m220_383_02_process_manual工艺手册.pdf.pdf - 第11页

INTRODUCTION P ROCESS M ANU AL 1.Introduction 1.1 General The horizontal furnaces of Tem press Systems In c. are devel oped according to th e latest European directives for Machinery ( 98/37/EC) , Low Voltage ( 73/23/EC …

PREFACE

ROCESS MANUAL

III

Contents description

This manual is divided into the following sections and appendices:

Section 1 Introduction

Provides an overview of the Tempress Systems Inc.

Horizontal furnace, what it is and what it can do.

Section 2 Safety

Describes the safety components and functions. It describes all measures

that are required to provide a safe way of working.

Section 3 Process setup and acceptance

Describes the basis of how to setup a process recipe and how to handle

alarms that are generated during the process. Finally all minimal process

requirements for acceptable process results are defined in process

acceptance.

Section 4 Process description

Contains specific process information including chemicals used, start-up

parameters and a basic recipe layout.

Section 5 Operation Instruction

Describes all procedures that are required for the process engineer.

Revision History

This manual is revision 0 of the Process Manual and is intended to explain the required

procedures. The function and screens it describes are based on the following software

releases:

• TSC 2 version 6.0 (17-02-2003)

• DPC 2.I.03 (17-02-2003)

• DTC 2.F.02 (17-02-2003)

• Touchscreen 2.I.05 (17-02-2003)

For minor software and hardware changes, addendum to this manual will be available. For

major changes, a new revision will be available. For price information or other questions

please contact Tempress Systems Inc.

INTRODUCTION

ROCESS MANUAL

1.Introduction

1.1 General

The horizontal furnaces of Tempress Systems Inc. are developed according to the latest

European directives for Machinery (

98/37/EC), Low Voltage (73/23/EC) and EMC

(

89/336/EEC).

The Tempress Diffusion system is a modular horizontal furnace designed to process (silicon)

wafers as part of the manufacturing technology of semiconductor, optical, MEMS and solar

devices.

Figure 1-1 shows an example of a L-shape diffusion system with 4 process tubes shown

without the partition of a cleanroom wall.

It is a right-handed system, defined according to the position of the furnace relative to an

operator.

Usually the system contains more than 1 tube. Based on the number and size of tubes, the

system is referred to as a 2, 3 or 4 stack.

Figure 1-1 is an example of a 4-stack system, allowing up to 4 different processes at any time.

The tubes are numbered from 1 to 4, with tube number 1 at the top and tube 4 at the

bottom. All tubes operate fully independently.

Main Power Cabinet

Figure 1-1 Schematic view of a right-handed 4-stack Diffusion System

1-1

INTRODUCTION

ROCESS MANUAL

1.2 Process engineer area description

H S OT URFACE

1-2

Figure 1-2 Loadstation

The process engineer area is limited to the loadstation only. Figure 1-2 shows all relevant

items.

The Loadstation part of a Tempress System should be placed in the cleanroom. The Furnace

and Gas cabinet can optionally be placed in the greyroom.

To load wafers, several loader types can be implemented, including the (default) inline loader,

the Amtech Atmoscan

and the backmounted softlander. To prevent particles on the wafers

during the loading process, a constant horizontal laminar flow is created from the loadstation

into the cleanroom.

The loadstation is powered by 230V and has an illuminated On/Off switch for the fans and

the lights.

The remote control cabinet in the loadstation contains TFT-Touchscreens, one for each

tube. These are the user interface for communication with the Digital System Controllers

(DPC, DTC and DMC).

MOVING PART

afers

Buzzer

LED

ouchscreen

Light/Fan Switch