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Slide 12 W orld class overlay performance now at 170wph on NXE:3400C systems Ov erla y well in spec at 170 WPH throug hput DCO MMO Public

Slide 11

NXE: 3400C improvements with higher productivity

Demonstrated in ASML factory, shipping to the customers

ATP test: 26x33mm

, 96 fields, 20mJ/cm

Source with Modular Vessel

collector swap <8hrs

Inline tin refill

Wafer Handler

@ ≥170WPH

Faster Reticle Align /

reduced wafer

overhead

Reticle Handler

Improved productivity

DGL Membrane

(optional)

Optics

Transmission improvement

OFP:3400B (standard)

ORION

UV-LS 2

Gen

≤ 1.3 nm

Public

Slide 12

World class overlay performance now at 170wph on

NXE:3400C systems

Overlay well in spec at 170 WPH throughput

DCO

MMO

Public

Slide 13

EUV Reticle frontside protection options

Public

Reticle

Reflected

illumination

EUV Reticle (13.5nm)

Reticle

particle

pellicle

Reticle with pellicle

Clean system

(without pellicle)