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Fundamentals: EUV Generation in LPP Laser produced plasma (LPP) as an EUV emitter Slide 30 30 micron diameter tin droplet Focused Laser light electrons tin ions “ ejecta” microparticles tin vapor 1. High pow er laser int…
Laser Produced Plasma Density and Temperature
Nishihara et al. (2008)
EUV
LPP
Ion density ~ 10
17
– 10
18
#/cm
3
Temperature ~ 30 -100 eV
Slide 29
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Fundamentals: EUV Generation in LPP
Laser produced plasma (LPP) as an EUV emitter
Slide 30
30 micron diameter tin droplet
Focused
Laser light
electrons
tin ions
“ejecta”
microparticles
tin vapor
1. High power laser interacts with liquid tin producing a plasma.
2. Plasma is heated to high temperatures creating EUV radiation.
3. Radiation is collected and used to pattern wafers.
Tin Laser Produced Plasma
Image
EUV
EUV
EUV
EUV
Dense hot
Plasma
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10
9
10
10
10
11
10
12
0
1
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10
CE (%)
Intensity (W/cm
2
)
Tin target, 50 m m
10 ns isquare-top laser
CE calculated with
Gaussian 2% bandwidth
10.6 m m
5.0 m m
2.0 m m
1.064 m m
532 nm
355 nm
266 nm
Slide 31
Modelled EUV CE of LPP Sn Plasma vs. Wavelength
EUV CE defined into 2% bandwidth, 2p sr solid angle
Simulation Assumptions:
• 1D modeling
• Sn flat target (50um thickness)
• Laser Pulse: 10ns duration
(rectangular)
• Uniform radial distribution of
intensity in beam spot
• Prizm Computational
Sciences, Inc., 2005
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