m220_383_02_process_manual工艺手册 - 第6页

TABLE OF CONTENTS P ROCESS M ANU AL I V 5.8 Clear Alarms .......................................................................... 5.8-2 5.8.1 Required action ....................................................... 5.8-…

TABLE OF CONTENTS

ROCESS MANUAL

III

4.3 Silicondioxide (LTO SiO

) from SiH

and O

.......................... 4.3-1

4.3.1 Basic configuration ................................................. 4.3-1

4.3.2 Description.............................................................. 4.3-1

4.3.3 Startup parameters for processing.......................... 4.3-2

4.3.4 Recommended cleaning interval ............................ 4.3-2

4.3.5 Process result indication......................................... 4.3-3

4.3.6 Gas schematic example: LPCVD LTO.................... 4.3-4

4.3.7 Recipe example: LPCVD silicondioxide from LTO SiH

and O

4.3-5

4.3.8 Troubleshooting an LTO process ........................... 4.3-8

5. Operation Instructions...................................................4.3-1

5.1 Load or Unload process wafers............................................. 5.1-1

5.1.1 Load process wafers............................................... 5.1-1

5.1.2 Unload wafers......................................................... 5.1-1

5.2 Login TSC-2........................................................................... 5.2-1

5.2.1 TSC-2..................................................................... 5.2-1

5.3 Selecting a new process recipe ............................................. 5.3-1

5.3.1 Touchscreen........................................................... 5.3-1

5.3.2 TSC-2..................................................................... 5.3-3

5.4 Start/Continue a new process recipe..................................... 5.4-1

5.4.1 Touchscreen........................................................... 5.4-1

5.4.2 TSC-2..................................................................... 5.4-2

5.5 Stop a running process recipe ............................................... 5.5-1

5.5.1 Touchscreen........................................................... 5.5-1

5.5.2 TSC-2..................................................................... 5.5-2

5.6 Abort a running process recipe.............................................. 5.6-1

5.6.1 Touchscreen........................................................... 5.6-1

5.6.2 TSC-2..................................................................... 5.6-2

5.7 Edit ‘Variable Process Command’.......................................... 5.7-1

5.7.1 Touchscreen........................................................... 5.7-1

5.7.2 TSC-2..................................................................... 5.7-3

TABLE OF CONTENTS

ROCESS MANUAL

5.8 Clear Alarms.......................................................................... 5.8-2

5.8.1 Required action....................................................... 5.8-2

5.8.2 Touchscreen........................................................... 5.8-2

5.8.3 TSC-2..................................................................... 5.8-3

5.9 Write/Edit process recipe....................................................... 5.9-2

5.9.1 Touchscreen........................................................... 5.9-2

5.9.2 TSC-2..................................................................... 5.9-3

5.10 Edit graphical image............................................. 5.10-2

5.10.1 Touchscreen......................................................... 5.10-2

5.10.2 TSC-2................................................................... 5.10-2

5.11 Logging process data ........................................... 5.11-2

5.11.1 TSC-2 (only) ......................................................... 5.11-2

PREFACE

ROCESS MANUAL

Preface

This set of manuals explains how to operate and maintain a Horizontal Diffusion/LPCVD

furnace.

Refer to the Touchscreen reference manual (M440.00) or the TSC-2 reference manual

(M450.00) for a full description of all operating screens.

For information about maintenance, refer to the maintenance manual (M230.00).

The Tempress Horizontal Diffusion Furnaces are fully described in the reference manuals

(M300.00).

Tempress documentation set

The complete Tempress documentation set includes:

• Safety manual

• Operator manual

• Reference manuals

1. Loadstation

2. Furnace

3. Gas cabinet

4. Main Power cabinet

5. DPC (Digital Process Controller)

6. DTC (Digital Temperature Controller)

7. ETC (Excess Temperature Controller)

8. Touchscreen

9. TSC-2 (+ SECS/GEM)

• Vendor documentation

1. Digital pressure switch

2. Mass Flow Controllers

3. External torch controller (if used)