prober-english - 第13页

6 inch 8 inch Model HSP-V150 / HSP-V200 On ‐ wafer  Characteristics  Evaluation  of  MEMS  Devices  at  High / Low  Temperatures  in  an  Ultra  High  Vac uum  Environment  ■ VACUUM PROBE SYSTEM ・ Model HS…

25mm sq.

Model HMP-V80 series

CompactVacuumProberforR&D(atUltraLowtoUltraHighTemperatures)

ThisisacompactvacuumproberforR&DthatsupportsI‐V/C‐V/RFmeasurementson5‐mmto25‐mmsamples.

Thereareavarietyofmodelsavailablesuchasonethatsupportstemperaturetestsatultralowtemperaturesonthe

4klevelandonethatsupports

thetemperaturetestsatupto+500°C.

Substrate Size

General

Ultimatevacuum*

Numberofmeasurementchannels

Measurementfeed‐throughconnector*

Probe X‐Y‐Ztravel

Magnification*

Illuminatingapparatusformicroscopes*

ProbeAdjustmentsensitivity

5mm～ 20mm square

1x10E‐4Pa

40x～ 240x(onmonitor)

LEDring lighti ng

2～ 7(6‐ probemaximum，1‐ chuck)

Hermetically triaxial(Jack)standard

X30mm,Y50mm, Z15mm

＜0.01mm

Microscopemovement*

Microscopetype

3jointhorizontalswingarm

CCDmono‐scopewithLCDmonitor

*Itemswithasteriskvarydependingonsystemconfiguration.

Movements

Microscope

Roomtemperatureorultralowtemperaturemodel

Model Temperaturerange Heatingmethod Coolingmethod

HMP‐V80 Ambient None None

HMP‐V80‐LH

4.2kto298k(+25°C)

Heater Liquidheliumtransfer

HMP‐V80‐LHM

8klevelto473k(+2 00°C)

Heater Liquidheliumtransfer

HMP‐V80‐LHH

10klevelto573k(+300°C)

Heater Liquidheliumtransfer

HMP‐V80‐LN

80kto298k(+25°C)

Heater Liquidnitrogencryostat

HMP‐V80‐LNM

80kto473k(+200°C)

Heater Liquidnitrogencryostat

HMP‐V80‐LNH

80kto573k(+300°C)

Heater Liquidnitrogencryostat

HMP‐V80‐PS

80kto298k(+25°C)

Heater FreePistonStirlingcooler

Ultrahightemperaturemodel

Model Temperaturerange Heatingmethod Coolingmethod

HMP‐V80

R.T.to+300°C

Heater Compressedair

HMP‐V80‐LH

R.T.to+400°C

Heater Compressedair

HMP‐V80‐LHM

R.T.to+500°C

Heater Compressedair

Common specification

■ VACUUM PROBE SYSTEM

Vacuumprobesystem

6inch

8inch

Model HSP-V150 / HSP-V200

On‐waferCharacteristicsEvaluationofMEMSDevicesatHigh / LowTemperatures

inanUltraHighVacuumEnvironment

■ VACUUM PROBE SYSTEM

・

Model HSP-V150 is for 6" wafers.

・

Model HSP-V200 is for 8" wafers.

Thisprobersupportson‐wafermeasurementsathigh/lowtemperatures(‐60°Cto+300°C)onMEMSdevicesthatmust

operateinavacuumenvironmentsuchasRFMEMSdevicesorcrystaloscillatorMEMSdevices.

Thecostofpackagingwhichisaveryexpensiveprocesscanbereducedby

implementingthissystem.

MEMSdevicecharacteristicssuchastheequivalenceconstant,transmissioncharacteristicssimulation,orSparameter

canbeautomaticallyacquiredonthewaferbycombiningtheproberwiththeimpedanceanalyzer,RFnetworkanalyzeror

othertester.

WaferSize

X‐Ytravel

X‐Yrepeatability

X‐Yaccuracy

Ztravel

Unitdimension（W×D×H）*

Weight*

Zrepeatability*

HSP‐V150 HSP‐V200

～φ150mm ～φ200 mm

X：160mm，Y：160mm X：310mm，Y：310mm

2500×1800×1900mm

2700×2000×1900mm

1300kg 1600kg

＜±2μm

＜±5μm

20mm

＜±1μm

θ travel

θ repeatability

±7.5°

0.002°

*Itemswithasteriskvarydependingonsystemconfiguration.

Ultimatevacuum 1x10E‐3Pa（1ｘ 10E‐5Paoptional）

Atthestageofresearchanddevelopment

oforganicsemiconductordevicesuchas

OFET，OTFT，OEL，andOLED,itis

necessarytoperformevaluationunder

high‐purityinertgastoavoidcharacteristic

degradationcausedbymoistureoroxygen

intheatmosphere.

Oncethissystemisimplemented,organic

semiconductordevicescanbe

measuredat

ahighorlowtemperature(‐60°Cto+300°C)

inthehighly‐pureinertgas(N2orAr)

environmentachievedbyvacuumingand

gasdisplacement.

Thissystemsupportsultralowsignal

measurementsandmeetsdemandforhigh‐

accuracyI‐V/C‐Vmeasurementsinvarious

organic

semiconductordevices.

MEMS

Organicsemiconductor

Vacuumprobesystem

Magnetic Stimulation Probe System

■ SPECIALTY PROBE SYSTEM

Semi‐automaticVerticalmagneticfieldprober

(± 1500Oe ,‐60゜Cto+200゜C)

Weofferdesignandmanufacturingofprobesystemstoapplymagneticfieldsforevaluatingalltypesof spintronics devices

(MRsensor,MRAM,Fram,FeRam)andHalldevices.

‐ Highlyadvancednonmagneticstructure

‐ Excellentmagneticfieldhysteresischaracteristics

‐ Supportssuperlowresidualfieldelectromagnets.

‐ Supportsin‐planemagneticfieldsandverticalmagneticfields.

‐ Provision

ofmagnetic fieldapplicationandmeasurementapplicationsoftware

‐ Provisionoftraceablemagneticfieldcalibrationtoolandcorrecti onsoftware

‐ Temperaturecharacteristicevaluationinrangefrom‐65°Cto+200°C

‐ Lowresistancemeasurements,RFmeasurements(upto67GHz)

‐ SupportsmanualproberandSemi‐automaticprober

Elemental technologies

PatenttechnologyofToeiScientificIndustrialCo.,Ltd.isusedforourprobesystemmountedwithverticalmagneticfieldelectromagnets

(JapanPatentApplicationLaid‐OpenDisclosureNumber2010‐212453)

ManualIn‐plane magneticfieldprober

(‐3000Oe to+3000Oe)

Specialty Probesystem