IPC-D-859.pdf - 第13页

3. Conductor screens 4. Overglaze screens 5. Solder screens 6. Thick film masks 7. Marking artwork or stamps 3.3.1.4 Piece-Part and Material Procurement Specifica- tions Piece-part and material procurement specifications d…

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Thick-film circuit A microcircuit in which passive com-
ponents of a ceramic-metal composition are formed on a
suitable substrate by screening and firing.
Thick-film hybrid circuit A hybrid microcircuit that has
add-on components, usually chip devices added to a thick-
film network to perform an electronic function.
Thick-film network A network of thick-film resistors
and/or capacitors interconnected with thick-film conductors
on a ceramic substrate, formed by screening and firing.
Thick-film technology The technology whereby electrical
networks or elements are formed by applying a liquid,
solid, or paste coating through a screen or mask in a selec-
tive pattern onto a supporting material (substrate) and fired.
Films so formed are usually 5 µm or greater in thickness.
Top hat resistors Film resistors having a projection out
one side allowing a notch to be cut into the center of the
projection to form a serpentine resistor and thereby
increase the resistivity.
Trim notch The notch made in a resistor by trimming to
obtain the design value.
Trimming Notching a resistor by abrasive or laser means
to raise the nominal resistance value.
Ultrasonic bonding A process involving the use of ultra-
sonic energy and pressure to join two materials.
Uncased device A chip device.
Via An opening in the dielectric layer through which a
conductive riser passes.
Wedge bond A bond made with a wedge tool. The term
is usually used to differentiate thermo-compression wedge
bonds from other thermo-compression bonds. (Almost all
ultrasonic bonds are wedge bonds.)
Wedge tool A bonding tool in the general form of a
wedge with or without a wire-guide hole to position the
wire under the bonding face of the tool, as opposed to a
capillary-type tool.
Wobble bond A thermo-compression, multi-contact bond
accomplished by rocking (or wobbling) a bonding tool on
the beams of a beam lead device.
3.2 Design Features The design features of the thick
film multilayer hybrid circuits shall be in accordance with
this standard. Quality conformance test circuitry should be
included on each panel and shall be in accordance with
Section 6. Test circuitry shall be not more than 10 mm
[0.400 inch] and shall be not less than 5 mm [0.200 inch]
from the edge of the hybrid circuit, and shall reflect the
design of the circuit and all the manufacturing processes.
Quality conformance test circuitry shall also be included on
the master pattern, master drawing and artwork in accor-
dance with Section 6.
3.3 Documentation Package The designer shall estab-
lish the documentation package necessary to define, pro-
duce, and test a hybrid microcircuit which is adequate for
the customer’s end-use requirements. This section will
describe a typical documentation package that includes the
details required by the various disciplines involved with the
manufacturing processes.
3.3.1 Master Drawing Package The master drawing
package is composed of the various individual drawings, or
combinations necessary to specifically define the physical,
electrical, and environmental criteria applicable to the
hybrid microcircuit.
Master drawings shall be prepared in accordance with IPC-
D-325. Dimensioning and tolerancing practices used in
master drawings shall be in accordance with IPC-D-300.
3.3.1.1 Schematic The schematic is a diagram of a
functional electronic circuit consisting of symbols of all
active and passive elements and their interconnections that
form the circuit. The schematic should include the follow-
ing information:
1. Power supply voltages
2. Input signal requirements
3. Pin-out numbers and functions
4. Test points
5. Active and passive circuit element reference identifica-
tion, part number, value, and tolerance.
3.3.1.2 Assembly Drawing The Assembly Drawing
shows package outlines with the components mounted in
their proper locations and denotes interconnection instruc-
tions. This drawing should contain:
1. Package outlines
2. List of material
3. Special handling (electrostatic discharge [ESD] cau-
tion, fragility, assembly environments, coatings, tailor-
ing, radiation- hardening, etc.)
4. Marking requirements (traceability, federal code, part
number, etc.)
5. Applicable procedures (Assembly Test Plan (ATP),
visual characteristics, customer specifications, etc.)
6. Component locations and provisions for use of alter-
nate components
7. Burn-in circuit and other conditions that may be a part
of other documentation, such as an ATP.
8. As-required material (e.g., wire, epoxy, etc.)
3.3.1.3 Artwork Artwork is required to produce:
1. Dielectric screens
2. Via screens
IPC-D-859 December 1989
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3. Conductor screens
4. Overglaze screens
5. Solder screens
6. Thick film masks
7. Marking artwork or stamps
3.3.1.4 Piece-Part and Material Procurement Specifica-
tions
Piece-part and material procurement specifications
define the physical, electrical, and environmental criteria
applicable to purchased items. Special requirements should
include shipping and packaging instructions, if required.
The conventional vehicle for these documents are Specifi-
cation and Source Control drawings.
3.3.2 Viewing Unless otherwise specified, conductor lay-
ers shall be numbered consecutively, starting at the sub-
strate, as shown in Fig. 3–1.
3.3.3 Location Dimensioning All vias, test points, termi-
nal areas, and overall completed circuit dimensions shall be
dimensioned by use of a modular grid system, except
where necessary to mate parts not on grid. The choice of
the primary modular grid system used in the design of
hybrid circuits shall be metric (SI) and the basic modular
units of length shall be .5 mm and 0.05 mm; in that order
of preference, and shall be applied in the X and Y axis of
the Cartesian coordinates. The secondary modular grid sys-
tem is inch based, where the basic modular units of length
shall be 0.025 or other multiples of 0.005 inch; in that
order of preference, and shall be applied in the X and Y
axis of the Cartesian coordinates.
3.3.4 Hole Location Tolerance Unless otherwise speci-
fied, the location of holes and/or vias shall be dimensioned
with respect to single or secondary grid systems.
3.3.5 Processing Allowances The processing allow-
ances which were considered in the design and artwork
preparation for the hybrid circuit shall be documented and
defined on the master drawing in accordance with IPC-D-
325, in either note form, or by reference to another draw-
ing which contains artwork specifications (see Section 5).
3.3.6 Datums There shall be a minimum of two datum
features to establish the mutually perpendicular datum ref-
erence frame for each circuit. Each datum shall be estab-
lished by at least two holes, points, symbols, or other
datum features, but not edges, and be included on all con-
ductive layers. Critical design features may require the use
of more than one set of datum references. The master
drawing shall establish the relationship and acceptable tol-
erance between all datum features. All datum features shall
be located on grid, or establish grid criteria, as defined on
the master drawing, and should be within an outline of the
hybrid circuit.
3.4 Electrical Requirement Considerations
3.4.1 Conductor Thickness and Width
The minimum
width and thickness of conductors on the finished circuit
should be determined on the basis of the current-carrying
capacity required, and the maximum permissible conductor
temperature rise; processing allowances (see 3.3.5) shall be
considered in the evaluation. Conductor width and thick-
ness values shall be not less than the dimensions estab-
lished in Table 3–1. In general, the designer should base
dimensions on supplier data for the specific conductor
material used. For impedance/capacitance control consider-
ations see paragraph 3.4.3. For ease of manufacture and
durability in usage, these parameters should be maximized
while maintaining the minimum recommended spacing
requirements defined herein (see Table 3–1).
3.4.2 Electrical clearance Spacing between conductors
on individual layers (same plane) in multilayer hybrid cir-
cuits shall be in accordance with the requirements of Table
3–1.
3.4.3 Impedance/Capacitance Control Considerations
Multilayer hybrid circuits are ideally suited for providing
interconnection wiring that is specifically designed to pro-
vide desired levels of impedance and capacitance control.
Techniques commonly referred to as ‘strip-line,’ or
‘embedded microstrip,’ (see Figure 3–5) are particularly
suited for impedance and capacitance requirements.
As shown in Figure 3–5, there are four basic types of
transmission line constructions. These are:
1. Microstrip or ‘open-line,’ where the external center
conductor is separated from the reference plane
(shield) by a single thickness of dielectric material.
2. Embedded microstrip, where the center conductor is
bounded on all sides by dielectric material that sepa-
rates it from a single reference plane (shield).
3. Balanced stripline, where the center conductor is
bounded on all sides by dielectric material that sepa-
rates it equally from two reference planes.
4. Unbalanced stripline, where two or more layers of con-
ductors are separated from a combination of reference
planes in an unbalanced configuration.
The characteristic impedance of a microstrip can be calcu-
lated using the formula:
Z
0
=
87
e
r
+ 1.41
ln
(5.98h)
(0.8W + t)
where e
r
= relative dielectric constant of substrate material
(see Table 3–5)
w,h,t are dimensions indicated in Figure 3–7.
The most commonly used microwave circuit technique is
microwave stripline (Figure 3–6A). Stripline energy is
December 1989 IPC-D-859
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typically transmitted in a mode such that all the energy is
propagated in the direction of the electric field and none in
the direction of the magnetic field.
Figure 3–7 illustrates the electric field and typical param-
eters involved in microstrip design.
When the conductor is covered with a dielectric material
such as solder mask (embedded microstrip), the impedance
characteristics will be reduced depending on the thickness
and dielectric constant of the material (approximately 5
percent).
IPC-859-3-1
Figure 3–1 Screening masks typically required for thick film processing
IPC-D-859 December 1989
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