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EUV Source: Architectur e and Oper ation Princi ples Slide 36 Public

Simulation of the EUV source

The plasma code’s outputs

were processed to produce

synthetic source data. The

comparison to experiments

helps to validate the code and

understand it’s accuracy.

Measured Shadowgrams

Simulated Shadowgrams

Simulated EUV spectra

Emission anisotropy

Collector rim

Reflected laser modeling

Conversion Efficiency (%)

Target Diameter (µm)

Fluence

(J/cm2/S/mm)

Wavelength (nm)

Simulation

Conversion Efficiency

Slide 35

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EUV Source: Architecture

and Operation Principles

Slide 36

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Slide 37

EUV Lithography System Schematic

Reticle-stage

Wafer stage

LPP Source

Intermediate focus

Illuminator

Projection optics

Collector

Drive

Laser

Plasma

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