Mycronic new FPSTM series Built for world-class photomasks.pdf - 第3页

4 5 Advanc ed photoma sks f or the multi-p urp ose mar ket have contin uou sly a dapted t o the req uirem ent s d riv- en by el ectro nic s com po nent miniatur ization , wh ile at th e s ame time o pe rating in a cost s…

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The new generation FPS series is built on the Evo control platform.
Updated with new, innovative software and hardware architecture,
it’s been designed for the future of production automation, advanced
connectivity and big data applications.
The FPS Evo series
Full flexibility for multi-
purpose photomasks
IMPROVED STABILITY AND HIGHER UPTIME
New servo board with linear movement, simplified
electronics with better performance and modern
bus structure provide superior stability and better
error handling to create higher system uptime.
SUPPORT FOR HIGHER LEVEL OF FACTORY
AUTOMATION WITH VARIOUS LOADER SOLUTION
Newly developed PLS (Pre Loading System) and
interface supporting communication from factory
automation system to minimize human interface in
order to reduce contamination and human error.
BETTER SUPPORT FOR LOGGING, CONNECTIVITY
AND BIG DATA APPLICATIONS
New servo board log all motions in system which can
be analyzed and used for many dierent purpose,
enabling stable system operation and extension to
big data applications.
EXTENDABLE WITH NEW FUNCTIONALITY
Build on completely new modern hardware and
software architecture for possibility to develop new
functions in the future meeting customers’ demand.
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Advanced photomasks for the multi-purpose market
have continuously adapted to the requirements driv-
en by electronics component miniaturization, while
at the same time operating in a cost sensitive market
space. Reliable and well proven, the FPS 6100 Evo
is used by some of the world’s leading photomask
manufacturers to achieve superior image quality and
productivity for advanced multi-purpose applica-
tions.
The FPS series has field-proven stability, high
productivity and great writing quality, and is now
re-launched with the FPS 6100 Evo and FPS 6100E
Evo – designed to achieve superior image quality
and productivity and, win the competition within
multi-purpose market.
Key highlights
• 6 dierent optical levels for chrome mask writer
• 3 dierent optical levels for emulsion mask writer
• XT mode to enhance writing speed up to 73%
compared to standard mode
• Various loader solution, MLU, HMU and fully
automated PLS
• Various configurable options that customer can
choose depending on users’ business strategy
FPS 6100E EVO FOR EMULSION MASKFPS 6100 EVO FOR CHROME MASK
KEY SPECIFICATIONS
LEVEL 25 LEVEL 20 LEVEL 15
Writing speed (mm
2
/min) 5 000 10 000 12 000
Minimum lines and spaces (pitch/2) 5
m 7 m 10 m
CD uniformity (3σ) 250 nm 350 nm 450 nm
Pattern butting (3σ) 200 nm 300 nm 400 nm
Overlay (3σ) 120 nm 140 nm 160 nm
Max. mask size (mm) 813 x 813
KEY SPECIFICATIONS
LEVEL 80 LEVEL 60 LEVEL 40 LEVEL 25 LEVEL 20 LEVEL 15
Writing speed (mm
2
/min) 525 1 250 2 600 6 000 8 000 12 000
XT mode (mm
2
/min) 650 1 500 4 500 8 500 12 000 20 000
Minimum lines and spaces (pitch/2) 0.75
m 1.2 m 2.0 m 3.5 m 5.0 m 7.0 m
CD uniformity (3σ) 30 nm 40 nm 60 nm 80 nm 100 nm 200 nm
Pattern butting (3σ) 60 nm 60 nm 80 nm 100 nm 150 nm 170 nm
Overlay (3σ) 70 nm 85 nm 100 nm 120 nm 140 nm 160 nm
Max. mask size (mm) 813 x 813
FPS 6100 Evo and
FPS 6100E Evo
Improved stability, higher
speed and lower costs
for the advanced multi-
purpose market
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The FPS 8100 Evo is our high-end solution for mask
producers who want all the flexibility of the FPS
concept but face new challenges relating to the
microfabrication of LEDs, advanced electronic pack-
ages or fine metal mask applications. It’s is the best
fit for users who want to have FPS 6100’s flexibility
and the perks of improved capability to take on new
business opportunities that was previously limited
because of stage size.
The FPS 8100 Evo has an 87% increase in writing
area compared to the FPS 6100 Evo, which handles
photomask to manufacture display generation 6 size
of Fine Metal Mask.
Key highlights
• Two optical levels to choose
• Maximum mask size up to 1400 x 1620 mm
• Fastest writing speed among FPS series with
further speed increase up to 54% using XT-
mode option
• Various loader solution, HMU, Semi-automated
HMU and fully automated PLS
FPS 8100 EVO FOR CHROME MASK
KEY SPECIFICATIONS
LEVEL 40 LEVEL 25
Writing speed (mm
2
/min) 4 500 6 500
XT mode (mm
2
/min) 6 000 10 000
Minimum lines and spaces (pitch/2) 2
m 3.5 m
CD uniformity (3σ) 60 nm 80 nm
Pattern butting (3σ) 80 nm 100 nm
Overlay (3σ) 100 nm 120 nm
Max. mask size (mm)
1 100 x 1 660 and
1 400 x 1 620
FPS 8100 Evo
Scale up your capability