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Slide 33 LPP T arget Material and Laser W avelength Opt ions CO 2 Laser w ith Sn target w as selected for industrializa tion in 2006 Public

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EUV Spectra of Laser Produced Sn Plasma
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0.0
0.2
0.4
0.6
0.8
1.0
EUV spectrum
Intensity (arb. u.)
Wavelength (nm)
EUV Spectrum and MLM Reflectivity
0
20
40
60
80
100
Reflectivity (%)
MLM reflectivity
Peak of EUV spectrum matches the MoSi
multilayer reflectivity band at 13.5 nm
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0
1
2
3
4
5
6
Sn, 355nm
Sn, 1064nm
EUV mirror
Signal, (a.u.)
Wavelength, (nm)
EUV spectrum with CO
2
Laser
at 10.6 mm
EUV spectrum with Nd:YAG Laser
at 1064 nm and 355 nm
Public
Slide 33
LPP Target Material and Laser Wavelength Options
CO
2
Laser with Sn target was selected for industrialization in 2006
Public
Plasma simulation capabilities
Main-pulse modeling using HYDRA
Main-pulse
shape
1D simulations are fast and useful
for problems that require rapid
feedback and less accuracy
3D:
+ real asymmetric
profile
2D and 3D
simulations are run
for the full duration
of the Main pulse.
Results include
temperature,
electron density,
spectral emission,
etc.
Target
Sn target using a real
irradiance distribution
1D:
real pulse shape
2D:
+ symmeterized
beam profile
Electron density (top half) with laser light (bottom half)
500μm500μm500μm
500μm
Power (arb. Units)
Time
Slide 34
Public