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IC and Component Selection for Space Sy stems – Presented by Kenneth A . LaBel 29 Programmatics: What if the first design is incorrect? • As digital devices pack more bits into the same physical space (i.e., technology f…

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IC and Component Selection for Space Systems – Presented by Kenneth A. LaBel
28
Programmatics:
Development Schedule
Example of a time to market (TTM) for commercial options
Assumptions
90nm technology, < 1Mgate device
SA is ~1/2 TTM of a CA
FPGAs are likely < ½ of the SA TTM
Note: This does not consider reliability or radiation qualification
times
0 4 8 12162024283236
Std. Cell
S-ASIC
Months
Time to 1st Silicon
Respin (Risk X Time)
Time to 2nd Device
Respin 2nd Device
SA
CA
Comparing
SA vs. CA
for TTM
Source: www.chipdesignmag.com
IC and Component Selection for Space Systems – Presented by Kenneth A. LaBel
29
Programmatics:
What if the first design is incorrect?
As digital devices pack more bits into the same physical
space (i.e., technology feature size is shrinking), more
designs require a “second pass” or re-spin.
Even worse, the time it takes for this re-spin has increased
0
1
2
3
4
5
6
7
Months
.25u .18u .13u .09u
Technology
Average Re-Spin time
Source: www.chipdesignmag.com
0
10
20
30
40
50
60
.25u .18u .13u .09u
Technology
Percent of designs requiring re-spin
IC and Component Selection for Space Systems – Presented by Kenneth A. LaBel
30
Programmatics: Development Cost
Overall product development costs are increasing: design, mask, and
manufacturing
However, the percentage of product cost for both design and masks (>$1M for
90nm!) are also Increasing
Implies cost effectiveness of minimizing masks and design re-spin costs (advantage
FPGAs and SAs)
Graphic from MIPS Technologies "The Coming Reality for SOC Designers" by John Bourgoin
Design
Costs
Mask
Costs
Mfg.
Costs
$0M
$1M
$2M
$3M
$4M
$5M
$6M
$7M
$8M
$9M
$10M
1995
(0.35um)
1997
(0.25um)
1999
(0.18um)
2001
(0.13um)
2003
(0.10um)
Assumptions: 6M-70M transistors, 3 mask spins, 250K Units, transistor costs and productivity projected from the ITRS
Design
100%
Mfg.
(250KU)
62%
Masks
Design
100%
Masks
Mfg.
(250KU)
1995
13%