S1.pdf - 第51页

Slide 51 Collector Protection by Hydrogen Flow Sn droplet / plasma H 2 flow Reaction of H radic als with Sn to form SnH 4 , which can be pumped away . Sn (s) + 4H (g) → SnH 4 (g) • Hydr ogen buffer gas (pressure ~100Pa) …

EUV Collection

Debris management

Slide 50

Public

Slide 51

Collector Protection by Hydrogen Flow

Sn droplet /

plasma

flow

Reaction of H radicals with Sn

to form SnH

, which can be

pumped away.

Sn (s) + 4H (g) → SnH

(g)

• Hydrogen buffer gas (pressure

~100Pa) causes deceleration of ions

• Hydrogen flow away from collector

reduces atomic tin deposition rate

Laser beam

Intermediate

Focus

catcher

EUV collector

• Vessel with vacuum pumping to

remove hot gas and tin vapor

• Internal hardware to collect micro

particles

Public

Slide 52

EUV Collector: Normal Incidence

• Ellipsoidal design

• Plasma at first focus

• Power delivered to exposure tool

at second focus (intermediate

focus)

• Wavelength matching across the

entire collection area

Normal Incidence Graded

Multilayer Coated Collector

Public