00193407-02 HWWS SIPLACE Machine Accuracy EN.pdf - 第16页
© Siemens AG . . Änderungen vorbehalten SIPLACE Placement Systems C mk >1,33 C mk <1,33 C mk <1,33 dispersion low , Sigma < 12.5 um, offset too high, process is not centered dispersion low , Sigma < 12.5 u…
© Siemens AG . . Änderungen vorbehalten
SIPLACE
Placement Systems
example: specification 50 um at 4 Sigma (1 sigma = 12.5 um)
C
m
<1,33 C
m
=1,33
C
m
>1,33
dispersion to high,
Sigma > 12.5 um
dispersion normal,
Sigma = 12,5 um
dispersion low,
Sigma < 12,5 um
Machine Capability
© Siemens AG . . Änderungen vorbehalten
SIPLACE
Placement Systems
C
mk
>1,33
C
mk
<1,33
C
mk
<1,33
dispersion low,
Sigma < 12.5 um,
offset too high,
process is not centered
dispersion low,
Sigma < 12.5 um,
offset too high,
process is not centered
dispersion low,
Sigma < 12.5 um,
no offset,
process is centered
example: specification 50 um at 4 Sigma (1 sigma = 12.5 um)
Machine Capability
© Siemens AG . . Änderungen vorbehalten
SIPLACE
Placement Systems
=
1,33
37.5 um
(50 - 0) umlimit value - offset
=
=
cmk
3 Sigma
x
-4σ
-50 -37.5
-25 -12.5
0
12.5
25
37.5
+50
limit value +- 50 um
Sigma = 12.5 um
1. Process is centered, no offset
calculation after placing components
Sigma = 10 um,
offset = 0, process is centered
limit value +- 50 um
-40
-30
-20
-10
0
20
30
40
10
=
1,66
30 um
(50 - 0) um
=
limit value - offset
3 Sigma
=
cmk
example: specification 50 um at 4 Sigma
+4σ
-1σ
+
1σ
x
-4σ
+
4σ
-50
+50
Maschinenfähigkeit