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SEMI P39-0304 E2 © SEMI 2004 37 bounding box should be cal culated to cove r the full extent of all geomet ric figures and text element (x,y) points within that cell and all of its subcells after a full expansi on of any…

SEMI P39-0304

APPENDIX 2

OASIS Standard Properties

NOTICE: The material in this appendix is an official part of SEMI P39 and was approved by full letter ballot

procedures on July 12, 2003.

A2-1 File-Level Standard Properties

A2-1.1 Any file-level standard properties must appear immediately after the START record in an OASIS file. Use

of file-level standard properties is optional—OASIS processors may omit/ignore any or all of them.

A2-1.2 S_MAX_SIGNED_INTEGER_WIDTH

A2-1.2.1 This property declares the maximum number of bytes required to represent any signed-integer in the file,

after all continuation bits have been removed and the integer has been expressed in twos-complement form. Its value

list consists of a single unsigned-integer.

A2-1.3 S_MAX_UNSIGNED_INTEGER_WIDTH

A2-1.3.1 This property declares the maximum number of bytes required to represent any unsigned-integer in the

file, after all continuation bits have been removed. Its value list consists of a single unsigned-integer.

A2-1.4 S_MAX_STRING_LENGTH

A2-1.4.1 This property declares the maximum number of bytes permitted in any string within the file. Its value list

consists of a single unsigned-integer.

A2-1.5 S_POLYGON_MAX_VERTICES

A2-1.5.1 This property declares the maximum number of vertices permitted in any polygon within the file,

including any implicit vertices, but counting the initial vertex only once. Its value list consists of a single unsigned-

integer.

A2-1.6 S_PATH_MAX_VERTICES

A2-1.6.1 This property declares the maximum number of vertices permitted in any path within the file. Its value list

consists of a single unsigned-integer.

A2-1.7 S_TOP_CELL

A2-1.7.1 This property is used to declare the name of the “top cell” of a cell hierarchy. Its value list consists of a

single n-string. It may be repeated if more than one distinct cell hierarchy exists within the OASIS file in which it

appears.

A2-1.8 S_BOUNDING_BOXES_AVAILABLE

A2-1.8.1 This property indicates whether or not S_BOUNDING_BOX properties appear in CELLNAME records.

Its value list consists of a single unsigned-integer. A value of 0 means that S_BOUNDING_BOX properties are not

provided. A value of 1 means that at least some S_BOUNDING_BOX properties are provided. A value of 2 means

that an S_BOUNDING_BOX property is provided for every CELLNAME record.

A2-2 Cell-Level Standard Properties

A2-2.1 Any cell-level standard properties must appear immediately after the corresponding CELLNAME record in

an OASIS file. Use of cell-level standard properties is optional—OASIS processors may omit/ignore any or all of

them.

A2-2.2 S_BOUNDING_BOX

A2-2.2.1 This property may occur once after each CELLNAME record, and declares the bounding box of that cell.

Its value list consists of the following 5 fields: <flags> <lower-left-x> <lower-left-y> <width> <height>. The lower-

left-x and lower-left-y fields are signed-integers representing the lower-left corner of the cell’s bounding box. The

width and height fields are unsigned-integers representing the width and height of the cell’s bounding box. The

SEMI P39-0304

bounding box should be calculated to cover the full extent of all geometric figures and text element (x,y) points

within that cell and all of its subcells after a full expansion of any hierarchy beneath the cell.

A2-2.2.2 The flags field is an unsigned-integer. Only the least-significant 3 bits are presently defined, and have the

following meanings:

flags.bit.0: 0 = bounding box is known

1 = bounding box is unknown

flags.bit.1: 0 = bounding box is non-empty

1 = bounding box is empty

flags.bit.2: 0 = bounding box depends on no external cells

1 = bounding box depends on one or more external cells

A2-2.3 S_CELL_OFFSET

A2-2.3.1 This property may occur once after each CELLNAME record. Its value list consists of a single unsigned-

integer which declares the byte offset from the beginning of the file (byte 0) to where the corresponding CELL

record appears in the file. An offset value of 0 denotes an external cell, with no corresponding CELL record in the

same OASIS file.

A2-3 Element-Level Properties

A2-3.1 S_GDS_PROPERTY

A2-3.1.1 This property is intended exclusively for compatibility with GDSII Stream properties. It may occur one or

more times after any element within a CELL definition. Its value list contains exactly two values in sequence:

<attribute>, an unsigned-integer, and <propvalue-string>, a b-string. These values correspond to GDSII Stream

PROPATTR and PROPVALUE records, respectively.

NOTICE: SEMI makes no warranties or representations as to the suitability of the standards set forth herein for any

particular application. The determination of the suitability of the standard is solely the responsibility of the user.

Users are cautioned to refer to manufacturer's instructions, product labels, product data sheets, and other relevant

literature, respecting any materials or equipment mentioned herein. These standards are subject to change without

notice.

By publication of this standard, Semiconductor Equipment and Materials International (SEMI) takes no position

respecting the validity of any patent rights or copyrights asserted in connection with any items mentioned in this

standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and

the risk of infringement of such rights are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction of

the contents in whole or in part is forbidden without express written

consent of SEMI.

SEMI P40-1103 © SEMI 2003 1

SEMI P40-1103

SPECIFICATION FOR MOUNTING REQUIREMENTS AND ALIGNMENT

REFERENCE LOCATIONS FOR EXTREME ULTRAVIOLET

LITHOGRAPHY MASKS

This specification was technically approved by the Global Micropatterning Committee and is the direct

responsibility of the North American Micropatterning Committee. Current edition approved by the North

American Regional Standards Committee on September 3, 2003. Initially available at www.semi.org

September 2003; to be published November 2003.

1 Purpose

1.1 This specification covers the mounting

requirements for Extreme Ultraviolet Lithography

(EUVL) masks.

2 Scope

2.1 This standard details the requirements for EUVL

mask mounting. The mask mount is a flat reference

surface against which the mask is clamped. The

specific design and material of the mask mount are not

specified.

2.1.1 The mounting requirements in this standard apply

to the exposure tool, the mask pattern generator and the

pattern placement metrology tool. As an option, the

requirements may be used in other tools used to

fabricate or measure EUV masks.

2.2 This standard also defines the area on the EUV

mask reserved for proper handling, identification (ID)

marks and alignment references. The forms of the

alignment and ID marks are not specified.

NOTICE: This standard does not purport to address

safety issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety and health practices and determine

the applicability of regulatory or other limitations prior

to use.

3 Referenced Standards

3.1 SEMI Standards

SEMI P37 — Specification for Extreme Ultraviolet

Lithography Mask Substrates

SEMI P38 — Specification for Absorbing Film Stacks

and Multilayers on Extreme Ultraviolet Lithography

Mask Blanks

NOTICE: Unless otherwise indicated, all documents

cited shall be the latest published versions.

4 Terminology

4.1 Abbreviations and Acronyms

4.1.1 EUV — extreme ultraviolet

4.1.2 EUVL — extreme ultraviolet lithography

4.2 Definitions

4.2.1 chuck — the chuck is the physical apparatus in

the tools listed in Section 2.1.1 upon which the mask is

mounted.

4.2.2 mounting surface — the mounting surface is the

surface of the chuck in direct contact with the mask.

The backside of the mask, which is the unpatterned

side, shall be in direct contact with the mounting

surface while the mask is being used in the tools listed

in Section 2.1.1.

4.2.3 pin or pedestal — the surface of the chuck may

consist of an array of pins or pedestals. Pins are

protrusions from the chuck surface that come to a point

at the location on their surface farthest from the chuck.

Pedestals have a nominally flat surface at their surface

farthest from the chuck. Note that if S

= P

in Figure

5, the chuck is referred to as a pin chuck. Otherwise, it

is a pedestal chuck.

4.2.4 user — this term may refer to the user of

fabrication equipment for EUV masks that contains a

chuck, or this term may refer to the purchaser of an

EUV mask from a mask supplier.

5 Mask Layout Requirements

5.1 The square substrates shall conform to the

dimensional tolerances as defined in Section 6 of SEMI

P37. Datum points on the edges of the mask substrate

are defined in Figure 2 of SEMI P37.

5.2 Masks shall have areas reserved for patterns to be

printed, for identification (ID) marks, for reticle

alignment on the front side and for handling as shown

in Figure 1.

5.2.1 The mask layout shall include an area reserved

for the printable area, which has maximum dimensions