Utah-94-721002-System-Manual.pdf - 第124页
mä~ëã~ä~Ä póëíÉãNMM lñÑçêÇ=fåëíêìãÉåíë=mä~ëã~=qÉÅÜåçäçÖó== System Manual WARNING BEFORE PROCEEDING WITH ANY MAINTENANCE WORK, READ SECTION 1 - HEALTH AND SAFETY . SKQ= VQJNMMJ_tJOc=_~ëÉ=ïáêÉÇ=OJÑê~ãÉ=âáí= SKQKN= tÉÉâäó= …
System Manual lñÑçêÇ=fåëíêìãÉåíë=mä~ëã~=qÉÅÜåçäçÖó== mä~ëã~ä~ÄpóëíÉãNMM
WARNING
BEFORE PROCEEDING WITH ANY MAINTENANCE WORK, READ SECTION 1 - HEALTH AND SAFETY.
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Induction coupled plasma sources contain quartz or alumina tubes or windows under vacuum,
which may be subject to attack by the plasma process. If these components fail whilst under
vacuum, an implosion can occur. This should not present a safety hazard, provided the
equipment is used with all covers and screens in place, but may cause damage to system
components.
Failure by implosion becomes more likely as the components age, therefore they should be
regarded as consumable items. A programme of regular inspection and renewal of these
components is necessary to minimise the risk of implosion.
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WARNING
DISCARDED COMPONENTS MAY BE CONTAMINATED WITH RESIDUES FROM THE
PLASMA PROCESS AND MAY BE ACIDIC OR TOXIC. DISPOSE WITH REGARD TO
LOCAL PRACTICES.
IMPORTANT: The following inspection intervals should be reduced if the source is
operated for prolonged periods at high powers, especially for quartz
components operating in fluorine-containing plasmas.
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The internal surfaces of these components should be inspected at intervals of three months or
less. Components showing significant signs of wear should be discarded and replaced by a
new component. For details of changing the ICP 180 dielectric tube, refer to the ICP 180
Equipment Manual Section 6 (Maintenance).
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The internal surfaces of these components should be inspected at intervals of six months or
less. Components showing significant signs of wear should be discarded and replaced by a
new component. For details of changing the ICP 180 dielectric tube, refer to the ICP 180
Equipment Manual Section 6 (Maintenance).
Maintenance
Printed: 22-Mar-06, 7:41 Page 6-5 of 22 UC Davis 94-721001 Issue 1: March 06
mä~ëã~ä~ÄpóëíÉãNMM lñÑçêÇ=fåëíêìãÉåíë=mä~ëã~=qÉÅÜåçäçÖó== System Manual
WARNING
BEFORE PROCEEDING WITH ANY MAINTENANCE WORK, READ SECTION 1 - HEALTH AND SAFETY.
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Examine the exterior of the machine for damage or signs of overheating and for failed
indicator lamps.
Closed loop (recirculating) cooling systems:
Top up with Hexid A40 coolant (Oxford Plasma Technology Part No. G/WTR/SUN/007
for 15 litres). This product is propylene glycol based and is pre-diluted ready for use.
Refer to Appendix S (Services Specifications for Plasmalab and Ionfab systems) sub-
section 2.1 for the warranty impact of not using this product.
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1) Monitor the vacuum integrity of the system by pumping thoroughly, isolating the
process chamber and noting the rate of pressure rise. An abnormally high value (i.e.
> 2mTorr/minute) may indicate a leak or heavy contamination of the process
chamber. (The chamber can be isolated by clicking the Stop button on the
corresponding Pump Control page.)
2) Monitor the backing pump(s)' condition by timing how long it takes to pump from
atmosphere to 0.1 Torr (without a turbomolecular pump turned on). An increase in
time may indicate deteriorating pump performance.
3) Check the zero setting of the Capacitance Manometer (CM gauge). Note that the
CM gauge output does not stabilise until it has been switched on and under vacuum
for 15 minutes. A turbo pumped system will have a base pressure well below
0.1 mTorr, so the zero point can be adjusted readily in this case (see manufacturer's
data). A Roots / rotary combination should give a base pressure below 1 mTorr, and
can be used to set the zero point of a 10 Torr gauge. A rotary pump should give a
base pressure below 10 mTorr, so a true zero pressure cannot be set in this case.
Either the gauge should be set to the same arbitrary reference level (e.g. 10 mTorr),
or it should be set to zero on another vacuum system with a known base pressure,
and carefully re-installed in the System 100.
4) Monitor the performance of each mass flow controller, by noting the system
pressure with 10%, 50% and 100% flow setpoints and the throttle fully open. A
change may indicate a deterioration in MFC performance, or a change in pumping
speed.
Maintenance
UC Davis 94-721001 Issue 1: March 06 Page 6-6 of 22 Printed: 22-Mar-06, 7:41
System Manual lñÑçêÇ=fåëíêìãÉåíë=mä~ëã~=qÉÅÜåçäçÖó== mä~ëã~ä~ÄpóëíÉãNMM
WARNING
BEFORE PROCEEDING WITH ANY MAINTENANCE WORK, READ SECTION 1 - HEALTH AND SAFETY.
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1) Heater/chiller unit (on closed loop cooling systems).
If the condenser on the refrigeration circuit is air-cooled, it should be kept clean
enough to allow the free flow of air through it. Dirt can be removed by brushing or
vacuum cleaning.
Radio frequency radiation leakage:
Carry out the Radio Frequency radiation leakage tests as detailed in Appendix A
‘Measurement of RF and microwave emissions’.
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1) Replace or clean the filters used in the compressed air supply system.
2) Replace the filters in the cooling water system.
3) Where closed loop (recirculating) water cooling systems are used, drain the system
and replace the coolant with Hexid A40 coolant (Oxford Plasma Technology Part No.
G/WTR/SUN/007 for 15 litres). This product is propylene glycol based and is pre-
diluted ready for use. Refer to Appendix S (Services Specifications for Plasmalab and
Ionfab systems) sub-section 2.1 for the warranty impact of not using this product.
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The operator should be aware that certain process parameters may change as the process gas
bottles pressure drops. For example, inert gas bottles which are normally filled to about 3000
psi, should be changed when the pressure drops below 400 psi. The inlet pressure should be
25 - 35 psia. Before disconnecting the empty bottle it is advisable to thoroughly evacuate the
gas line (by closing the gas bottle tap and pumping the line via the MFC). The line should
then be filled with dry N
2
if available.
Once the new bottle has been connected, monitor the vacuum integrity of the gas line before
opening the bottle by setting a high flow on the MFC, pumping the line thoroughly (via the
MFC), isolating the process chamber and noting the rate of pressure rise. An abnormally high
value (>2mTorr/minute) may indicate a leak in the gas line or the regulator to bottle
connection.
During normal operation the bottle pressure and line pressure on the cylinder regulator
should be regularly checked for loss of pressure during periods when the gas bottle tap is
turned off (during shut-down periods, overnight or over a weekend). This will indicate a leak
from the gas line or the regulator.
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Where the system is used for Plasma Enhanced Chemical Vapour Deposition (PECVD), the
manual processing runs should be interspersed with etching processes as an efficient method
of cleaning the electrodes and chamber walls.
The etching processes may be optimised to suit particular processing requirements; however,
the following recommendations may be used as a starting point.
Maintenance
Printed: 22-Mar-06, 7:41 Page 6-7 of 22 UC Davis 94-721001 Issue 1: March 06