Oxford ICP-CVD SOP.pdf - 第5页

Page 5 of 11 B) Vent chamber, load your sample, pump chamber 1) Vent the L oadlock: a) Visually check that the wafer has been unloaded into the loadlock b) Click System M enu , th en Pump ing c) Under the loadl ock inter…

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Run the recipe

a) From Recipes page, click “Run”, will hear

pump whirring get louder

i) NOTE: Do not click “Save” from the

Recipes page, it will bring up the

“Access Denied to User” popup

ii) NOTE: sample will be loaded from

loadlock into chamber automatically

b) When dialog box comes up asking to “run a

second process”, click yes. The first process

that was run was the previous user’s

cleaning process

c) Process page will come up automatically

Figure 14. Run button on Recipes page

Figure 15. Access Denied popup, if a User tries to save a recipe

Figure 16. "Run a second process" popup.

Monitor Process

a) Wait through “Pump” and “Purge” steps (5

minutes)

b) Once “Dep” step begins, watch RF power

stabilize on screen

i) If Reflected RF (red circles in picture)

does not stabilize at <5W, contact the

MNFL staff

c) Watch for plasma to ignite and stabilize in

chamber;

i) NOTE: if plasma is not visible once RF

power has stabilized, abort the

process, inform the MNFL staff

Figure 17. RF generator portion of Process Chamber page.

Figure 18. Plasma

in the chamber

Figure 19. Stop, Pause, and Jump

buttons.

Figure 20. Process aborted popup.

Always click yes!

Figure 21. Process Failed popup[

To abort a process, click the STOP button, on the process page

a) NOTE: If you stop a process, or it aborts due to a hardware fault, a dialog box will pop up asking if

you want your sample moved to the loadlock. Always click yes!!! You cannot unload your sample

manually, so if you click no, the staff will have to assist you

b) NOTE: NEVER CLICK THE ‘STOP ALL AUTO PROCESSES’ button in the top-right corner of the screen

c) The PAUSE and JUMP buttons allow you to a) temporarily shut off only the RF (Don’t do this,

reignition may not occur correctly), and b) skip the rest of the current step (avoid skipping steps

unless you need to shorten the actual deposition time mid-process)

d) A successfully-aborted process will result in your wafer being returned to the loadlock, where

you’ll see the “Yellow alert”, and a “Process Failed” popup. Remove your wafer, and contact the

MNFL staff

Once process is complete, a “Yellow Alert”

pop-up will appear

b) Click on it, click “Continue”

Wait ~30s for wafer unload sequence to finish

Figure 22. Yellow Alert popup

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B) Vent chamber, load your sample, pump chamber

Vent the Loadlock:

a) Visually check that the wafer has been unloaded into the

loadlock

b) Click System Menu, then Pumping

c) Under the loadlock interface, click Stop

d) A popup, “Wafer ….. has finished processing”. Click OK

e) Click Vent

f) Wait until “Vent Time Left” countdown reaches 0. This will

take 4 minutes.

Figure 23. "Wafer has finished processing"

popup

Figure 24. Loadlock pump/vent interface

Open the loadlock

a) Pull upwards on the black knob on the loadlock door

(circled). No twisting.

i) It will be slightly difficult to open, the interlock switch

sticks

ii) Place your elbow against the hinge for better leverage

Figure 25. Loadlock lid. Grab by knob

Load your sample

a) If using your hands, double-glove before handling wafer

b) Gently place your 4” carrier wafer (or 4” sample wafer) on

the loadlock tray, up against the round cams (circled), with

the flat facing towards the process chamber

c) Make sure the edge of your sample lines up with the

circular marker line (arrow)

i) NOTE: if you cannot get the wafer aligned to the

marker line (off by >1mm), contact the MNFL staff

Figure 26. Marker line and pins in loadlock.

Pump the loadlock

a) Close the loadlock door

b) Click “Stop”, then “Evacuate”

c) In the popup, enter a sample name. Press “OK” to indicate

a wafer in the loadlock, or “CANCEL” to indicate no wafer

in the loadlock

d) When "Cycling Loadlock Pumping" is displayed, the

vacuum is good enough for your recipe to be run

Figure 27. Loadlock Pump/Vent interface

Figure 28. "Name the wafer" popup. OK for

YES wafer, CANCEL for NO wafer

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C) Load and run desired recipes

Select and Run the desired recipe

a) Follow steps 3-6 from section C (conditioning run). Summarized:

i) From Recipes page, load the desired recipe

ii) Change the time of the “Dep” step, press OK

iii) Press Run

iv) Wait for plasma to ignite and stabilize; make sure plasma is stable before leaving tool

D) Vent loadlock, unload sample, load dummy wafer, pump loadlock

Vent loadlock

a) Follow procedure from section B

2) Unload sample

a) If using hands, double-glove before retrieving your sample

3) Load dummy wafer

a) the clean wafer you used for your conditioning run, or a clean 4” Si wafer

4) Pump loadlock

a) Follow procedure from section B