Utah-94-721002-System-Manual.pdf - 第106页
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The production mode page is automatically displayed when a user logs on in production
mode. To use the production mode facility, refer to sub-section 5.4.7 (page 5-18).
Note that the System menu button can be used to select the pumping option. This provides
the facility of evacuating and venting the automatic load lock.
Fig 5.15: Production mode page
The facilities available on this page are:
Recipe Name
field
The name of the currently loaded recipe. The indicator at the right of
this field is coloured red until a recipe is loaded when it changes to
green.
Batch Id field
Enter the batch identity of the currently loaded wafer. The indicator
at the right of this field is coloured red until a batch identity is
entered when it changes to green.
Created field
The date and time of recipe creation.
Recipe Length
field
The length of time taken to run the recipe.
Load button
Select to load an existing recipe.
Run button
Select to run the current recipe. Be aware that selecting this
button will cause system components, e.g. valves, heaters,
etc., to operate! Note that this button only becomes active when a
recipe has been loaded and a batch identity has been entered.
Operating Instructions
Printed: 22-Mar-06, 10:42 Page 5-39 of 52 UC Davis 94-721001 Issue 1: March 06
mä~ëã~ä~ÄpóëíÉãNMM lñÑçêÇ=fåëíêìãÉåíë=mä~ëã~=qÉÅÜåçäçÖó== System Manual
Recipe step list
A scrollable sequential list of steps contained in the recipe.
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Fig 5.16: Chamber 1 process control page
This page is used to set the process parameters either for a manual run, or for a process step
to be used in an automatic run recipe.
The facilities available on this page are:
Process chamber
message field
Displays context related messages about the process chamber.
Transfer status/
Log Comment
message field
Displays context related messages about wafer transfer status. This
field is also used to enter comments about the current process run
which can be viewed on the log viewer page.
Wafer status
field
Displays context related messages about the wafer currently in the
Automatic load lock or process chamber.
Log Comment
button
Allows comments about the current process to be entered in the
Transfer status/Log Comment message field. While entering a
comment, the button title changes to OK to allow the comment to be
accepted.
Leak Detection
button
Displays the leak detection page. See sub-section 5.8.6, page 5-45.
Start button
Select to start a manual process run using the parameters set on this
page.
Operating Instructions
UC Davis 94-721001 Issue 1: March 06 Page 5-40 of 52 Printed: 22-Mar-06, 10:42
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Stop button
Select to stop the current process step.
Pause button
Select to pause the current process.
Jump button
Select to jump to the next process step.
Recipe message
field
Displays information about the current recipe, step, loaded wafer
identity, etc..
Step Time fields
Enter the required step time in hours:minutes:seconds. While a process
is running, the adjacent field displays the time remaining to the end
of the step.
Log Interval
fields
Enter the interval required between data logging events.
Process status
field
Indicates the process status; either Ready, Auto or Manual
Pump to
Pressure
checkbox
Select to create a pumping step. The system will pump down until the
demanded pressure is reached. The step will remain active until this
condition is met. Both RF Generators are automatically switched off
during the step. (9 Indicates selected). All setpoints are automatically
set to zero, except for base pressure.
Pressure fields
Enter the required Process Chamber pressure for the step. The
measured pressure is displayed in the adjacent field.
Ignore
Tolerances
checkbox
Select to disable tolerance checking during the current step. (9
indicates selected).
NOTE: RF power turns on immediately without waiting for flows and
pressure to be established.
Hold button
Used in multi-step recipes to keep the plasma on between steps.
NOTES:
The Hold button is only displayed on the Process Control page when a
recipe is loaded. The Hold facility can be selected when
creating/editing a process step using the Process Editor page.
When running the recipe, at the end of the process time for a process
step without the Hold button selected, all process setpoints (chamber
pressure, helium backing pressure, table temperature, RF power, ICP
power, gas flow, etc) are set to zero (off) before starting the next
process step. This means that the plasma would be extinguished
between two plasma process steps if the Hold button were not
selected.
When running the recipe, at the end of the process time for a process
step with the Hold button selected, all process setpoints (chamber
pressure, helium backing pressure, table temperature, RF power, ICP
power, gas flow, etc) are set to the values of the next process step to
run. This means that the plasma remains on between two plasma
process steps if the Hold button is selected.
Operating Instructions
Printed: 22-Mar-06, 10:42 Page 5-41 of 52 UC Davis 94-721001 Issue 1: March 06