IPC CH-65B CHINESE.pdf - 第118页

8.1 1.6.10 组件表⾯的残留物 助焊剂残留物 会 导致 对 元器 件、 元器 件 引 线和覆 盖 区 域 敷形 涂覆时 差 的 附着 性 / 退润湿 。 这些 影 响 会 导致 碎 裂 的 或者 剥 离 的 颗 粒 。 根 源在 于 差 的清洗、 波 峰 掩 膜 材料和 波 峰 焊接/返修助焊剂 。 8.1 1.6.1 1 标 签 一 些 标 签 胶 黏 剂 会 导致 标 签 周围的 敷形 涂覆 层 附着 性 差 / 退润湿 。…

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8.11.6.2 前/敷形涂覆遵循三个前/1. 组件
清洗2. 组件膜;3. 组件检查/返工。(8-17
8.11.6.3 敷形涂覆原因和影响 敷形涂覆前要清洗的四个
因素1. 元器2. 组件材料3. 清洗程和助焊剂化学性
8-18
8.11.6.4 敷形涂覆缺陷 清洗程与缺陷相关。
8.11.6.5 掩蔽残留物 掩蔽元器或者单板表面的材料会
导致附着敷形涂覆时的退润湿
清洗不残留
退润湿敷形涂覆导致涂覆产生敷形涂覆附着
8.11.6.6 离⼦污染物 组件上子的在可能会导致敷形
涂覆时气或者橘皮源在清洗不手指和组
件污染。
8.11.6.7 有机残留物的附/退润湿 机残留物的表面
行敷形涂覆时,会导致退润湿/或者分
8.11.6.8 元器的残留物 这些残留物扩散,并导致
件、元器线和单板表面敷形涂覆时附着/
退润湿
源在的清洗、表面能和SMT度过
8.11.6.9 焊点的残留物 助焊剂残留物导致元器件、元器
线和覆敷形涂覆时附着/退润湿源在
的清洗、SMT度过
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8-18 敷形涂覆原因和影响
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8.11.6.10 组件表⾯的残留物 助焊剂残留物导致元器件、元器线和覆敷形涂覆时
附着/退润湿这些导致或者源在的清洗、材料和
焊接/返修助焊剂
8.11.6.11 导致周围的敷形涂覆附着/退润湿源在的清
洗、标选择和标
考⽂
1. Bixenman, M., Zhang, P. & Shi, C. (2009, May). White Residues on Printed Circuit Boards Post Cleaning.
SMTA China Technical Conference. Shenzhen, China.
2. Lee, .C. (2002). Reflow soldering processes and troubleshooting SMT, BGA, CSP and Flip Chip Tech-
nologies. ewness: Woburn, MA
3. Dishart, K., (2008, Oct). Using Hansen solubility parameters to match the cleaning agent to the lead free
flux residue. IPC/SMTA High Performance Cleaning Symposium.
4. Lee, .C. (2008, Oct). Lead-free flux technology and influence on cleaning. IPC-SMTA High Performance
Cleaning Symposium.
5. Chan, TM, Moo, KS, Teoh, KH (2008). White residue formation on printed circuit board assemblies.
Sanmina-SCI Penang, Malaysia.
6. Polymerization. Retrieved February 25, 2008 from http://en.wikipedia.org/wiki/Polymerization
7. Steinke, T, Ling, Z., & Bogert. G.L. (2002) April. White residue on LPI Solder Mask. Retrieved from IPC
Techet Forum.
8. Alpha-Fry Technologies (n.d.). White residue and water soluble fluxes. Cookson Electronics. Jersey City,
J.
9. Sozansky, W. Ihms, D., & Bixenman, M. (2002, Feb). Enhanced vapor phase cleaning fluid for demanding
flip chip cleaning requirements. International Workshop on Wafer Level CSP and Flip Chip Packaging.
Georgia Tech University.
10. Munson, T. (n.d.). White residue on finished assemblies: Is it good or bad? Retrieved February 15, 2009
from http://www.residues.com/pdf/white_residue2.pdf
11. Munson, T. (2006, T). White residues: Are they or aren’t they? Circuit Assembly. Retrieved on February
15, 2009 from http://www.residues.com/pdfs/Circuits%20Assembly%20Articles/2006/lowres/
2006.01-White%20Residues-%20Are%20They%20or%20Arent%20They%20-%20Circuits%20
Assembly.pdf
12. Munson, T. (2004, July). Is white residue a reliability risk? Circuit Assembly. Retrieved on February 15,
2009 from http://www.residues.com/pdfs/Circuits%20Assembly%20Articles/2004/low%20res/2004.
07- Is%20White%20Residue%20a%20Reliability%20Risk%20-%20Circuits%20Assembly.pdf
13. Pham, H.H. (2007, July) Flux residues and selective soldering. SMT. Retrieved on February 13, 2009 from
http:// smt.pennnet.com/display_article/297961/35/ARTCL/none/none/Flux-Residue-&-Selective-
Soldering
14. Munson, T. (n.d.). White residue below BGA components: Is it good or bad? Retrieved February 15, 2009
from http://www.residues.com/pdf/white_residue1.pdf
15. Bixenman, M., & Stach, S. (2007, Aug). Development and Validation of a new test platform for cleaning
process development: Phase I. SMTAI 2007, Orlando, FL.
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Provided by IHS under license with IPC
Not for Resale, 11/27/2015 19:13:55 MST
No reproduction or networking permitted without license from IHS
--`,`,,,,`,`,,,`,,,`,`,`,`,,,```-`-`,,`,,`,`,,`---
16. ational Physical Laboratory (PL), White residues on soldered printed circuit assemblies. Retrieved
from www.npl.co.uk/ei
17. Keeping, J. (2008, Oct). Critical Considerations for Selecting a Conformal Coating Process. IPC/SMTA
Cleaning Symposium.Rosemont, IL.
18. Stach, S., & Bixenman, M. (2004). Optimizing Spray Energy in Batch and Inline Spray Systems. SMTAI,
Rosemont, IL.
19. Bixenman, M., Lee, .C., & Stach, S. (2009, Oct). Ionic Cleanliness Testing Research of Printed Wiring
Boards for Purposes of Process Control. SMTAI, San Diego, CA.
20. Stach, S. (2009). Using Hansen Solubility to Optimize Solvent Based Cleaning Processes for Manufactur-
ing Electronic Assemblies, Retrieved from http://www.aat-corp.com/technical_papers/
UsingHansenSpaceToOptimizeSolvent BasedCleaningProcesses.pdf
21. Stach, S., & Bixenman, M. (2005). Optimizing Spray Energy in Batch and Inline Spray Systems, Phase II.
SMTAI, Rosemont, IL.
22. Telcordia Technologies’ (formerly Bellcore’s) GR-78-CORE.
23. Tellefesen, K. GREE RESIDUES AD ELECTRICAL RELIABILITY, Proceedings of the International
Conference on Electronic Assembly: Materials and Process Challenges, Atlanta, Georgia, June, 1998.
24. ‘Thermal Residue Fingerprinting: A Revolutionary Approach to Develop a Selective Cleaning Solution’
Steve Stach, Austin American Technology Harald Wack, Ph.D., Umut Tosun, aveen Ravindran,
ZESTRO America, John M. Radman, Daniel D. Phillips, Trace Laboratories East
9 环境考虑要点
9.1 安全性 主要中在国的法律法规方面,
这些
或者或者的主的,在我们
认知:在遵守地方法规时,要兼顾遵守州和联邦政府法规
选择清洗必须考虑排放、污排放物产生在影三个环境介质
一个都可能基于使和设排放、污排放
物产生可。溶剂
水基清洗 化学溶剂。所们都必须遵照在工作场合的化学物质方面的准
1994国工业健康安全风险交标准生效物质安全数据表明
许多有关像毒测试健康风险评估物处理安全作措施保护性设物质化学
性和易面的文件信息。并确保这些文件使
化学物质的人
使用。 法规要求任何有可能使半水基清洗的和其化学物质的人在任何工作场合都能到相
化学物质安全数据表。
作场良好暴露的化学物质应该越少越好。工业保健监确保暴露的化
物质限值。在化学物质或者清洗设时,工程制不能使暴露物质达到
其可限值,必须确保
有合适的个人防护保护安全工业安全健
中的个人防护标准, 位都要有份个人防护备评估报告。材料安全数据表中列
议使用的个人防护将这些与清洗一并出。
9.1.1 环境意识 国有一套完法规气清洁法规清洁法规,资源保护
总之这些法规使和制由始至终排放
排放物产生,印制线
组装所产生负责有一法规要求对排放气、水或者运出的特定物质
报告这些法规要求们的清洗说服力的有关环境安全问题的文件
20117 IPC-CH-65B-C
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