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SEMI P10-0705 © SEMI 1990, 2005 140 8.1.562 REGISTR_REF_MASK_SET_NAME — To be used in place of REGISTR_-REF _MASK_SET_ID only to refer to those mask sets which were built outside the SEMI order standard an d have no MASK…

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SEMI P10-0705 © SEMI 1990, 2005 139
8.1.544 REGISTR_CLOSURE_REFERENCE_ONLY — (T or F) If T, indicates that the closure measurements are
to be measured and the data transmitted to the customer (if requested by SHIP_CLOSURE_DATA), but that
deviations in its measured value due to mask processing would NOT be cause for mask rejection.
8.1.545 REGISTR_COMPENSATION_TEMPERATURE — Temperature in Celsius of the mask at the time
registration measurement data is to be collected.
8.1.546 REGISTR_EQUIP_REQD — Alphanumeric identification of acceptable equipment for measuring
REGISTR_ERROR and REGISTR_ORTHO.
8.1.547 REGISTR_EQUIP_USED — Registration measurement equipment used.
8.1.548 REGISTR_ERROR — Maximum allowable registration error, relative to the REGISTR_REF_MASK_ID
or the reference grid of REGISTR_EQUIP_REQD. The mask must be rejected if the deviation in either X or Y of
any measured registration mark exceeds REGISTR_ERROR.
8.1.549 REGISTR_MARK_COUNT — (x,y) For a rectangular array of registration marks, the number of rows (x)
and columns (y).
8.1.550 REGISTR_MARK_DRAWING — The uniquely identified (for each customer) document which shows the
registration mark structure itself, and may show the place(s) within the registration mark which are to be measured.
8.1.551 REGISTR_MARK_FEATURE — Text describing the feature to be used for registration measurement.
8.1.552 REGISTR_MARK_ID — Unique alphanumeric identifier of each registration mark location within
MASK_SET_ID to identify individual registration measurements when using <mask_results>. If the same
coordinates apply to locations on different masks within the mask set, they may have the same
REGISTR_MARK_ID, but it is not mandatory. If REGISTR_MARK_ID is used with a CELL_REGISTR_MARK,
it will be associated with as many mask locations as the cell has instances. (See
MEASURED_REGISTR_MARK_ID for more information.) REGISTR_MARK_ID may only be used immediately
preceding either MASK_REGISTR_MARK or CELL_REGISTR_MARK.
8.1.553 REGISTR_MARK_LOCATION_DRAWING — The uniquely identified (for each customer) document
which shows the location(s) of the registration mark structure.
8.1.554 REGISTR_MARK_SEPARATION — (x, y) For an array of registration marks, the spacing between
successive marks in the horizontal (x) and vertical (y) directions.
8.1.555 REGISTR_MEASUREMENT_DATE — Date registration measurement was performed.
8.1.556 REGISTR_ORTHO — Maximum allowable non-orthogonality, in micro-radians, relative to the
REGISTR_REF_MASK_ID or the reference grid of REGISTR_EQUIP_REQD.
8.1.557 REGISTR_ORTHO_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_ORTHO is to be
measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection.
8.1.558 REGISTR_QUALITY_ID — (text) Customer’s label for a collection of registration quality specifications,
to be used only in addition to explicit quality requirement keywords. This may be used in the data structure in
addition to, but not in place of, explicit quality requirement keywords. This may not be used
in combination with
QUALITY_GROUP_ID. Customer and vendor should document the meaning of this quality grade before using it in
SEMI P10.
8.1.559 REGISTR_REF_MASK_ID — MASK_ID of the reference mask for determining REGISTR_ERROR and
REGISTR_ORTHO. If multiple masks are identified, the reference grid should be based on the mean of the
measurements of the group of masks.
8.1.560 REGISTR_REF_MASK_NAME — To be used in place of REGISTR_REF_MASK_ID only to refer to
those mask sets which were built outside the SEMI order standard and have no MASK_ID.
8.1.561 REGISTR_REF_MASK_SET_ID — MASK_SET_ID for the mask set containing
REGISTR_REF_MASK_ID for determining REGISTR_ERROR and REGISTR_ORTHO.
SEMI P10-0705 © SEMI 1990, 2005 140
8.1.562 REGISTR_REF_MASK_SET_NAME — To be used in place of REGISTR_-REF_MASK_SET_ID only
to refer to those mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.563 REGISTR_REF_MASK_SET_VERSION — To be used in addition to REGISTR_-
REF_MASK_SET_NAME only to refer to those mask sets which were built outside the SEMI order standard and
have no MASK_SET_ID.
8.1.564 REGISTR_REF_METHOD_REQD — Alphanumeric description of the method and/or reference marks to
use for measuring REGISTR_-ERROR and REGISTR_ORTHO (e.g., using a previously established reference, or
the REGISTR_-EQUIP_REQD grid).
8.1.565 REGISTR_REF_METHOD_USED — Alphanumeric description of the method and/or reference marks
used by the vendor for measuring REGISTR_ERROR and REGISTR_ORTHO.
8.1.566 REGISTR_RELATIVE — If present, indicates that the START_REGISTR collection in which
REGISTR_RELATIVE is contained is to be measured relative to another START_REGISTR collection, rather than
to the grid of the registration measurement tool. The alphanumeric data field of REGISTR_RELATIVE must match
the data field of START_REGISTR of the collection to which it is to be compared.
8.1.567 REGISTR_RELATIVE_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_RELATIVE is to
be measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in
its measured value due to mask processing would NOT be cause for mask rejection.
8.1.568 REGISTR_RESIDUAL — (x,y) The maximum acceptable deviation in both axes (in microns) of all
registration measurements relative to the REGISTR_STD_GRID, with REGISTR_SCALE and REGISTR_ORTHO
removed. The mask must be rejected if the residual deviation in either X or Y of any measured registration mark
exceeds REGISTR_RESIDUAL.
8.1.569 REGISTR_RESIDUAL_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_RESIDUAL is to
be measured and the data transmitted to the customer (if requested by SHIP_REGISTR_DATA), but that deviations in
its measured value due to mask processing would NOT be cause for mask rejection.
8.1.570 REGISTR_RESIDUAL_THREE_SIGMA — (x,y) The maximum acceptable 3 sigma deviation in both
axes (in microns) of all registration measurements, with REGISTR_SCALE and REGISTR_ORTHO removed. The
mask must be rejected if the residual 3 sigma deviation in either X or Y exceeds REGISTR_RESIDUAL.
8.1.571 REGISTR_RESIDUAL_THREE_SIGMA_REFERENCE_ONLY — (T or F) If T, indicates that
REGISTR_RESIDUAL_THREE_SIGMA is to be measured and the data transmitted to the customer (if requested
by SHIP_REGISTR_DATA), but that deviations in its measured value due to mask processing would NOT be cause
for mask rejection.
8.1.572 REGISTR_SCALE — (x,y) Maximum acceptable scale error in each axis in parts per million, relative to
the REGISTR_STD_GRID.
8.1.573 REGISTR_SCALE_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_SCALE is to be
measured and the data transmitted to the customer (if requested by SHIP_REGISTR_DATA), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection.
8.1.574 REGISTR_STD_GRID — (NIST, PTB and others on request) reference standard to be used to correlate
registration measurement. This keyword is not allowed in conjunction with REGISTR_REF_METHOD_REQD on
the same mask.
8.1.575 REGISTR_STD_GRID_USED — (NIST, NBS, and others on request) The reference standard used to
correlate the registration measurements.
8.1.576 REGISTR_THREE_SIGMA — (x,y) The maximum acceptable 3 sigma deviation in both axes (in microns)
of all registration measurements. Both the 3 sigma deviation in x and the 3 sigma deviation in y must be less than
REGISTR_THREE_SIGMA for the mask to be acceptable.
8.1.577 REGISTR_THREE_SIGMA_REFERENCE_ONLY — (T or F) If T, indicates that
REGISTR_THREE_SIGMA is to be measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in its measured value due to mask processing would NOT be cause for
mask rejection.
SEMI P10-0705 © SEMI 1990, 2005 141
8.1.578 REGISTR_TOLERANCE — Maximum acceptable deviation of the mean registration error of all measured
registration marks, in both axes, relative to the REGISTR_REF_MASK_ID or the reference grid of
REGISTR_EQUIP_REQD. Both the mean in x and the mean in y must be less than REGISTR_TOLERANCE for
the mask to be acceptable.
8.1.579 RELEASE_NUMBER — Alphanumeric release number under BLANKET PO NUMBER.
8.1.580 REPAIR_EQUIP_REQD — Alphanumeric identification of acceptable equipment for repairing mask
defects.
8.1.581 REPAIR_EQUIP_USED — Alphanumeric identification of equipment used for repairing mask defects.
8.1.582 REPAIRS_AUTHORIZED — (T or F) If F, customer approval is required before mask repairs can be
made.
8.1.583 RESIST_THICKNESS — Resist thickness in Angstroms.
8.1.584 RESIST_TYPE — (POSITIVE or NEGATIVE) This data item is needed for <mask_order> only if
overlapping patterns are required. (Overlapping patterns sometimes require the use of “blanking rectangles” to
prevent exposure of areas which are to be exposed by another pattern.)
8.1.585 RESULT_FILE_NAME — (text) Name identifying the result output file for RUNSET_NAME. If this
keyword appears in the <mask_order>, it must be explicitly referenced in a RUNSET_NAME and/or a
PARAMETER_FILE_NAME.
8.1.586 RETROFIT_JOB_LEVEL — Level in RETROFIT_JOB_NAME to which new mask(s) must retrofit.
8.1.587 RETROFIT_JOB_NAME — Name of job file to which mask(s) must retrofit.
8.1.588 RETROFIT_MASK_ID — MASK_ID in RETROFIT_MASK_SET_ID to which new mask(s) must
retrofit.
8.1.589 RETROFIT_MASK_NAME — To be used in place of RETROFIT_MASK_ID only for retrofit to those
mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.590 RETROFIT_MASK_SET_ID — MASK_SET_ID of mask set to which new mask(s) must retrofit.
8.1.591 RETROFIT_MASK_SET_NAME — To be used in place of RETROFIT_MASK_SET_ID only for retrofit
to those mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.592 RETROFIT_MASK_SET_VERSION — To be used in addition to RETROFIT_-MASK_SET_NAME only
for retrofit to those mask sets which were built outside the order standard and have no MASK_SET_ID.
8.1.593 REVIEW_REQD — If present, indicates that a review will be required but that it need not be completed
prior to building and/or shipping the masks. The alphanumeric data field describes the items to be reviewed.
8.1.594 ROTATE_TITLE — (0, 90, 180 or 270) Title is to be rotated clockwise the indicated number of degrees,
prior to any mirroring.
8.1.595 ROTATE_TITLE_CHARACTERS — (0, 90, 180 or 270) Characters within the title are to be rotated
clockwise the indicated number of degrees, prior to any mirroring.
8.1.596 ROTATION — (0, 90, 180 or 270) Angle in degrees at which an image is rotated counter-clockwise about
its center, prior to mirroring.
8.1.597 RUNSET_NAME — Name of instruction file (such as .cinc files or DRC run sets). Note that multiple
RUNSET_NAME entries under a SOFTWARE_NAME means that multiple runs with the same software are
required.
8.1.598 RUNSET_REVISION — (text) Revision identification of the RUNSET_NAME.
8.1.599 SCALE_FACTOR — (De)magnification factor to be multiplied with the PATTERN_ADDRESS_SIZE to
get the effective address to be used to write the pattern file. Data value must be positive. 1.0 is assumed unless
specified otherwise. SCALE_FACTOR alters both the size of individual geometries and the size of the pattern file.