semi合集-English.pdf - 第5647页

SEMI P10-0705 © SEMI 1990, 2005 142 8.1.600 SCRATCH_INSP_AREA — ( x1,y1,x2,y 2) Unscaled c oordinates of window for scratch i nspection, lower left and upper right corners, relat ive to nomi n al center o f mask (chrom e…

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SEMI P10-0705 © SEMI 1990, 2005 141
8.1.578 REGISTR_TOLERANCE — Maximum acceptable deviation of the mean registration error of all measured
registration marks, in both axes, relative to the REGISTR_REF_MASK_ID or the reference grid of
REGISTR_EQUIP_REQD. Both the mean in x and the mean in y must be less than REGISTR_TOLERANCE for
the mask to be acceptable.
8.1.579 RELEASE_NUMBER — Alphanumeric release number under BLANKET PO NUMBER.
8.1.580 REPAIR_EQUIP_REQD — Alphanumeric identification of acceptable equipment for repairing mask
defects.
8.1.581 REPAIR_EQUIP_USED — Alphanumeric identification of equipment used for repairing mask defects.
8.1.582 REPAIRS_AUTHORIZED — (T or F) If F, customer approval is required before mask repairs can be
made.
8.1.583 RESIST_THICKNESS — Resist thickness in Angstroms.
8.1.584 RESIST_TYPE — (POSITIVE or NEGATIVE) This data item is needed for <mask_order> only if
overlapping patterns are required. (Overlapping patterns sometimes require the use of “blanking rectangles” to
prevent exposure of areas which are to be exposed by another pattern.)
8.1.585 RESULT_FILE_NAME — (text) Name identifying the result output file for RUNSET_NAME. If this
keyword appears in the <mask_order>, it must be explicitly referenced in a RUNSET_NAME and/or a
PARAMETER_FILE_NAME.
8.1.586 RETROFIT_JOB_LEVEL — Level in RETROFIT_JOB_NAME to which new mask(s) must retrofit.
8.1.587 RETROFIT_JOB_NAME — Name of job file to which mask(s) must retrofit.
8.1.588 RETROFIT_MASK_ID — MASK_ID in RETROFIT_MASK_SET_ID to which new mask(s) must
retrofit.
8.1.589 RETROFIT_MASK_NAME — To be used in place of RETROFIT_MASK_ID only for retrofit to those
mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.590 RETROFIT_MASK_SET_ID — MASK_SET_ID of mask set to which new mask(s) must retrofit.
8.1.591 RETROFIT_MASK_SET_NAME — To be used in place of RETROFIT_MASK_SET_ID only for retrofit
to those mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.592 RETROFIT_MASK_SET_VERSION — To be used in addition to RETROFIT_-MASK_SET_NAME only
for retrofit to those mask sets which were built outside the order standard and have no MASK_SET_ID.
8.1.593 REVIEW_REQD — If present, indicates that a review will be required but that it need not be completed
prior to building and/or shipping the masks. The alphanumeric data field describes the items to be reviewed.
8.1.594 ROTATE_TITLE — (0, 90, 180 or 270) Title is to be rotated clockwise the indicated number of degrees,
prior to any mirroring.
8.1.595 ROTATE_TITLE_CHARACTERS — (0, 90, 180 or 270) Characters within the title are to be rotated
clockwise the indicated number of degrees, prior to any mirroring.
8.1.596 ROTATION — (0, 90, 180 or 270) Angle in degrees at which an image is rotated counter-clockwise about
its center, prior to mirroring.
8.1.597 RUNSET_NAME — Name of instruction file (such as .cinc files or DRC run sets). Note that multiple
RUNSET_NAME entries under a SOFTWARE_NAME means that multiple runs with the same software are
required.
8.1.598 RUNSET_REVISION — (text) Revision identification of the RUNSET_NAME.
8.1.599 SCALE_FACTOR — (De)magnification factor to be multiplied with the PATTERN_ADDRESS_SIZE to
get the effective address to be used to write the pattern file. Data value must be positive. 1.0 is assumed unless
specified otherwise. SCALE_FACTOR alters both the size of individual geometries and the size of the pattern file.
SEMI P10-0705 © SEMI 1990, 2005 142
8.1.600 SCRATCH_INSP_AREA — (x1,y1,x2,y2) Unscaled coordinates of window for scratch inspection, lower
left and upper right corners, relative to nominal center of mask (chrome side up).
8.1.601 SCRATCH_INSP_EXCLUDE — (x1, y1, x2, y2) Unscaled coordinates of window to be excluded from
defect inspection, relative to nominal center of mask (chrome side up). (See SCRATCH_INSP_AREA.)
8.1.602 SCRATCH_SIZE_BACK — Maximum dimension of smallest unacceptable scratch on glass side of mask.
8.1.603 SCRATCH_SIZE_FRONT — Maximum dimension of smallest unacceptable scratch on patterned side of
mask.
8.1.604 SCRIBE_INSIDE_CORNERS — (x1,y1,x2,y2) The inner limits of the SCRIBE_-TONE frame to be built
for the dropout by the vendor. It consists of two pairs of coordinates: the lower-left and upper-right and these are
relative to the DROPOUT window center.
8.1.605 SCRIBE_OUTSIDE_CORNERS — (x1,y1,x2,y2) The outer limits of the SCRIBE_-TONE frame to be
built for the dropout by the vendor. It consists of two pairs of coordinates: the lower-left and upper-right and these
are relative to the DROPOUT window center.
8.1.606 SCRIBE_TONE — (CLEAR or DARK) Border surrounding DROPOUT on mask is to be either clear or
dark.
8.1.607 SECURITY_CLASS — (QML, SECRET, TOP_SECRET, CCI, or COMSEC) Security classification of
mask set or individual mask.
8.1.608 SEM_PHOTO_LOCATION — (x,y) Location of SEM photographing location relative to the nominal
center of the mask (chrome side up).
8.1.609 SEM_PHOTO_MATRIX_FILE_NAME — Alphanumeric name of file to be used for SEM photograph
locations. It is not to be used in conjunction with SEM_PHOTO_LOCATION within the same
START_SEM_PHOTO to END_SEM_PHOTO set.
8.1.610 SEM_PHOTO_ROTATION — Angle in degrees at which a SEM Photo Image output is rotated about the
Z axis of the mask. Angles are to be counter-clockwise with zero degrees as the regular orientation of the mask as
written.
8.1.611 SEM_PHOTO_SCALE — Numeric scale of the SEM photograph image.
8.1.612 SEM_PHOTO_SITE_ID — Unique alphanumeric identifier of each SEM photographing location within
MASK_SET_ID to identify individual SEM photo locations when using <mask_data>. If the same coordinates
apply to locations on different masks within the mask set, they may have the same SEM_PHOTO_SITE_ID, but it is
not mandatory.
8.1.613 SEM_PHOTO_TILT — Angle in degrees at which a SEM Photo Image output is tipped away from normal
to the x/y plane of the mask.
8.1.614 SEMI_REVISION — Revision identification of the SEMI standard according to which the <mask_order>
data structure was constructed. This revision is P10-0705.
8.1.615 SEND_FINAL_AUDIT_DATE_TIME — (T or F) If T, requires delivery of
FINAL_AUDIT_DATE_TIME to the customer.
8.1.616 SEND_MASK_SHIPPED_DATE_TIME — (T or F) If T, requires delivery of
MASK_SHIPPED_DATE_TIME to the customer.
8.1.617 SERIAL_NUMBER — (T or F) If T, a mask serial number must be included on the mask.
8.1.618 SEVERITY_CRITERION_REQD — (PASS, WARN, FAIL) Setup parameter required for inspection.
8.1.619 SEVERITY_CRITERION_USED — (PASS, WARN, FAIL) Setup parameter used for inspection.
8.1.620 SHIP_AIM_DATA — (T or F) If T, requires delivery of <wafer_exposure_information>,
<aerial_image_info> and any output of the final inspection using the aerial imaging measurement tool.
8.1.621 SHIP_ARRAY_REGISTR_MAP — (T or F) If T, requires delivery of the registration map of the entire
array to the customer.
SEMI P10-0705 © SEMI 1990, 2005 143
8.1.622 SHIP_BARCODE_PLOT — (T or F) If T, the plot of the barcode must be sent to the customer.
8.1.623 SHIP_CD_DATA — (T or F) If T, requires delivery of all critical dimension measurements, criteria and
evaluation data to the customer for all CD criteria specified.
8.1.624 SHIP_CD_PRINTOUT — (T or F) If T, requires delivery to the customer of the printout from the CD
measurement tool.
8.1.625 SHIP_CD_UNIFORMITY_MAP — (T or F) If T, requires delivery to the customer of the uniformity map
from the CD uniformity measurement tool.
8.1.626 SHIP_CENTRALITY_DATA — (T or F) If T, requires delivery of the centrality measurement to the
customer.
8.1.627 SHIP_CENTRALITY_MAP — (T or F) If T, requires delivery of the centrality map to the customer.
8.1.628 SHIP_CERTIFICATE_OF_CONFORMANCE — (T or F) If T, requires delivery of a certificate of
conformance to the customer.
8.1.629 SHIP_CLOSURE_DATA — (T or F) If T, requires delivery of closure measurement data to the customer.
8.1.630 SHIP_CUSTOMER_QUALITY_FORM — (text) If present, the data field specifies the form required by
the customer to document the quality of the mask.
8.1.631 SHIP_DEFECT_DATA — (T or F) If T, requires delivery of defect inspection criteria and evaluation data
to the customer for all defect criteria specified. This should be final inspection data unless
SHIP_THRU_PELLICLE_DATA is specified, in which case it should be for final inspection prior to pelliclizing.
8.1.632 SHIP_DIE_FIT_MAP — (T or F) If T, requires delivery of a die fit map to the customer.
8.1.633 SHIP_FILM — If present, film(s) of mask(s) must be sent to customer. Indicates beginning of <films>
collection. Alphanumeric data field identifies the collection to establish which collections are hierarchically affected
by another. The appearance of a <films> at a lower level in the hierarchy supercedes the <films> at a higher level in
the hierarchy if it has the same SHIP_FILM data field.
8.1.634 SHIP_FIELD_FIT_MAP — (T or F) If T, requires delivery of a field fit map to the customer.
8.1.635 SHIP_FINAL_POSTPELL_DIE_DB_MSK_MAP — (T or F) If T, requires delivery of the final run, post-
pellicle die to database defect inspection map for the entire patterned area to be sent to customer.
8.1.636 SHIP_FINAL_POSTPELL_DIE_DB_PTN_MAP — (T or F) If T, requires delivery of the final run, post-
pellicle die to database defect inspection map for the single pattern to be sent to customer.
8.1.637 SHIP_FINAL_POSTPELL_DIE_DIE_MAP — (T or F) If T, requires delivery of the final run, post-
pellicle die to die defect inspection map for the entire mask to be sent to customer.
8.1.638 SHIP_FINAL_PREPELL_DIE_DB_MSK_MAP — (T or F) If T, requires delivery of the final run, pre-
pellicle die to database defect inspection map for the entire patterned area to be sent to customer.
8.1.639 SHIP_FINAL_PREPELL_DIE_DB_PTN_MAP — (T or F) If T, requires delivery of the final run, pre-
pellicle die to database defect inspection map for the single pattern to be sent to customer.
8.1.640 SHIP_FINAL_PREPELL_DIE_DIE_MAP — (T or F) If T, requires delivery of the final run, pre-pellicle
die to die defect inspection map for the entire mask to be sent to customer.
8.1.641 SHIP_FINAL_ROT_POSTPELL_DIE_DIE_MAP — (T or F) If T, requires delivery of the final run, post-
pellicle rotated die to die defect inspection map for the entire mask to be sent to customer.
8.1.642 SHIP_FINAL_ROT_PREPELL_DIE_DIE_MAP — (T or F) If T, requires delivery of the final run, pre-
pellicle rotated die to die defect inspection map for the entire mask to be sent to customer.
8.1.643 SHIP_FIRST_POSTPELL_DIE_DB_MSK_MAP — (T or F) If T, requires delivery of the first run, post-
pellicle die to database defect inspection map for the entire patterned area to be sent to customer.
8.1.644 SHIP_FIRST_POSTPELL_DIE_DB_PTN_MAP — (T or F) If T, requires delivery of the first run, post-
pellicle die to database defect inspection map for the single pattern to be sent to customer.