presentazione_laboratorio.pdf - 第5页
Lithographic Sector Mask Aligner A “Karl Suss MA 150 BSA” Resist processing systems “SVG 8600” and “EVG 150”.
Clean Room
Fabrication: the Lab. covers an area of 500 sqm (250 of
which are in class 10)
• Furnaces 11 horizontal furnaces (diffusion,LPCVD depositions, Si3N4,
Polysilicon, TEOS, BPSG and LTO)
• Implanter “Varian E 220 medium current”
• Lithographic Sector : Mask Aligner A “Karl Suss MA 150 BSA” and Resist
processing systems “SVG 8600” and “EVG 150”.
• Etching Sector: Wet etching and Dry etching (Aluminium, Silicon
dioxide Silicon nitride, Polysilicon etching)
• Metalization: Varian 3180 sputtering and Ulvac EBX-16C evaporator
• Dicing Disco DAD 2H-6T
Testing
• HP 4062UX + EG2001CX - custom modified for double-side wafer
• Karl Suess PM8 - custom modified for double-side wafer testing
Lithographic Sector
Mask Aligner A “Karl Suss MA 150 BSA”
Resist processing systems “SVG 8600” and “EVG 150”.
Etching Sector
Dry etching
Aluminium, SiO
2
, Si
3
N
4
and Poly
Wet etching