m220_383_02_process_manual工艺手册 - 第10页
PREFACE P ROCESS M ANU AL V III Contents description This manual is divided into the following secti ons and appendices: Section 1 Introduction Provides an overview of the Tempress Systems Inc. Horizontal furnace, w hat …
PREFACE
P
ROCESS MANUAL
Notes, Cautions and Warnings
Notes, Cautions and Warnings appear throughout this manual, where extra attention is
required to a particular (safety) item. Three levels can be distinguished:
)
NOTE
Notes alert to pay attention to items or procedures of special importance.
CAUTION
Cautions alert for a potentially hazardous situation that may result in minor
or moderate injuries.
Cautions can also alert for potential equipment and/or product damage.
WARNING
Warnings alert for conditions that may result in permanent and/or lethal
injuries.
V
II
PREFACE
P
ROCESS MANUAL
V
III
Contents description
This manual is divided into the following sections and appendices:
Section 1 Introduction
Provides an overview of the Tempress Systems Inc.
Horizontal furnace, what it is and what it can do.
Section 2 Safety
Describes the safety components and functions. It describes all measures
that are required to provide a safe way of working.
Section 3 Process setup and acceptance
Describes the basis of how to setup a process recipe and how to handle
alarms that are generated during the process. Finally all minimal process
requirements for acceptable process results are defined in process
acceptance.
Section 4 Process description
Contains specific process information including chemicals used, start-up
parameters and a basic recipe layout.
Section 5 Operation Instruction
Describes all procedures that are required for the process engineer.
Revision History
This manual is revision 0 of the Process Manual and is intended to explain the required
procedures. The function and screens it describes are based on the following software
releases:
• TSC 2 version 6.0 (17-02-2003)
• DPC 2.I.03 (17-02-2003)
• DTC 2.F.02 (17-02-2003)
• Touchscreen 2.I.05 (17-02-2003)
For minor software and hardware changes, addendum to this manual will be available. For
major changes, a new revision will be available. For price information or other questions
please contact Tempress Systems Inc.
INTRODUCTION
P
ROCESS MANUAL
1.Introduction
1.1 General
The horizontal furnaces of Tempress Systems Inc. are developed according to the latest
European directives for Machinery (
98/37/EC), Low Voltage (73/23/EC) and EMC
(
89/336/EEC).
The Tempress Diffusion system is a modular horizontal furnace designed to process (silicon)
wafers as part of the manufacturing technology of semiconductor, optical, MEMS and solar
devices.
Figure 1-1 shows an example of a L-shape diffusion system with 4 process tubes shown
without the partition of a cleanroom wall.
It is a right-handed system, defined according to the position of the furnace relative to an
operator.
Usually the system contains more than 1 tube. Based on the number and size of tubes, the
system is referred to as a 2, 3 or 4 stack.
Figure 1-1 is an example of a 4-stack system, allowing up to 4 different processes at any time.
The tubes are numbered from 1 to 4, with tube number 1 at the top and tube 4 at the
bottom. All tubes operate fully independently.
Main Power Cabinet
Figure 1-1 Schematic view of a right-handed 4-stack Diffusion System
1-1