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Laser Produced Plasma Density and T emperature Nishihara et al. (2008) EUV LPP Ion density ~ 10 17 – 10 18 #/cm 3 T emperature ~ 30 -100 eV Slide 29 Public

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EUV: Principles of Generation
Slide 28
Public
Laser Produced Plasma Density and Temperature
Nishihara et al. (2008)
EUV
LPP
Ion density ~ 10
17
– 10
18
#/cm
3
Temperature ~ 30 -100 eV
Slide 29
Public
Fundamentals: EUV Generation in LPP
Laser produced plasma (LPP) as an EUV emitter
Slide 30
30 micron diameter tin droplet
Focused
Laser light
electrons
tin ions
“ejecta”
microparticles
tin vapor
1. High power laser interacts with liquid tin producing a plasma.
2. Plasma is heated to high temperatures creating EUV radiation.
3. Radiation is collected and used to pattern wafers.
Tin Laser Produced Plasma
Image
EUV
EUV
EUV
EUV
Dense hot
Plasma
Public