The new PrexisionTM series Setting the global standards for displays - 第3页

4 5 Prexision 8 0 0 Evo is the m ost adva nce d m ask wr iter whe n it comes to e cie nt pro duc tion of top critical phot omask manufacturin g for cutting-edge displa ys such as AM O LED a nd fol dabl e dis plays for ﬂ…

IMPROVED STABILITY AND HIGHER UPTIME

New servo board with linear movement, simpliﬁed

electronics with better performance and modern

bus structure provide superior stability and better

error handling to create higher system uptime.

SUPPORT FOR HIGHER LEVEL OF FACTORY

AUTOMATION WITH VARIOUS LOADER SOLUTION

Newly developed PLS (Pre Loading System) and

interface supporting communication from factory

automation system to minimize human interface in

order to reduce contamination and human error.

The new generation Prexision series are built on the Evo control platform.

Updated with new, innovative software and hardware architecture,

it’s been designed for the future of production automation, advanced

connectivity and big data applications.

Prexision Evo series

Remarkable precision for

all the world’s displays

BETTER SUPPORT FOR LOGGING, CONNECTIVITY

AND BIG DATA APPLICATIONS

New servo board log all motions in system which can

be analyzed and used for many dierent purpose,

enabling stable system operation and extension to

big data applications.

EXTENDABLE WITH NEW FUNCTIONALITY

Build on completely new modern hardware and

software architecture for possibility to develop new

functions in the future meeting customers’ demand.

4 5

Prexision 800 Evo is the most advanced mask writer

when it comes to ecient production of top critical

photomask manufacturing for cutting-edge displays

such as AMOLED and foldable displays for ﬂagship

smartphones.

Beneﬁts of the Prexision 800 Evo

• 25% increase resolution with custom made

ﬁnal lens

• 3 times better lens and mirror quality with

stress free optic mounter

• More multi beams to maintain throughput

even with smaller pixels

• HT mode specs similar with Prexision 80 Evo

HA mode

• New improved software algorithm to

compensate uneven beam performance

2X better CD uniformity performance compared

to Prexision 80 Evo. Prexision 800 Evo is perfect

for deﬁning small enough feature size with good

quality, such as OPC (Optical Correction Proximity)

on photomasks that are required for the most

advanced display manufacturing, as well as support

for future R&D.

Prexision 800 Evo

The new resolution standard for top critical

photomask manufacturing

Prexision 80 Evo

Prexision 80 is known for overcoming the challenge

of the “invisible Mura” for advanced AMOLED

displays for smartphones. With the Evo control

platform, the Prexision 80 Evo is more robust and

stable than ever which is perfect for critical photo-

masks manufacturing used for high resolution

LCDs and mid to advanced AMOLED displays.

Key highlights

• Software algorithm to compensate uneven

beam performance

• 2X better CD Uniformity performance

compared to Prexision 8 Evo/Prexision 10

• Z-correction as a standard function

Prexision 80 Evo

Higher yield for high resolution advanced

LCD and AMOLED displays

KEY SPECIFICATIONS

HA mode HT mode

Minimum lines and spaces (pitch/2) 0.55 m 0.85 m

Constituent CD uniformity (3σ) 10 nm 15 nm

CD linearity 1.0-10 um (p-p) 50 nm 85 nm

Local placement (3σ) 30 nm 50 nm

Written registration (3σ) 125 nm 175 nm

Written overlay (3σ) 40 nm 50 nm

Mask set overlay (3σ) 75 nm 100 nm

KEY SPECIFICATIONS

HA mode HT mode

Minimum lines and spaces (pitch/2) 0.75 m 1.0 m

Constituent CD uniformity (3σ) 15 nm 25 nm

CD linearity 1.5-10 um (p-p) 50 nm 85 nm

Local placement (3σ) 30 nm 50 nm

Written registration (3σ) 150 nm 200 nm

Written overlay (3σ) 50 nm 70 nm

Mask set overlay (3σ) 75 nm 100 nm

6 7

Prexision 8 has been the display industry standard

for a decade, and is now being upgraded to the

Prexision 8 Evo. Prexision 8 Evo can handle up to

generation 8 mask size and comes with new mode

conﬁ guration, o ering a wide range of choices

depending on the user’s business strategy.

Prexision 10 system can handle up to generation

11 mask size.

Key highlights

• The most well balanced system between perfor-

mance and volume production of advanced TFT

LCD photomask.

• New calibration procedure used for advanced

mask writer to maintain system performance for

Prexision 8 Evo

• New “Entry mode” for Prexision 8 Evo widening

system o ering

Prexision 10

*Requires Z-correction option

Prexision 8 Evo and Prexision 10

The best ﬁ t for volume production of

photomasks for advanced LCDs

*Requires Z-correction option

Prexision 8 Evo

KEY SPECIFICATIONS

ENTRY MODE HA mode HT mode

Minimum lines and spaces (pitch/2) 1.2 m 0.75 m 1.0 m

Constituent CD uniformity (3σ) 30 nm 20 nm 25 nm

CD linearity (p-p) 85 nm (2.4 – 10 um) 50 nm (1.5 – 10 um) 85 nm (1.5 – 10 um)

Registration (3σ) 90 nm 90 nm 90 nm

Written overlay (3σ) 150 (120*) nm 120 (90*) nm 150 (120*) nm

Mask set overlay* (3σ) 120 nm 90 nm 120 nm

KEY SPECIFICATIONS

HA mode HT mode

Minimum lines and spaces (pitch/2) 0,75 m 1.0 m

CD uniformity (3σ) 60 nm 85 nm

CD linearity 1.5-10 um (p-p) 50 nm 85 nm

Registration (3σ) 90 nm 90 nm

Written overlay (3σ) 120 (90*) nm 150 (120*) nm

Mask set overlay* (3σ) 90 nm 120 nm

Prexision Lite 8 Evo

A cost-e cient mask writer for low to

mid-end display photomasks

Mycronic LRS systems have supported the market

for less complex photomasks for a decade, despite

its limitations in terms of stability and data path to

handle increase in pattern data size. The Prexision

Lite 8 Evo is the new system model that supports

low to mid-end display photomasks, developed and

based on know-how from old experience and new

technologies that’s been proven to work from the

ﬁ eld systems.

Key highlights

• Fastest mask writers with writing speed

1,350 mm

/min

• Level 60 ﬁ nal lens

• Granite stage that can handle generation 8

photomask size

• Stable data path to handle increasing data size

• Adoption of improved calibration procedure

from advanced mask writers to widen address-

able market

KEY SPECIFICATIONS

HA mode

Minimum lines and spaces (pitch/2) 1.2 m

Constituent CD uniformity (3σ) 30 nm

CD linearity 2.4-10 um (p-p) 85 nm

Registration (3σ) 120 nm

Written overlay (3σ) 300 (250*) nm

*Requires Z-correction option