Oxford-100-Manual.pdf - 第81页
System Manual Oxford Instruments Plasma Technology PiasmaiabSystem100 Continue button: Close the alert dialogue box - the alert banner remains displayed on the menu bar. 5.4.4 Note that option buttons that are not availa…
PlasmalabSystem1
00
Oxford
Instruments
Plasma Technology System
Manual
5.4.3
System
alerts
System alerts are displayed
when
PC
2000 detects an
event
that
requires
the
attention
of
the
user.
Each
alert
is
automatically
categorised
depending
on
the
nature
of
the
event
and
the
response
required
by
the
user. The category
of
the
event
can range
from
a
warning
indicating
that
a service
parameter
is
out
of
tolerance
to
a process
abort
indicating
that
a process
setpoint
has been
out
of
tolerance
for
so
long
that
the
process
cannot
be completed. A
typical system
alert
is
shown in Fig 5.2.
?Syste",
Set Base
p..,,,,,,,
Fig 5.2: Typical system alert
The
alert
is
displayed
as
a
banner
in
the
menu bar
at
the
top
of
the
screen
with
an associated
dialogue
in
the
main screen area.
Note
that
more
than
one
alert
can be active
at
the
same
time,
each
requiring
action by
the
user
in
turn.
There are
three
categories
of
alert
indicated by
the
colour
and
text
displayed in
the
banner
and dialogue:
Blue
Warning
e.g.
water
flow
low.
Yellow
Hazard -
not
currently
used.
Red Process
abort,
e.g.
high-reflected
RF
power.
A user
logged
on
at
any
access
level can close
the
alert
dialogue,
but
only
a user
logged
on
as
a system
manager
can clear
the
alert
banner
from
the
menu bar. The
dialogue
options
are:
Accept button:System Managers only. Clear
the
alert
and
log
it.
Next
button:
Cancel
button:
View
the
next
alert.
System
Manager
only. Clear
the
alert;
do
not
log
it.
UC
Davis 94-721001
Issue
1:
March 06
Operating
Instructions
Page
5-14
of
52
Printed: 22-Mar-06, 10:42
System
Manual
Oxford
Instruments
Plasma
Technology
PiasmaiabSystem100
Continue
button:
Close
the
alert
dialogue
box
-
the
alert
banner
remains displayed
on
the
menu
bar.
5.4.4
Note
that
option
buttons
that
are
not
available (i.e.
Accept
and Cancel
due
to
user
'logged
on'
status and
Next
when
there
is
only
one
active alert) are greyed out.
The
alert
message usually contains an adequate description
of
the
detected event.
If
it
is
a
service
fault
(water
flow,
purge
gas etc.)
then
verify
that
the
service
is
available
to
the
machine
as
soon
as
possible. Depending
on
the
nature
of
the
service,
the
system may
allow
the
machine
to
continue
to
operate,
so
that
the
current
process can be completed. Do
not
start
a
new
process
before
checking
the
service.
The red alerts are
often
due
to
a process
setpoint
being
out
of
tolerance
for
too
long.
In
these
cases,
the
process
is
halted
by
the
system.
If
it
is
authorised
to
resume processing
with
a
parameter
deviation
then:
1)
Check
the
most recent process
log
to
find
the
process
time
remaining.
2)
Construct a
new
process
with
a
modified
process
time
and check
the
'Ignore
tolerance'
option.
Note
that
this removes
illl
tolerance checking. The machine should
be
monitored
by an
operator
for
further
deviations
when
operated
in this
condition.
Pumping
down
1)
On
the
Pump
Control
page, select
the
SET
BASE
PRESSURE
button,
then
enter
the
required
process chamber base pressure
if
different
from
the
default.
2)
Ensure
that
the
Automatic
load
lock/transfer chamber's lid
is
closed.
(Automatic
load
lock/transfer chamber lid open/closed status
is
shown in
the
panel adjacent
to
the
mimic).
3)
Click on each
dry
pump/rotary
vane
pump
mimic
to
start
the
pump.
4)
Select
the
Evacuate
button
for
the
process chamber. The relevant valves
will
operate
and
the
process chamber
will
be
pumped
down.
5)
Select
the
Evacuate
button
for
the
Automatic
load lock. You
will
be
prompted
to
enter
a
wafer
identity
-
either
enter
the
identity
and click OK,
or
click Cancel
(to
pump
down
without
a
wafer
in
the
Automatic
load lock). The relevant valves
will
operate
and
the
Automatic
load lock
will
be
pumped
down.
NOTE:
Turning
off
any
rotary
vane
pump
will
cause all process and
pumping
actions using
that
pump
to
stop.
6)
To achieve a
low
base pressure
in
the
system,
pump
for
at
least
12
hours.
Where
chambers
or
process heaters are
part
of
the
system, raise
the
temperatures
of
these
near
their
maximum
values
for
the
first
six hours
of
pumping
to
assist out-gassing,
then
return
the
temperature
to
ambient.
WARNING
PARTS
OF
THE EQUIPMENT
MAY
BE
TOO HOT TO TOUCH DURING CHAMBER
HEATING.
Printed: 22-Mar-06. 10:42
Operating
Instructions
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52
UC
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Issue
1:
March 06
PlasmalabSystem100
Oxford
Instruments
Plasma
Technology
System
Manual
5.4.5
Automatic
process run
An
automatic
process
run
as
described
in
this sub-section can be carried
out
by
a user
logged
on
as
a Manager.
See
sub-section 5.4.6, page 5-17
for
details
of
a single
button
automatic
process run,
which
can be carried
out
by
any user.
1)
Insert
the
wafer
into
the
Automatic
load lock.
(If
necessary,
vent
the
Automatic
load
lock
by
selecting
the
STOP
button
then
the
VENT
button).
2)
Close
the
Automatic
load lock's lid.
3)
Select
the
relevant EVACUATE
button.
A
dialogue
box
will
be displayed
allowing
entry
of
a
Wafer
Identity,
if
any.
4)
Check
that
the
system has
pumped
down
to
base pressure. (The process chamber
message panel should display 'Base Pressure reached'.)
5)
Ensure
that
the
Automatic
load lock
is
at
the
required
pressure. (Check
the
relevant
panel
on
the
Pump Control page). Green
'ready
for
transfer'
indicators (...
~)
are
displayed on each chamber mimic
when
it
is
available
for
vacuum transfer.
6)
Select
the
Process menu,
then
the
Recipe
option.
Click
on
the
Load
button
then
select
the
required
recipe.
7)
Click
on
the
Run
button.
This
will
start
wafer
transfers and
wafer
processing.
NOTES:
a)
You can pause
the
process
at
any
time
by selecting
the
PAUSE
button.
This
will
cause
the
Step Time and
the
plasma
power
to
stop
with
the
current
step
time
indicated. Re-starting
the
process
will
cause
the
process
to
continue
from
the
time
it
was paused. If,
during
the
pause
period,
you
change any
of
the
process parameters, e.g. gas demand,
pressure etc.,
you
must press
the
START
button
for
the
changes made
to
come
into
effect, this
will
cause
the
step
timer
to
continue
from
the
time
it
was paused.
b) You can stop
the
process
at
any time;
the
message 'Process Complete'
will
be displayed,
if
required,
you
can
then
run
the
same
or
another
process.
WARNING
CONTACT WITH TOXIC GASES
CAN
CAUSE DEATH OR SERIOUS INJURY.
WHERE
ANY
PROCESS GAS IS TOXIC,
DO
NOT TRANSFER A WAFER
FROM
THE
PROCESS CHAMBER TO THE LOAD LOCK UNTIL ALL PROCESS
GAS
HAS BEEN
PUMPED OUT.
ENSURE THAT THE AUTOMATIC VENT SEQUENCE IS ALLOWED TO COMPLETE.
IF THESE PRECAUTIONS ARE NOT CARRIED OUT, THERE COULD
BE
A
HAZARD
IN
THE
LOAD
LOCK.
UC
Davis 94-721001
Issue
1:
March 06
Operating
Instructions
Page 5-16
of
52
Printed: 22-Mar-06, 10:42