S1.pdf
Source Workshop, Amsterdam, November 5 th 2019 EUV Source for Lithography in HVM: performance and prospects Igor Fomenkov ASML Fellow
Source Workshop, Amsterdam, November 5
th
2019
EUV Source for Lithography in HVM:
performance and prospects
Igor Fomenkov
ASML Fellow
• EUV lithography in HVM
• Background and History
• EUV Lithography with NXE:3400B
• Principles of EUV Generation
• EUV Source: Architecture
• EUV Sources in the Field
• Source Power Outlook
• Summary
Outline
Slide 2
Public
Slide 3
And it’s here: we see EUV - enabled chips in 2019
EUV up and running in High Volume Manufacturing
Public