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Slide 53 Hydrogen gas central to tin management str ategy Hydrogen performs well for all these tasks! Requirements for buffer gas: ➢ Stopping fast ions (w ith high EUV transparency) ➢ Heat tr ansport ➢ Sn etching ca pabi…
Slide 52
EUV Collector: Normal Incidence
• Ellipsoidal design
• Plasma at first focus
• Power delivered to exposure tool
at second focus (intermediate
focus)
• Wavelength matching across the
entire collection area
Normal Incidence Graded
Multilayer Coated Collector
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Slide 53
Hydrogen gas central to tin management strategy
Hydrogen performs well
for all these tasks!
Requirements for buffer gas:
➢ Stopping fast ions (with high
EUV transparency)
➢ Heat transport
➢ Sn etching capability
High heat capacity
High thermal conductivity
High EUV transparency
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Slide 54
Debris in the tin LPP EUV source
Primary debris – directly from plasma and before
collision with any surface:
➢ Heat and momentum transfer into surrounding gas
o Kinetic energy and momentum of stopped ions
o Absorbed plasma radiation
➢ Sn flux onto collector
o Diffusion of stopped ions
o Sn vapor
o Sn micro-particles
Sn
Sn
Sn vapor (diffusion debris)
Sn particles
Sn
+
Fast Sn ions (line of sight debris)
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