The new SLXTM series Built for a smarter digital future - 第3页
4 5 WIDE RANGE OF CONFIGURA TION OFFERING Di erent cus tomer s hav e d ie rent techni ca l re qui re - me nts de pe ndi ng on appli catio ns and prod uc tion mix. The SLX se ries oe rs three die rent base mode ls whi…
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By combing field-proven technology, modern data
path management and state-of-the-art optics,
the SLX operates faster, more reliably and at a lower
cost of ownership – all throughout its lifecycle.
Out of the over 600,000 photomasks produced in
the semiconductor industry each year, 70-75% of
these are written using laser-based mask writers.
Most systems have been in service for some
15-25 years, making production slow and costly,
with machines dicult to maintain. In short – these
are rapidly approaching their replacement cycle.
WHAT YOU’LL GET WITH THE SLX SERIES
• Low cost of ownership with a wide range of
configuration choice
• Stable and fast data preparation to support ever
increasing data sizes
• A reliable system and access to good support
• New modern extendable architecture to enable
future needs and functions
THE BEST CHOICE FOR COST-EFFICIENT
PRODUCTION
Due to speed and lower dollar-to-mask costs, laser
photo masks are preferred whenever they can meet
the technical requirements. By applying writing
principles proven from Mycronics’ display systems,
the SLX series provides unrivaled writing speed
compared to existing systems in the field, where our
fastest SLX model can expose 6” photomask within
just minutes.
SLX is also equipped with Solid State Laser,
cutting the power consumption with over 90%
compared to the majority of lasers used in the
market today.
Born out of the rising demand of everyday electronics and devices, the
SLX laser mask writer is designed to meet the trend towards making
everything smarter: consumer goods, cars, Internet of Things, medical
devices, and even industrial manufacturing equipment.
Mycronic SLX series
Gear up to meet today’s
fast-faced semiconductor
industry
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WIDE RANGE OF CONFIGURATION OFFERING
Dierent customers have dierent technical require-
ments depending on applications and production
mix. The SLX series oers three dierent base models
which can be further customized, adding a wide
range of options.
• SLX 1: the fastest model delivers utmost
productivity for lower-end semiconductor nodes
• SLX 2: a well-balanced model for users who aim
for both productivity and higher semiconductor
nodes
• SLX 3: the most advanced model, addressable
up to around 90 nm node
MODERN DATAPATH MANAGEMENT
One of the critical areas the mature semiconductor
market is to have fast, stable and reliable pattern
data management design, since the pattern density
continues to increase at the same time it requires
more compensation. The SLX series modern scal-
able datapath architecture handles all these aspects
by having the same architecture as our state-of-the-
art display mask writers that has been continuously
developed over time. All critical processing is done
oine, leaving only the data transfer step online to
minimize the chance of errors during exposure.
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* Estimate exposure time with XT mode for 6” mask with
area 150 mm x 150 mm
SLX 1 e1
SLX 2 e1
SLX 3 e1
KEY SPECIFICATIONS
3 PASS 2 PASS 1 PASS
Writing speed* ~169 mins ~113 mins ~56 mins
Minimum Line Width 400 nm 400 nm 400 nm
CD uniformity (3σ) 10 nm 12 nm 20 nm
Registration (3σ) 20 nm 25 nm 30 nm
2
nd
layer alignment (mean + 3σ) 30 nm 45 nm 60 nm
Laser wavelength 266 nm
KEY SPECIFICATIONS
3 PASS 2 PASS 1 PASS
Writing speed* ~90 mins ~60 mins ~30 mins
Minimum Line Width 500 nm 500 nm 550 nm
CD uniformity (3σ) 12 nm 15 nm 20 nm
Registration (3σ) 20 nm 25 nm 30 nm
2
nd
layer alignment (mean + 3σ) 45 nm 50 nm 60 nm
Laser wavelength 404 nm
KEY SPECIFICATIONS
2 PASS 1 PASS
Writing speed* ~40 mins ~20 mins
Minimum Line Width 700 nm 700 nm
CD uniformity (3σ) 25 nm 35 nm
Registration (3σ) 30 nm 40 nm
2
nd
layer alignment (mean + 3σ) 60 nm 100 nm
Laser wavelength 404 nm
SHARED PLATFORM TECHNOLOGY FOR
ULTIMATE SYSTEM RELIABILITY
SLX series are built on Evo control platform which
is also used for other Mycronic’s mask writers.
All movement in the Evo control platform are
controlled by a new servo board called MCMC
(Multi Channel Motion Control) that enables real-
time compensation to minimize deviation. The result
is great stability and accuracy – something that’s
already been proven in the fi eld.
The MCMC servo board also comes with great log-
ging capability, ready to log all motions within the
system during exposure with high sampling rate.
The log can be analyzed and used for system
trending, preventive maintenance and much more,
enabling stable system operation and extension to
big data applications. Adding to that, the user can
customize the machine to further improve system
performance and enhance usability to widen the
addressable applications.
The SLX series, with superior
writing speed and modern data
path management, it’s made
to rewrite the standard of high-
volume production