The new PrexisionTM series Setting the global standards for displays.pdf - 第5页

AD11 203 rev A / May 2 020 Mycronic, Pr exision, LRS, FPS, MMS, Sigma and Omega are r egistered trademarks or trademarks of Mycr onic AB. Mycronic AB is ISO 9001:2015 and ISO 1400 1:2015 certiﬁed. Mycronic’ s Prexision l…

4 5

Prexision 800 Evo is the most advanced mask writer

when it comes to ecient production of top critical

photomask manufacturing for cutting-edge displays

such as AMOLED and foldable displays for ﬂagship

smartphones.

Beneﬁts of the Prexision 800 Evo

• 25% increase resolution with custom made

ﬁnal lens

• 3 times better lens and mirror quality with

stress free optic mounter

• More multi beams to maintain throughput

even with smaller pixels

• HT mode specs similar with Prexision 80 Evo

HA mode

• New improved software algorithm to

compensate uneven beam performance

2X better CD uniformity performance compared

to Prexision 80 Evo. Prexision 800 Evo is perfect

for deﬁning small enough feature size with good

quality, such as OPC (Optical Correction Proximity)

on photomasks that are required for the most

advanced display manufacturing, as well as support

for future R&D.

Prexision 800 Evo

The new resolution standard for top critical

photomask manufacturing

Prexision 80 Evo

Prexision 80 is known for overcoming the challenge

of the “invisible Mura” for advanced AMOLED

displays for smartphones. With the Evo control

platform, the Prexision 80 Evo is more robust and

stable than ever which is perfect for critical photo-

masks manufacturing used for high resolution

LCDs and mid to advanced AMOLED displays.

Key highlights

• Software algorithm to compensate uneven

beam performance

• 2X better CD Uniformity performance

compared to Prexision 8 Evo/Prexision 10

• Z-correction as a standard function

Prexision 80 Evo

Higher yield for high resolution advanced

LCD and AMOLED displays

KEY SPECIFICATIONS

HA mode HT mode

Minimum lines and spaces (pitch/2) 0.55 m 0.85 m

Constituent CD uniformity (3σ) 10 nm 15 nm

CD linearity 1.0-10 um (p-p) 50 nm 85 nm

Local placement (3σ) 30 nm 50 nm

Written registration (3σ) 125 nm 175 nm

Written overlay (3σ) 40 nm 50 nm

Mask set overlay (3σ) 75 nm 100 nm

KEY SPECIFICATIONS

HA mode HT mode

Minimum lines and spaces (pitch/2) 0.75 m 1.0 m

Constituent CD uniformity (3σ) 15 nm 25 nm

CD linearity 1.5-10 um (p-p) 50 nm 85 nm

Local placement (3σ) 30 nm 50 nm

Written registration (3σ) 150 nm 200 nm

Written overlay (3σ) 50 nm 70 nm

Mask set overlay (3σ) 75 nm 100 nm

6 7

Prexision 8 has been the display industry standard

for a decade, and is now being upgraded to the

Prexision 8 Evo. Prexision 8 Evo can handle up to

generation 8 mask size and comes with new mode

conﬁ guration, o ering a wide range of choices

depending on the user’s business strategy.

Prexision 10 system can handle up to generation

11 mask size.

Key highlights

• The most well balanced system between perfor-

mance and volume production of advanced TFT

LCD photomask.

• New calibration procedure used for advanced

mask writer to maintain system performance for

Prexision 8 Evo

• New “Entry mode” for Prexision 8 Evo widening

system o ering

Prexision 10

*Requires Z-correction option

Prexision 8 Evo and Prexision 10

The best ﬁ t for volume production of

photomasks for advanced LCDs

*Requires Z-correction option

Prexision 8 Evo

KEY SPECIFICATIONS

ENTRY MODE HA mode HT mode

Minimum lines and spaces (pitch/2) 1.2 m 0.75 m 1.0 m

Constituent CD uniformity (3σ) 30 nm 20 nm 25 nm

CD linearity (p-p) 85 nm (2.4 – 10 um) 50 nm (1.5 – 10 um) 85 nm (1.5 – 10 um)

Registration (3σ) 90 nm 90 nm 90 nm

Written overlay (3σ) 150 (120*) nm 120 (90*) nm 150 (120*) nm

Mask set overlay* (3σ) 120 nm 90 nm 120 nm

KEY SPECIFICATIONS

HA mode HT mode

Minimum lines and spaces (pitch/2) 0,75 m 1.0 m

CD uniformity (3σ) 60 nm 85 nm

CD linearity 1.5-10 um (p-p) 50 nm 85 nm

Registration (3σ) 90 nm 90 nm

Written overlay (3σ) 120 (90*) nm 150 (120*) nm

Mask set overlay* (3σ) 90 nm 120 nm

Prexision Lite 8 Evo

A cost-e cient mask writer for low to

mid-end display photomasks

Mycronic LRS systems have supported the market

for less complex photomasks for a decade, despite

its limitations in terms of stability and data path to

handle increase in pattern data size. The Prexision

Lite 8 Evo is the new system model that supports

low to mid-end display photomasks, developed and

based on know-how from old experience and new

technologies that’s been proven to work from the

ﬁ eld systems.

Key highlights

• Fastest mask writers with writing speed

1,350 mm

/min

• Level 60 ﬁ nal lens

• Granite stage that can handle generation 8

photomask size

• Stable data path to handle increasing data size

• Adoption of improved calibration procedure

from advanced mask writers to widen address-

able market

KEY SPECIFICATIONS

HA mode

Minimum lines and spaces (pitch/2) 1.2 m

Constituent CD uniformity (3σ) 30 nm

CD linearity 2.4-10 um (p-p) 85 nm

Registration (3σ) 120 nm

Written overlay (3σ) 300 (250*) nm

*Requires Z-correction option

AD11203 rev A / May 2020

Mycronic, Prexision, LRS, FPS, MMS, Sigma and Omega are registered trademarks or

trademarks of Mycronic AB. Mycronic AB is ISO 9001:2015 and ISO 14001:2015 certiﬁed.

Mycronic’s Prexision laser pattern generators are protected by several patents including, but not limited to, the following patents:

US Patents No. 5 495 279, US 5 517 349, US 5 635 976, US 6 448 999, US 6 529 266, US 6 624 878, US 6 700 600, US 6 844 123,

US 6 883 158, US 7 148 971, US 7 709 165, US 7 912 671, US 7 919 218, US 8 137 875 and Chinese Patents No. CN 00807832.7, ZL00814427.3,

ZL200480031019.7, CN 101194208, CN 102037312, and other corresponding national patents and patent applications pending.

SOUTH KOREA

Mycronic Co. Ltd.

3rd Floor, Jung-San

Bldg. 1026-8

Sanbon-Dong, Gunpo-Si

Gyeonggi-Do, 15808

South Korea

Tel: +82 31 387 5111

USA

Mycronic Inc.

554 Clark Road

Tewksbury, MA 01876

USA

Tel:+1 978 667 9449

mycronic.com

SWEDEN

Mycronic AB

PO Box 3141

Nytorpsvägen 9

SE-183 03 Täby

Sweden

Tel: +46 8 638 52 00

CHINA

Mycronic Co., Ltd

Unit 106, E Block

Lane 168, Da Duhe Road.

Putuo District, 200062

Shanghai P.R. China

Tel: +86 21 3252 3785/86

JAPAN

Mycronic Technologies KK

Chofu Center Bldg.

1-18-1 Chofugaoka, Chofu-shi

Tokyo 182-0021

Japan

Tel: +81 42 433 9400