,
CORE_2100, CORE_2500, CORE_2564, EBM_3500, EBM_4000, HL_800, HL_900, HL_950, HL_7000,
JBX_3030, JBX_7000, JBX_9000, LRS_55, LRS_800, MANN_3000, MANN_3600, MANN_3696, MEBES III,
MEBES IV, MEBES_4000, MEBES_4500, MEBES_4700, MEBES_5000, MEBES_5500, MEBES_EXARA,
MM_101, MP_508, OMEGA_6600, SIGMA_7100, SIGMA_7300, TAMARACK_142, TAMARACK_155,
TOSHIBA_4700, TRE_220, ULTRABEAM_V2000, ZBA_21, ZBA_23H, ZBA_31, ZBA_31H+, ZBA_320,
ZBA_340, and others on request) Model of acceptable mask writing equipment.
8.1.352 LITHO_MODEL_USED — The model name of the lithography tool used to perform the lithography
operation. See LITHO_MODEL_REQD.
8.1.353 LOCATION — (x,y) Location of the center of the initial pattern or cell, relative to center of the preceding
CELL_ID (before mirroring or scaling).
8.1.354 LOCATION_SPEC — Alphanumeric identification of customer-supplied specification for pattern or cell
placement.
8.1.355 LOG_FILE_NAME— (text) Name identifying the log output file for RUNSET_NAME. If this keyword
appears in the <mask_order>, it must be explicitly referenced in a RUNSET_NAME and/or a
PARAMETER_FILE_NAME.
8.1.356 MACHINE_SERIAL_NUMBER — (text) The serial number of the lithography tool used to perform the
lithography operation.
8.1.357 MAILING_ADDRESS — Postal address.
8.1.358 MASK_COATING — (HIGH_REFLECTIVE_CHROME, MEDIUM_REFLECTIVE_CHROME,
LOW_REFLECTIVE_CHROME, SEE_THROUGH_CHROME, IRON_OXIDE, CHROME_OXIDE,
EMULSION) or in the case of other coatings, an alphanumeric description. (See SEMI P2.)
8.1.359 MASK_GROUP_ID — Name of the mask group which follows; must be used in all references within this
MASK_SET_ID to this mask group.
8.1.360 MASK_ID — Unique integer identifier of each mask within mask set. All patterns referenced by the
MASK_GROUP_ID’s PLACEMENT_TOP_CELL whose LEVEL_ID’s match this MASK_ID will appear on the
mask. When LEVEL_ID is “A”, the pattern will appear on all masks whose PLACEMENT_-TOP_CELL
references the pattern group.
8.1.361 MASK_NAME — Name used by customer for mask, to be used to cross-reference MASK_ID to
customer’s internal tracking system. This is primarily for the customer’s use only, but should be recorded by the
vendor and reported back in <mask_results>.
8.1.362 MASK_REGISTR_MARK — (x,y) Location of registration reference mark in <mask_order>, relative to
the nominal center of substrate (chrome side up).
8.1.363 MASK_REGISTR_MARK_LOCATION — (x,y) Location of individual registration mark, relative to
nominal center of substrate (chrome side up), based on <mask_order> information. This is the target location for the
mark, reflected in <mask_results>.
8.1.364 MASK_ROTATION — (0, 90, 180 and 270) Degrees to rotate the entire set of mask data (patterns, titles,
barcodes, etc.) counterclockwise (assuming a chrome-up orientation).
8.1.365 MASK_SERIAL_NUMBER — (alphanumeric) The serial number title written on the mask during
lithography - usually numeric, but alphanumeric if agreed by customer and vendor.
8.1.366 MASK_SET_ID — The “name” of the mask set, often the device name or number. This must be used in all
future references to this mask set and must be unique among mask sets ordered by the customer.
8.1.367 MASK_SET_NAME — Name used by customer for mask set, to be used to cross-reference
MASK_SET_ID to customer’s internal tracking system. This is primarily for the customer’s use only, but should be
recorded by the vendor and reported back in <mask_results>.