semi合集-English.pdf - 第5665页
SEMI P10-0705 © SEMI 1990, 2005 160 INSPECTION_AREA -3000,-3000,3000,3000 END_DEFECT_DEFINITION DD.1 END_PATTERN_OPTIONS PTN3 END_PATTERN_GROUP_OPTIONS PG3 LEVEL_ID A PATTERN_NAME GCARMSB-OX-AA START_PATTERN_OPTIONS PTN3…
SEMI P10-0705 © SEMI 1990, 2005 159
START_CD CD_SITE_2
CD_SITE_ID CD_2
CD_LOCATION 0,-40000
END_CD CD_SITE_2
START_CD CD_SITE_3
CD_SITE_ID CD_3
CD_LOCATION 0,40000
END_CD CD_SITE_3
START_CD CD_SITE_4
CD_SITE_ID CD_4
CD_LOCATION 0,0
END_CD CD_SITE_4
END_PATTERN_OPTIONS PTN2
END_PATTERN_GROUP_OPTIONS PG2
LEVEL_ID 1
PATTERN_NAME SC9999X-1A-26
START_PATTERN_OPTIONS PO.26
DIGITIZED_DATA_DARK T
START_CD DIMENSION
CD_DATA 10
CD_DIGITIZED T
CD_TARGET 10
END_CD DIMENSION
END_PATTERN_OPTIONS PO.26
END_PATTERN_DEFINITION 1
LEVEL_ID 2
PATTERN_NAME SC9999X-1A-10
START_PATTERN_OPTIONS PO.10
DIGITIZED_DATA_DARK F
START_CD DIMENSION
CD_DATA 10
CD_DIGITIZED T
CD_TARGET 10.5
END_CD DIMENSION
END_PATTERN_OPTIONS PO.10
END_PATTERN_DEFINITION 2
END_PATTERN_GROUP PG2 !END SCRIBE GROUP
!
PATTERN_GROUP_ID PG3 !RMS ALIGNMENT MARK
START_PATTERN_OPTIONS PTN3
PATTERN_ADDRESS_SIZE 0.5
SCALE_FACTOR 1.0
STRIPE_HEIGHT 1024
UNSCALED_PATTERN_SIZE 2000,2000
START_DEFECT_DEFINITION DD.1
SEMI P10-0705 © SEMI 1990, 2005 160
INSPECTION_AREA -3000,-3000,3000,3000
END_DEFECT_DEFINITION DD.1
END_PATTERN_OPTIONS PTN3
END_PATTERN_GROUP_OPTIONS PG3
LEVEL_ID A
PATTERN_NAME GCARMSB-OX-AA
START_PATTERN_OPTIONS PTN3.AA
DIGITIZED_DATA_DARK F
END_PATTERN_OPTIONS PTN3.AA
END_PATTERN_DEFINITION A
END_PATTERN_GROUP PG3 !END ALIGNMENT MARK
!
END_MASK_GROUP 5X
END_MASK_SET 9999
END_ORDER MS9999
CHECKSUM computed checksum
SEMI P10-0705 © SEMI 1990, 2005 161
RELATED INFORMATION 3
SEMI PHOTOMASK ORDER DATA FILE EXAMPLE EMPLOYING
MULTIPLE WRITE AND PROCESS STEPS FOR A SINGLE MASK
NOTICE: The information contained in this related information is not an official part of SEMI P10, and it is not intended to
modify or supercede the official standard. Rather, this example is offered as an aid to visualizing possible output from software
which might implement the standard.
EXAMPLE: One 4-die phase shift reticle requiring two write and process steps.
START_ORDER MS999
SEMI_REVISION P10-0704 !<mask_order>
CUSTOMER COMPANY NAME
VENDOR ULTIMATE MASK COMPANY
FILE_DATE_TIME 06-JUL-2000, 01:06:00
MASK_SET_ID 9999 !<mask_set>
END_MASK_SET_OPTIONS 9999
!
MASK_GROUP_ID PSM !<mask_group>
START_TITLE 1
TITLE_TEXT DEVICE 9999
TITLE_TYPE DEVICE
TITLE_LOCATION 12500,58500
END_TITLE 1
START_TITLE 2
TITLE_TEXT PHASE SHIFT POLY
TITLE_TYPE MASK
TITLE_LOCATION 12500,56500
END_TITLE 2
MIRROR_MASK T
PRODUCT_TYPE RETICLE
PRODUCT_MAGNIFICATION 5X
PRODUCT_IMAGING_TYPE EAPSM
BLANK_SIZE 6/250
BLANK_TYPE ULTE
BLANK_FLATNESS 1
MASK_COATING MOSI
RESIST_TYPE POSITIVE
START_CD SPECIFICATION
CD_TOLERANCE 0.05
CD_RANGE 0.06
END_CD SPECIFICATION
END_MASK_GROUP_OPTIONS 5X
!
PLACEMENT_TOP_CELL C1
!