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SEMI P34-0200 © SEMI 2000 7 Paralle lism = | N i – M i | fo r i = x, y K = 0.7 × edge len gth N, M within f latness qu alit y area Figure 7 Measurements for Calculat ion of Parallelism with Approx i mate Pos itions J = 1…

SEMI P34-0200 © SEMI 2000 6

Figure 5

Substrate Identification by Corner Chamfer

(Non-critical Side)

F = 1.5–2.0 mm

G = 0.6–1.0 mm

Figure 6

Dimension of Corner Chamfer

(Edge Chamfer Not Indicated)

SEMI P34-0200 © SEMI 20007

Parallelism = | N

– M

| for i = x, y

K = 0.7 × edge length N, M within flatness quality area

Figure 7

Measurements for Calculation of Parallelism

with Approximate Positions

J = 115 ± 15 mm

Figure 8

Corner Recommended for Orientation,

Diagonally Opposite of Chamfer (Non-critical Side Shown)

SEMI P34-0200 © SEMI 2000 8

APPENDIX 1

PHOTOMASK FUSED SILICA PROPERTIES

NOTE: The material in this appendix is an official part of SEMI P34 and was approved by full letter ballot procedures on

September 3, 1999 by the North American Regional Standards Committee.

Table A1-1 Fused Silica Properties

Property

ULTRA LOW THERMAL EXPANSION (ULTE)

Modulus of Elasticity 65.7-72.6 GPa

Poisson's Ratio 0.16-0.19

Specific Gravity 2.18-2.20 g/cm

Index of Refraction @ λ = 436 nm

1.4667

Index of Refraction @ λ = 365 nm

1.4746

Index of Refraction @ λ = 248 nm

1.5086

Index of Refraction @ λ = 193 nm

1.5608

Thermal Optical Coefficient @ λ = 436 nm 10.6 ppm/°C @ 22°C

Thermal Optical Coefficient @ λ = 365 nm 11.2 ppm/°C @ 22°C

Thermal Optical Coefficient @ λ = 248 nm 14.2 ppm/°C @ 22°C

Thermal Optical Coefficient @ λ = 193 nm 20.6 ppm/°C @ 22°C

NOTE 1: Thermal Optical Coefficient is the same as Temperature Coefficient of Index of Refraction.

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