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Slide 67 Summary EUV chips have made it to the end market! Our customers are ramping up EUV for the 7nm Logic node and preparing for the 16nm DRAM node with systems deliveries and qualification on -going. EUV layers adop…
Slide 66
Increase of CO
2
laser power
High beam quality for gain extraction and EUV generation
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Source: Beam Quality of Higher Power Lasers- EUVL 2018 Trumpf
Key technologies:
1. Pulsed drive laser with high
average power capability
2. Gain distribution inside
amplification chain
3. Isolation between amplifiers
4. Metrology, control, and
automation
Slide 67
Summary
EUV chips have made it to the end market!
Our customers are ramping up EUV for the 7nm Logic node and preparing for the
16nm DRAM node with systems deliveries and qualification on-going. EUV layers
adoption continues to grow to reduce patterning complexity and cost
ASML EUV lithography systems continue to improve on productivity and
availability supporting our Logic and DRAM customers roadmap while maintaining,
state of the art overlay performance and year on year cost reduction
- Dose-controlled power of 250W on multiple tools at customers
- Droplet Generator with improved lifetime and reliability >700 hour average
runtime in the field>3X reduction of maintenance time
- Collector lifetime improved to > 100Gp (4X at 3X higher power)
Availability improvements are well underway to meet our customers
requirements, with the NXE:3400C supporting >90% availability
Path towards 500W EUV demonstrated in research
- EUV CE is up to ~ 6 %
- In burst EUV power demonstration up to 500W
- CO
2
Laser development supports EUV power scaling
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Slide 68
Acknowledgements:
Alex Schafgans, Peter Mayer, Slava Rokitski, Jayson Stewart, Andrew LaForge, Alex
Ershov, Michael Purvis, Yezheng Tao, Mike Vargas, Jonathan Grava, Palash Das, Lukasz
Urbanski, Rob Rafac, Alex Frenzel, Niels Braaksma, Joshua Lukens, Chirag Rajyaguru,
Georgiy Vaschenko, Carmen Zoldesi, Qiushi Zhu, Adam Kielczewski, Klaus Hummler,
Silvia De Dea, Martijn Leenders, Payam Tayebati, David Brandt, Daniel Brown and many
others.
ASML US LP, 17075 Thornmint Ct. San Diego, CA 92127-2413, USA
Marcel Mastenbroek, Jan van Schoot, Roderik van Es, Mark van de Kerkhof, Dmitry
Kurilovich, Leon Levasier, Daniel Smith, Uwe Stamm, Sjoerd Lok, Arthur Minnaert, Martijn
van Noordenburg, Jowan Jacobs, Joerg Mallmann, David Ockwell, Henk Meijer, Judon
Stoeldraijer, Christian Wagner, Eelco van Setten, Jo Finders, Koen de Peuter, Chris de
Ruijter, Milos Popadic, Roger Huang, Marcel Beckers, Rolf Beijsens, Kars Troost, Andre
Engelen, Dinesh Kanawade, Arthur Minnaert, Niclas Mika, Vadim Banine, Jos Benschop
and many others.
ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven, The Netherlands
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