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SEMI MF2166-0304 © SEMI 2004 8 Special Reference Wafer Calibra tion Data Sheet For Non-Contact Dielectric Charac terization System System Supplier: System Model #: System Software Rev: Test Date: Calibration Organization…

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SEMI MF2166-0304 © SEMI 2004 7
11.1.6.6 Mobile ion density, Q
m
, ions/cm
2
.
11.2 Report the following information for each test
carried out in accordance with Method C (see Figure 2
for an example data sheet that contains all the
information to be reported):
11.2.1 Tester identification, including supplier, model
number, corona method, and software Rev number,
11.2.2 Date of test,
11.2.3 Test operator identification,
11.2.4 Temperature and relative humidity of the test
room,
11.2.5 Characteristics of the special reference wafer
used in the test, including serial number,
11.2.6 Stress voltages and temperature,
11.2.7 Duration of CTS, min, and
11.2.8 Three-run average, standard deviation, and
relative standard deviation of mobile ion density, Q
m
,
ions/cm
2
.
12 Key Words
12.1 dielectric tester; dielectric trap; effective charge;
electrical dielectric thickness; flatband voltage;
interface trap; line corona; mobile charge; point corona.
SEMI MF2166-0304 © SEMI 2004 8
Special Reference Wafer Calibration Data Sheet For
Non-Contact Dielectric Characterization System
System Supplier: System Model #:
System Software Rev: Test Date:
Calibration Organization
Operator ID Method A — Point Source Corona [ ]
Method B — Line Source Corona [ ]
Measurement Data Statistics
Mean
Std Dev (1 sigma) % Std Dev (1S%)
Location
Parameter
(0,0) (-40,40) (40,-40) (0,0) (-40,40)
(40,-40)
(0,0) (-40,40) (40,-40)
V
surf
(V) (Method A)
V
cpd,
(V) (Method B )
T
ox
(nm)
V
fb
(V)
Q
eff
(×10
11
charge/ cm
2
)
D
it
(×10
11
charge/ cm
2
)
Q
m
(× 10
11
charge/ cm
2
)
Environmental Data
Special Reference Wafer Used
Calibration Dates
Temperature
____ [ ]°F [ ]°C
Relative Humidity Serial Number Mfg.
Wafer
Dia.
Last Next
Equipment Performance Summary
In Tolerance [ ] Out of Tolerance [ ]
Repair Required Yes [ ] No [ ]
Comments
Figure 1
Example Data Sheet for Methods A and B
SEMI MF2166-0304 © SEMI 2004 9
Special Reference Wafer Calibration Data Sheet For
Non-Contact Dielectric Characterization System
System Supplier: System Model #:
System Software Rev: Test Date:
Calibration Organization
Operator ID Method C — Line Source Corona [ ]
Measurement Data Statistics
Parameter
Mean
Std Dev (1 sigma) Minimum Maximum
V
cpd,
(V)
Corona Voltage per
Sweep
(−) CTS Voltage
(−) CTS Time
(−) CTS
Temperature
(+) CTS Voltage
(+) CTS Time
(+) CTS
Temperature
Q
m
(× 10
11
charge/ cm
2
)
Environmental Data
Special Reference Wafer Used
Calibration Dates
Serial Number Mfg.
Wafer
Dia.
Last Next
Temperature
_____ [ ]°F____ [ ]°C
Relative Humidity
Equipment Performance Summary
In Tolerance [ ] Out of Tolerance [ ]
Repair Required Yes [ ] No [ ]
Comments
Figure 2
Example Data Sheet for Method C