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Slide 66 Increase of CO 2 laser power High beam quality for ga in extraction and EUV generation Public Source: B eam Quality of Hi gher Power Lasers- EUVL 2018 Trumpf K ey t ech nologies : 1. Pulsed drive laser with high…
Slide 65
500W in-burst EUV power demonstration
Demonstrated on the development system at 80 kHz
0 1 2 3 4 5 6 7 8 9 10
0
2000
4000
6000
8000
10000
12000
14000
16000
Number of pulses
EUV pulse energy, mJ
500 W
450 W
EUV source power and key technology steps
Open loop, 15 ms Bursts, 80 kHz,
3% duty cycle
On the development system
EUV pulse energy histograms
Historical trend: ~ two years from
demonstration in research to a product
Public
Slide 66
Increase of CO
2
laser power
High beam quality for gain extraction and EUV generation
Public
Source: Beam Quality of Higher Power Lasers- EUVL 2018 Trumpf
Key technologies:
1. Pulsed drive laser with high
average power capability
2. Gain distribution inside
amplification chain
3. Isolation between amplifiers
4. Metrology, control, and
automation
Slide 67
Summary
EUV chips have made it to the end market!
Our customers are ramping up EUV for the 7nm Logic node and preparing for the
16nm DRAM node with systems deliveries and qualification on-going. EUV layers
adoption continues to grow to reduce patterning complexity and cost
ASML EUV lithography systems continue to improve on productivity and
availability supporting our Logic and DRAM customers roadmap while maintaining,
state of the art overlay performance and year on year cost reduction
- Dose-controlled power of 250W on multiple tools at customers
- Droplet Generator with improved lifetime and reliability >700 hour average
runtime in the field>3X reduction of maintenance time
- Collector lifetime improved to > 100Gp (4X at 3X higher power)
Availability improvements are well underway to meet our customers
requirements, with the NXE:3400C supporting >90% availability
Path towards 500W EUV demonstrated in research
- EUV CE is up to ~ 6 %
- In burst EUV power demonstration up to 500W
- CO
2
Laser development supports EUV power scaling
Public